Title:
COMPOSITION, SUBSTRATE WITH SURFACE LAYER, METHOD FOR PRODUCING SUBSTRATE WITH SURFACE LAYER, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
Document Type and Number:
WIPO Patent Application WO/2022/059623
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a composition which makes it possible to form a surface layer having excellent wear resistance; a substrate with a surface layer; and a method for producing a substrate with a surface layer. The present invention also addresses the problem of providing: a novel compound; and a method for producing the compound. The composition according to the present invention comprises: a first component comprising a fluorinated ether compound having a poly(oxyfluoroalkylene) chain and a reactive silyl group; and a second component comprising at least one compound selected from a compound (A) (Rfa-(OXa)m1-La-CZa1=CH2) and a compound (B) (CH2=CZb2-Lb2-(OXb)m2-Lb1-CZb1=CH2). Rfa represents a fluoroalkyl group, Xa and Xb independently represent a fluoroalkylene group, and La represents a single bond or a bivalent linking group (excluding OXa)na); Lb1 and Lb2 independently represent a single bond or a bivalent linking group (excluding OXb)nb); and Za1, Zb1 and Zb2 independently represent a fluorine atom or a trifluoromethyl group, and m1 and m2 independently represent an integer of 2 or more.
Inventors:
TAKASHITA RYUTA (JP)
Application Number:
PCT/JP2021/033357
Publication Date:
March 24, 2022
Filing Date:
September 10, 2021
Export Citation:
Assignee:
AGC INC (JP)
International Classes:
B05D5/00; C07C43/12; C07F7/18; C08G65/48; C08L71/00; C09K3/18
Domestic Patent References:
| WO2002018457A1 | 2002-03-07 | |||
| WO2003022906A1 | 2003-03-20 | |||
| WO2015087902A1 | 2015-06-18 |
Foreign References:
| JPS615032A | 1986-01-10 | |||
| JP2015199915A | 2015-11-12 | |||
| JP2016138240A | 2016-08-04 |
Attorney, Agent or Firm:
T.S. PARTNERS et al. (JP)
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