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Title:
COMPOUNDS DERIVED FROM POLYANHYDRIDE RESINS WITH FILM-FORMING, UV- ABSORBING, AND PHOTOSTABILIZING PROPERTIES, COMPOSITIONS CONTAINING SAME, AND METHODS OF USING THE SAME
Document Type and Number:
WIPO Patent Application WO/2005/082961
Kind Code:
A1
Abstract:
Polymers containing one or more crylene moieties attached to the polymer backbone, sunscreen compositions including a mixture of a photoactive compound and a polymer containing one or more crylene moieties attached to the polymer backbone are described herein. Also disclosed are methods for stabilizing a sunscreen composition and methods of filtering out ultra-violet light from a substrate by the addition of one or more of the foregoing polymers, and methods of waterproofing and forming a film with one or more of the foregoing polymer are described herein.

Inventors:
BONDA CRAIG A (US)
PAVLOVIC ANNA (US)
Application Number:
PCT/US2005/004591
Publication Date:
September 09, 2005
Filing Date:
February 15, 2005
Export Citation:
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Assignee:
CPH INNOVATIONS CORP (US)
BONDA CRAIG A (US)
PAVLOVIC ANNA (US)
International Classes:
C08F8/14; C08F222/10; (IPC1-7): C08F222/10; C08F8/14
Foreign References:
US20010022966A12001-09-20
Attorney, Agent or Firm:
Anderson, Richard H. (Gerstein & Borun LLP Suite 6300, Sears Tower, 233 S. Wacker Driv, Chicago IL, US)
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Claims:
WHAT IS CLAIMED IS :
1. A polymer comprising monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof : wherein R1 and R5 are the same or different and are selected from the group consisting of ClCSo alkyl, C2C5o allcenyl, C2Cso alkyne, C3C8 cycloalkyl, ClCso polyether, C1C50 substituted polyether, CCso substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; R2 and R6 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3Cg cycloalkyl, C1C50 polyether, ClCso substituted polyether, ClCso substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R4, R and R8 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClCso polyether, C1C50 substituted polyether, Cl Cso substituted alkyl, C3C8 substituted cycloalkyl, C2Cso substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1.
2. The polymer of claim 1, further comprising monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, Rll, R13 and R14 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rl° and Rl2 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
3. The polymer of claim 2, wherein Rl° and R12 are the same or different and are selected from the group consisting of CloC3s alkyl groups.
4. '.
5. The polymer of claim 3, wherein Rl° and R12 are the same or different and are selected from the group consisting of Cl6, Cl8, and C22 alkyl groups.
6. The polymer of claim 2, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C3C30 polyether groups.
7. The polymer of claim 5, wherein Rl° and R12 are the same and are 2 butoxy1ethoxyethane.
8. The polymer of claim 1, wherein R2 and R6 are the same or different and are selected from the group consisting of C2C15 alkyl groups.
9. The polymer of claim 7, wherein R2 and R6 are the same and are 2,2 dimethylpropane.
10. The polymer of claim 2, wherein the sum of g and h is at least 1.
11. The polymer of claim 2, wherein Rl, R5, R9, R11, R13 and R14 are the same or different and are selected from the group consisting of C5C25 alkyl groups.
12. The polymer of claim 10, wherein Rl, R5, R9, Rl l, Rl3 and Rl4 are the same and are C16 straight chain alkyl groups.
13. The polymer of claim 1, wherein the WeightAverage Molecular Weight of said polymer is in the range of about 30, 000 to about 110,000.
14. A sunscreen composition, comprising a mixture of a photoactive compound, and a polymer comprising monomers selected from the group consisting of a monomer of formula (1), a monomer of formula (II), and combinations thereof : wherein Ri and R5 are the same or different and are selected from the group consisting of ClC50 alkyl, C2Cso alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne; R and R6 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2Cso alkyne, C3Cg cycloalkyl, C1C50 polyether, ClCso substituted polyether, ClCso substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R4, R7 and R8 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2Cso alkyne, C3C8 cycloalkyl, ClCso polyether, ClCso substituted polyether, Cl Cso substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, CzCso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1.
