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Title:
COMPOUND, STARTING MATERIAL FOR THIN FILM FORMATION, THIN FILM PRODUCTION METHOD, AND AMIDINE COMPOUND
Document Type and Number:
WIPO Patent Application WO/2018/088079
Kind Code:
A1
Abstract:
Provided is a starting material for thin film formation which comprises a compound represented by general formula (1). (In the formula, R1 denotes a straight- or branched-chain alkyl group having 1-5 carbon atoms, R2 denotes a hydrogen atom or a straight- or branched-chain alkyl group having 1-5 carbon atoms, R3 and R4 each independently denote a straight- or branched-chain alkyl group having 1-5 carbon atoms, A denotes an alkane diyl group having 1-4 carbon atoms, and M denotes copper, iron, nickel, cobalt or manganese.)

Inventors:
YOSHINO TOMOHARU (JP)
SUGIURA NANA (JP)
NISHIDA AKIHIRO (JP)
YAMASHITA ATSUSHI (JP)
Application Number:
PCT/JP2017/036318
Publication Date:
May 17, 2018
Filing Date:
October 05, 2017
Export Citation:
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Assignee:
ADEKA CORP (JP)
International Classes:
C07F15/06; C07C257/14; C23C16/18
Domestic Patent References:
WO2009094263A12009-07-30
WO2009094262A12009-07-30
WO2009105668A12009-08-27
Foreign References:
JP2014511380A2014-05-15
JP2009504913A2009-02-05
JP2008502680A2008-01-31
JP2013104100A2013-05-30
GB1209997A1970-10-28
JP2004002306A2004-01-08
JP2006511716A2006-04-06
JP2013545755A2013-12-26
JP2016217749A2016-12-22
Other References:
See also references of EP 3539973A4
Attorney, Agent or Firm:
SOGA, Michiharu et al. (JP)
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