COMPOUND, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE

Title:

COMPOUND, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE

Document Type and Number:

WIPO Patent Application WO/2014/156524

Kind Code:

A1

Abstract:

Provided are a compound, actinic-ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, a method for manufacturing an electronic device using the same, and an electronic device, whereby high resolution and exposure latitude, and good pattern shape are realized in a minute (e.g., a line width or space width of 50 nm or less) region of pattern formation by an actinic-ray-sensitive or radiation-sensitive resin composition containing a compound represented by general formula (1) or (2). In the general formulas, R1-R5 each independently represent an organic group. At least two of R1-R3 may bond with each other and form a ring. At least one of R1-R3 and at least one of R4 and R5 each has at least one type of group selected from the group consisting of groups represented by general formulas (I)-(IV) described in the specification. Z- represents a non-nucleophilic anion.

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Inventors:

YOKOKAWA NATSUMI (JP)
TAKIZAWA HIROO (JP)
HIRANO SHUJI (JP)
NIHASHI WATARU (JP)
TSUBAKI HIDEAKI (JP)

Application Number:

PCT/JP2014/055678

Publication Date:

October 02, 2014

Filing Date:

March 05, 2014

Export Citation:

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Assignee:

FUJIFILM CORP (JP)

International Classes:

G03F7/004; C07C381/12; C08F12/30; C08F20/38; C08K5/36; C08L101/00; G03F7/038; G03F7/039; G03F7/32

Foreign References:

JP2012237983A	2012-12-06
JP2011006400A	2011-01-13
JP2013033229A	2013-02-14
JP2012242657A	2012-12-10
JP2012247502A	2012-12-13
JP2006241384A	2006-09-14
JP2004250427A	2004-09-09
JP2013182023A	2013-09-12

Attorney, Agent or Firm:

TAKAMATSU Takeshi et al. (JP)
Takamatsu 猛 (JP)

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