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Patent Searching and Data


Title:
COMPOSITION FOR SEPARATING PHOTORESIST AND SEPARATING METHOD
Document Type and Number:
WIPO Patent Application WO/2005/040931
Kind Code:
A1
Abstract:
Disclosed is a composition for separating a photoresist which contains a reaction product of a primary or secondary organic amine having a hydroxyl group with an ethylene carbonate, propylene carbonate, &gammad -butylolactone, 1,3-dihydroxy-2-propanone, or a monovalent or divalent carboxylic acid, if necessary an organic amine, and a water-soluble organic solvent and/or water. This composition is capable of removing a photoresist with high performance and preventing corrosion of a metal wiring material. By using such a composition, there occurs no problem such that impurities precipitate and adhere to the substrate or the like during water rinsing after separation.

Inventors:
NISHIJIMA YOSHITAKA (JP)
MATSUMOTO MASATAKE (JP)
YASUE HIDEKUNI (JP)
TAKEI MIZUKI (JP)
Application Number:
PCT/JP2004/016012
Publication Date:
May 06, 2005
Filing Date:
October 28, 2004
Export Citation:
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Assignee:
NAGASE CHEMTEX CORP (JP)
NISHIJIMA YOSHITAKA (JP)
MATSUMOTO MASATAKE (JP)
YASUE HIDEKUNI (JP)
TAKEI MIZUKI (JP)
International Classes:
C11D7/32; C11D11/00; G03F7/42; H01L21/027; H01L21/304; H01L21/311; (IPC1-7): G03F7/42; H01L21/027; H01L21/304
Foreign References:
JP2003015320A2003-01-17
JP2000199972A2000-07-18
JP2003098691A2003-04-04
Attorney, Agent or Firm:
Furutani, Shinya (Dojima 2-chome Kita-ku, Osaka-sh, Osaka 03, JP)
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