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Title:
COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/142897
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a compound, etc., useful in forming: a photoresist to which a wet process is applicable, and which has excellent heat resistance, excellent solubility, and excellent etching resistance; and an underlayer film for the photoresist. The problem can be solved by a compound represented by formula (1).

Inventors:
ECHIGO MASATOSHI (JP)
OKADA YU (JP)
TAKIGAWA TOMOAKI (JP)
MAKINOSHIMA TAKASHI (JP)
Application Number:
PCT/JP2019/001421
Publication Date:
July 25, 2019
Filing Date:
January 18, 2019
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07C321/26; C08G10/04; C09K3/00; G03F7/11; G03F7/20; G03F7/26
Domestic Patent References:
WO2017018360A12017-02-02
WO2001068595A12001-09-20
WO2013024778A12013-02-21
WO2013024779A12013-02-21
WO2004066377A12004-08-05
WO2015080240A12015-06-04
Foreign References:
JP2017227810A2017-12-28
US20180013074A12018-01-11
JPH02118639A1990-05-02
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Other References:
MONDAL JOHN ET AL.: "Functionalized mesoporous materials as efficient organocatalysts for the syntheses of xanthenes", JOURNAL OF MOLECULAR CATALYSIS A: CHEMICAL, vol. 363 - 364, 7 July 2012 (2012-07-07), pages 254 - 264, XP055626171
ALOISIO DE ANDRADE BARTOLOMEU ET AL.: "Efficient one-pot synthesis of 14-aryl-14H-dibenzo [a,j]xanthene derivatives promoted by niobium pentachloride", CHEMICAL PAPERS, vol. 68, no. 11, 2014, pages 1593 - 1600, XP035385161
OSYANIN ET AL.: "The Mannich bases of naphthalene series in the synthesis of 14H-dibenzo[a,j]xanthenes", RUSSIAN JOURNAL OF GENERAL CHEMISTRY, vol. 85, no. 4, 2015, pages 989 - 992, XP055626178
BUU HOI N. P. ET AL.: "Thiophene derivatives of potential biological interest. II. Thianaphthene analogs of stilbene and related compounds", JOURNAL OF THE CHEMICAL SOCIETY, 1951, pages 251 - 255, XP003001224
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See also references of EP 3744710A4
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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