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Patent Searching and Data


Title:
COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM
Document Type and Number:
WIPO Patent Application WO/2020/040162
Kind Code:
A1
Abstract:
Provided is a composition containing a polyphenol compound (B), wherein the polyphenol compound (B) is one or more substances selected from the group consisting of compounds having the structure represented by formula (1) and resins having the structure represented by formula (2).

Inventors:
SATO TAKASHI (JP)
ECHIGO MASATOSHI (JP)
MAKINOSHIMA TAKASHI (JP)
Application Number:
PCT/JP2019/032528
Publication Date:
February 27, 2020
Filing Date:
August 21, 2019
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C08L61/04; C07C39/367; C07C69/712; C07C69/96; C08G8/00; G03F7/004; G03F7/038; G03F7/039
Domestic Patent References:
WO2016158168A12016-10-06
WO2016158169A12016-10-06
WO2016158170A12016-10-06
WO2016158456A12016-10-06
WO2016158457A12016-10-06
WO2016158458A12016-10-06
WO2017043561A12017-03-16
WO2017038643A12017-03-09
WO2017038645A12017-03-09
WO2016158168A12016-10-06
WO2013024778A12013-02-21
WO2013024778A12013-02-21
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JP2015108781A2015-06-11
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Other References:
See also references of EP 3842491A4
SHINJI OKAZAKI ET AL.: "Development of Lithography Technology in These 40 Years", 9 December 2016, S T PUBLISHING INC.
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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