Title:
COMPOUND, RESIN, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN AND METHOD FOR PURIFYING RESIN
Document Type and Number:
WIPO Patent Application WO/2020/158931
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a novel compound which is useful as a film forming material for lithography or as a material for forming an optical component; a resin which contains a constituent unit that is derived from this compound; a composition; a method for forming a resist pattern; a method for forming a circuit pattern; and a purification method. A compound which is represented by formula (1); a resin which contains a constituent unit that is derived from this compound; a composition which contains one or more substances that are selected from the group consisting of this compound and this resin; a method for forming a resist pattern, which uses this composition; a method for forming a circuit pattern; and a purification method thereof.
Inventors:
MAKINOSHIMA TAKASHI (JP)
OKADA YU (JP)
YAMAMOTO HIROAKI (JP)
ECHIGO MASATOSHI (JP)
OKADA YU (JP)
YAMAMOTO HIROAKI (JP)
ECHIGO MASATOSHI (JP)
Application Number:
PCT/JP2020/003740
Publication Date:
August 06, 2020
Filing Date:
January 31, 2020
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07C39/16; C07C39/17; C07C43/205; C07C43/215; C07C43/23; C07C43/263; C07C43/295; C07C69/54; C07C69/712; C07C69/96; C07C271/48; C07D303/23; C07D303/24; C08G8/00; G03F7/039; G03F7/11; G03F7/20
Domestic Patent References:
| WO2018052026A1 | 2018-03-22 | |||
| WO2018052028A1 | 2018-03-22 | |||
| WO1999029706A2 | 1999-06-17 | |||
| WO2015137485A1 | 2015-09-17 | |||
| WO2015137486A1 | 2015-09-17 |
Foreign References:
| JPH09218511A | 1997-08-19 | |||
| JPH092987A | 1997-01-07 | |||
| US4319052A | 1982-03-09 |
Other References:
SATO, TATSUNORI ET AL.: "Anion binding properties of tris(2- hydroxyphenyl)methanes", JOURNAL OF INCLUSION PHENOMENA AND MACROCYCLIC CHEMISTRY, vol. 77, no. 1-4, 2013, pages 385 - 394, XP055726059
BIALI, SILVIO E. ET AL.: "Conformation, Inversion Barrier, and Solvent-Induced Conformational Shift in Exo- and Endo/Exo-Calix[4]arenes", JOURNAL OF ORGANIC CHEMISTRY, vol. 62, no. 24, 1997, pages 8350 - 8360, XP055726061
BÖHMER VOLKER, DÖRRENBÄCHER RALPH, FRINGS MICHAEL, HEYDENREICH MATHIAS, DE PAOLI DIANA, VOGT WALTER, FERGUSON GEORGE, THONDORF IRI: "Annelated Calixarenes Composed of Calix[4]arenes with Hydroxy Groups in the Endo and Exo Position", JOURNAL OF ORGANIC CHEMISTRY, vol. 61, no. 2, 1996, pages 549 - 559, XP055726063
DATABASE REGISTRY [online] 8 November 1986 (1986-11-08), retrieved from STN Database accession no. 105094-48-2
BOEHMER, VOLKER ET AL.: "Synthesis of pure oligo[(hydroxy-5-nitro-1,3- phenylene)methylene]s, compounds with several ortho- and para-nitrophenol units in the molecule", MAKROMOLEKULARE CHEMIE, vol. 177, no. 6, 1976, pages 1745 - 1770, XP055726077
BIALI, SILVIO E. ET AL.: "Conformation, Inversion Barrier, and Solvent-Induced Conformational Shift in Exo- and Endo/Exo-Calix[4]arenes", JOURNAL OF ORGANIC CHEMISTRY, vol. 62, no. 24, 1997, pages 8350 - 8360, XP055726061
BÖHMER VOLKER, DÖRRENBÄCHER RALPH, FRINGS MICHAEL, HEYDENREICH MATHIAS, DE PAOLI DIANA, VOGT WALTER, FERGUSON GEORGE, THONDORF IRI: "Annelated Calixarenes Composed of Calix[4]arenes with Hydroxy Groups in the Endo and Exo Position", JOURNAL OF ORGANIC CHEMISTRY, vol. 61, no. 2, 1996, pages 549 - 559, XP055726063
DATABASE REGISTRY [online] 8 November 1986 (1986-11-08), retrieved from STN Database accession no. 105094-48-2
BOEHMER, VOLKER ET AL.: "Synthesis of pure oligo[(hydroxy-5-nitro-1,3- phenylene)methylene]s, compounds with several ortho- and para-nitrophenol units in the molecule", MAKROMOLEKULARE CHEMIE, vol. 177, no. 6, 1976, pages 1745 - 1770, XP055726077
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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