Title:
COMPOSITION FOR A TEXTURE-ETCHING SOLUTION, AND TEXTURE-ETCHING METHOD FOR CRYSTALLINE SILICON WAFERS
Document Type and Number:
WIPO Patent Application WO/2012/091395
Kind Code:
A2
Abstract:
The present invention relates to a composition for a texture-etching solution and to a texture-etching method for crystalline silicon wafers. More particularly, the present invention relates to a composition for a texture-etching solution and to a texture-etching method for crystalline silicon wafers, wherein the composition comprises: an alkali compound; a cyclic compound; at least one surfactant selected from the group consisting of a polyoxyethylene (POE) compound, a polyoxypropylene (POP) compound, and a copolymer thereof; and water. Thus, according to the present invention, deviations in the quality of the texture of the surface of a crystalline silicon wafer can be minimized so as to improve the uniformity of the texture structure and maximize the amount of absorbed sunlight, increase efficiency by lowering light reflectivity, significantly reduce consumption by increasing the number of sheets to be processed, and increase productivity and provide high economic feasibility since it is unnecessary to additionally feed in an etchant component during the texture-forming process.
Inventors:
HONG HYUNG PYO (KR)
LEE JAE YUN (KR)
LEE SEUNG YONG (KR)
LIM DAE SUNG (KR)
LEE JAE YUN (KR)
LEE SEUNG YONG (KR)
LIM DAE SUNG (KR)
Application Number:
PCT/KR2011/010127
Publication Date:
July 05, 2012
Filing Date:
December 26, 2011
Export Citation:
Assignee:
DONGWOO FINE CHEM CO LTD (KR)
HONG HYUNG PYO (KR)
LEE JAE YUN (KR)
LEE SEUNG YONG (KR)
LIM DAE SUNG (KR)
HONG HYUNG PYO (KR)
LEE JAE YUN (KR)
LEE SEUNG YONG (KR)
LIM DAE SUNG (KR)
International Classes:
C09K13/02; C09K13/00
Foreign References:
| KR20100093098A | 2010-08-24 | |||
| JPH09246254A | 1997-09-19 | |||
| JP2008166600A | 2008-07-17 | |||
| US20110275222A1 | 2011-11-10 |
Attorney, Agent or Firm:
LEE, Joon Ho et al. (KR)
이준호 (KR)
이준호 (KR)
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Claims: