COMPOUND, (CO)POLYMER, COMPOSITION, PATTERN FORMING METHOD, AND COMPOUND PRODUCTION METHOD

WIPO Patent Application WO/2020/137935

A1

The objective of the present invention is to provide a composition, or the like, capable of forming a film having high definition and high sensitivity. The objective can be achieved by the following compound. The iodide-containing (meth)acrylate compound represented by general formula (1). (In formula (1): R1 represents a hydrogen atom, a methyl group, or a halogen; each of the R2 symbols independently represents a hydrogen atom, a linear organic group having 1 to 20 carbons, a branched organic group having 3 to 20 carbons, or a cyclic organic group having 3 to 20 carbons; A represents an organic group having 1 to 30 carbons; n1 represents 0 or 1; and n2 represents an integer from 1 to 20.)

OMATSU TADASHI (JP)
MATSUMOTO MASAHIRO (JP)
YURI MICHIHIRO (JP)
KATAOKA KENTARO (JP)
SATO TAKASHI (JP)
ECHIGO MASATOSHI (JP)

PCT/JP2019/050261

July 02, 2020

December 23, 2019

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MITSUBISHI GAS CHEMICAL CO (JP)

C07C33/46; C07C67/14; C07C69/653; C08F20/22; G03F7/039; G03F7/20

WO2018180049A1

2018-10-04

JP2015516972A	2015-06-18
JP2018172640A	2018-11-08
JP2009275155A	2009-11-26
JPS6160630A	1986-03-28

SAHA, SOURABH K. ET AL.: "Radiopaque Resists for Two-Photon Lithography To Enable Submicron 3D Imaging of Polymer Parts via X-ray Computed Tomography", APPL. MATER. INTERFACES, vol. 10, 24 November 2017 (2017-11-24), pages 1164 - 1172, XP055724311
GREEN, ORI ET AL.: "Near-Infrared Dioxetane Luminophores with Direct Chemiluminescence Emission Mode", J. AM. CHEM. SOC., vol. 139, 2017, pages 13243 - 13248, XP055557533, DOI: 10.1021/jacs.7b08446

INABA, Yoshiyuki et al. (JP)

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