Title:
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/016615
Kind Code:
A1
Abstract:
Provided is a compound represented by formula (0). (0) (RY is a C1–30 alkyl group or a C6–30 aryl group; RZ is a C1–60 N-valent group or a single bond; and RT is a C1–30 alkyl group, a C6–30 aryl group, a C2–30 alkenyl group, a C1–30 alkoxy group, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a thiol group, a hydroxyl group, or a group in which a hydrogen atom of the hydroxyl group has been substituted with a hydroxyalkyl group or a glycidyl group (the alkyl group, aryl group, alkenyl group, and alkoxy group may include an ether bond, ketone bond, or ester bond), wherein at least one RT includes a group in which a hydrogen atom of the hydroxyl group has been substituted with a hydroxyalkyl group or has been substituted with a glycidyl group. X represents an oxygen atom or a sulfur atom, or is uncrosslinked; m is an integer from 0 to 9 (with at least one m being an integer from 1 to 9); N is an integer from 1 to 4; and r is an integer from 0 to 2.)
Inventors:
ECHIGO MASATOSHI (JP)
Application Number:
PCT/JP2017/026423
Publication Date:
January 25, 2018
Filing Date:
July 21, 2017
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
C07C43/23; C07C43/20; C07C43/205; C07D303/27; C07D311/78; C07D311/82; C07D407/12; C08G59/20; G03F7/031; G03F7/11; G03F7/26; H01L21/027
Domestic Patent References:
| WO2016002607A1 | 2016-01-07 | |||
| WO2017003899A1 | 2017-01-05 | |||
| WO2016129350A1 | 2016-08-18 |
Foreign References:
| JP2004277460A | 2004-10-07 | |||
| JP2013087173A | 2013-05-13 | |||
| KR101532341B1 | 2015-06-29 | |||
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| JPS4829751A | 1973-04-19 | |||
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| JP2016204553A | 2016-12-08 |
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
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