COMPOUND AND METHOD FOR PRODUCING SAME, COMPOSITION, COMPOSITION FOR FORMING OPTICAL COMPONENT, COMPOSITION FOR FORMING LITHOGRAPHY FILM, RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, MATERIAL FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, COMPOSITION FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR PRODUCING LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD

Title:

Document Type and Number:

WIPO Patent Application WO/2017/038979

Kind Code:

A1

Abstract:

Provided are: a compound represented by formula (1) and a method for producing same; a composition; a composition for forming an optical component; a composition for forming a lithographic film; a resist composition; a method for forming a resist pattern; a radiation-sensitive composition; a method for producing an amorphous film; a material for forming a lithographic underlayer film; a composition for forming a lithographic underlayer film; a method for producing a lithographic underlayer film; a method for forming a resist pattern; a method for forming a circuit pattern; and a purification method. (1) (In formula (1): R1 is a C1-60 2n-valent moiety or a single bond; R2–R5 are independently a linear, branched, or cyclic C1-30 alkyl moiety, a C6-30 aryl moiety, a C-2-30 alkenyl moiety, a moiety represented by formula (A), a moiety represented by formula (B), a thiol moiety, or a hydroxyl moiety, wherein at least one moiety selected from the group consisting of R2-R5 is a moiety selected from the group consisting of the moieties represented by formula (A) and the moieties represented by formula (B); m2 and m3 are independently integers of 0-8; m4 and m5 are independently integers of 0-9, with the caveat that m2, m3, m4 and m5 cannot be 0 simultaneously; n is an integer of 1-4; and p2-p5 are independently integers of 0-2. (A) (In formula (A), R6 is independently a C1-4 alkylene moiety, and m' is an integer equal to or greater than 1.) (B) (In formula (B), R6 is as defined above, R7 is a hydrogen atom or a methyl moiety, and m" is 0 or an integer equal to or greater than 1.))

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Inventors:

ECHIGO MASATOSHI (JP)

Application Number:

PCT/JP2016/075814

Publication Date:

March 09, 2017

Filing Date:

September 02, 2016

Export Citation:

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Assignee:

MITSUBISHI GAS CHEMICAL CO (JP)

International Classes:

C07C43/23; C07C41/26; C07D301/28; C07D303/28; C07D303/30; C07B61/00

Domestic Patent References:

WO2004037879A2	2004-05-06
WO2013024778A1	2013-02-21
WO2002048220A1	2002-06-20
WO2003046615A1	2003-06-05
WO2016002607A1	2016-01-07

Foreign References:

JPH0567699A	1993-03-19
JP2001122828A	2001-05-08
US5844062A	1998-12-01
JP2015087715A	2015-05-07
JPS62191850A	1987-08-22
JPS4829751A	1973-04-19

Other References: