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Title:
COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND TRANSISTOR PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2018/143173
Kind Code:
A1
Abstract:
Provided is a compound represented by general formula (1).

Inventors:
KAWAKAMI YUSUKE (JP)
YAMAGUCHI KAZUO (JP)
ITOU MICHIKO (JP)
Application Number:
PCT/JP2018/002899
Publication Date:
August 09, 2018
Filing Date:
January 30, 2018
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Assignee:
NIKON CORP (JP)
UNIV KANAGAWA (JP)
International Classes:
C07F7/18; H01L21/28; H01L21/288; H01L21/336; H01L29/417; H01L29/423; H01L29/49; H01L29/786
Domestic Patent References:
WO2016136817A12016-09-01
Foreign References:
US20050245739A12005-11-03
JP2007186472A2007-07-26
JP2014145020A2014-08-14
Attorney, Agent or Firm:
NISHIZAWA Kazuyoshi et al. (JP)
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