Title:
COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/142897
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a compound, etc., useful in forming: a photoresist to which a wet process is applicable, and which has excellent heat resistance, excellent solubility, and excellent etching resistance; and an underlayer film for the photoresist. The problem can be solved by a compound represented by formula (1).
Inventors:
ECHIGO MASATOSHI (JP)
OKADA YU (JP)
TAKIGAWA TOMOAKI (JP)
MAKINOSHIMA TAKASHI (JP)
OKADA YU (JP)
TAKIGAWA TOMOAKI (JP)
MAKINOSHIMA TAKASHI (JP)
Application Number:
PCT/JP2019/001421
Publication Date:
July 25, 2019
Filing Date:
January 18, 2019
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07C321/26; C08G10/04; C09K3/00; G03F7/11; G03F7/20; G03F7/26
Domestic Patent References:
WO2017018360A1 | 2017-02-02 | |||
WO2001068595A1 | 2001-09-20 | |||
WO2013024778A1 | 2013-02-21 | |||
WO2013024779A1 | 2013-02-21 | |||
WO2004066377A1 | 2004-08-05 | |||
WO2015080240A1 | 2015-06-04 |
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OSYANIN ET AL.: "The Mannich bases of naphthalene series in the synthesis of 14H-dibenzo[a,j]xanthenes", RUSSIAN JOURNAL OF GENERAL CHEMISTRY, vol. 85, no. 4, 2015, pages 989 - 992, XP055626178
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See also references of EP 3744710A4
ALOISIO DE ANDRADE BARTOLOMEU ET AL.: "Efficient one-pot synthesis of 14-aryl-14H-dibenzo [a,j]xanthene derivatives promoted by niobium pentachloride", CHEMICAL PAPERS, vol. 68, no. 11, 2014, pages 1593 - 1600, XP035385161
OSYANIN ET AL.: "The Mannich bases of naphthalene series in the synthesis of 14H-dibenzo[a,j]xanthenes", RUSSIAN JOURNAL OF GENERAL CHEMISTRY, vol. 85, no. 4, 2015, pages 989 - 992, XP055626178
BUU HOI N. P. ET AL.: "Thiophene derivatives of potential biological interest. II. Thianaphthene analogs of stilbene and related compounds", JOURNAL OF THE CHEMICAL SOCIETY, 1951, pages 251 - 255, XP003001224
T. NAKAYAMAM. NOMURAK. HAGAM. UEDA, BULL. CHEM. SOC. JPN., vol. 71, 1998, pages 2979
SHINJI OKAZAKI ET AL.: "New Trends of Photoresists", September 2009, CMC PUBLISHING CO., LTD., pages: 211 - 259
J. AM. CHEM. SOC., vol. 122, no. 28, 2000
See also references of EP 3744710A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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