Title:
COMPOSITIONS AND METHODS FOR DEPOSITING SILICON-CONTAINING FILMS
Document Type and Number:
WIPO Patent Application WO/2019/055393
Kind Code:
A8
Abstract:
Described herein are compositions and methods of forming a dielectric film comprising silicon and carbon onto at least a surface of a substrate, the method comprising introducing into a reactor at least one silacycloalkane precursor selected from the group consisting of compounds represented by the structure of Formula IA and compounds represented by the structure of Formula IB: as defined herein.
Inventors:
LI MING (US)
LEI XINJIAN (US)
VRTIS RAYMOND (US)
RIDGEWAY ROBERT (US)
XIAO MANCHAO (US)
LEI XINJIAN (US)
VRTIS RAYMOND (US)
RIDGEWAY ROBERT (US)
XIAO MANCHAO (US)
Application Number:
PCT/US2018/050414
Publication Date:
March 26, 2020
Filing Date:
September 11, 2018
Export Citation:
Assignee:
VERSUM MAT US LLC (US)
International Classes:
C23C16/455; C07F7/08; C23C16/32; C23C16/36; C23C16/44; C23C16/50
Attorney, Agent or Firm:
ROSSI, Joseph D. et al. (US)
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