15. The composition of claim 13, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, Rll, R13 and R14 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, Clso substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2Cso substituted alkenyl, C2Cso substituted alkyne; Rio and Rl2 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2Cso alkyne, C3C8 cycloalkyl, ClCso polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
16. The composition of claim 14, wherein Rl° and R12 are the same or different and are selected from the group consisting of CloC3s alkyl groups.
17. The composition of claim 15, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
18. The composition of claim 14, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C3C30 polyether groups.
19. The composition of claim 17, wherein Rl° and Rl2 are the same and are 2butoxy1ethoxyethane.
20. The composition of claim 13, wherein R ? and R6 are the same or different and are selected from the group consisting of C2Cls alkyl groups.
21. The composition of claim 19, wherein R2 and R6 are the same and are 2,2dimethylpropane.
22. The composition of claim 13, wherein said polymer is present said composition in an amount in the range of about 0.01% to about 30% by weight of the total weight of the composition.
23. The composition of claim 21, wherein said polymer is present said composition in an amount in the range of about 0. 01 % to about 10% by weight of the total weight of the composition.
24. The composition of claim 13, further comprising a diester or polyester of naphthalene dicarboxylic acid selected from the group consisting of compounds of formulae (XXX) and (XXXI), and combinations thereof : wherein R93 and R94 are the same or different and selected from the group consisting of ClC22 alkyl groups, diols having the structure HOROH and polyglycols having the structure HOR90 (OR91)γOH ; wherein each R90 and R9l is the same or different and selected from the group consisting of ClC6 straight or branched chain alkyl groups; and wherein a and y are each in a range of 1 to 100 and p is in a range of 0 to 100.
25. A method of protecting human skin from ultraviolet radiation comprising topically applying to said skin, in a cosmetically acceptable carrier, the composition of claim 13.
26. A method of protecting a surface from ultraviolet radiation, comprising topically applying to said surface, in a cosmetically acceptable carrier, a polymer comprising monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof : wherein Rl and Rs are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3Cg cycloalkyl, ClCso polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; R2 and R6 are the same or different and are selected from the group consisting of C,Cso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, Clso substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2Cso substituted alkenyl, C2Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R4, R7 and R8 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, Cl Cso substituted alkyl, C3C8 substituted cycloalkyl, C2Cso substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted. heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1.
27. The method of claim 25, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, R11, R13 and R14 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C5o alkyne, C3C8 cycloalkyl, C1C50 polyether, ClCso substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rl° and R12 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2Cso substituted alkenyl, C2Cso substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
28. The method of claim 26, wherein Rl° and R12 are the same or different and are selected from the group consisting of C10C35 alkyl groups.
29. The method of claim 27, wherein Rl° and R12 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
30. The method of claim 26, wherein Rl° and R12 are the same or different and are selected from the group consisting of C3C30 polyether groups.
31. The method of claim 29, wherein Rl° and R12 are the same and are 2 butoxy1ethoxyethane.
32. The method of claim 25, wherein R2 and R6 are the same or different and are selected from the group consisting of C2C15 alkyl groups.
33. The method of claim 31, wherein W and R6 are the same and are 2,2 dimethylpropane.
34. The method of claim 26, wherein the sum of g and h is at least 1.
35. The method of claim 25, wherein said surface comprises human skin.
36. A method of waterproofing a surface, comprising applying a polymer comprising monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof to a selected area of said surface : wherein Rl and Rs are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, CsCg cycloalkyl, ClCso polyether, ClCso substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2Cso substituted alkenyl, C2Cso substituted alkyne; R2 and R6 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R4, R7 and R8 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, Cl Cso substituted alkyl, CsCs substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1.
37. The method of claim 35, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, R11, R13 and R14 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C5o alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2Cso substituted alkenyl, C2Cso substituted alkyne; Rl° and R12 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClCso substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
38. The method of claim 36, wherein Rl° and R12 are the same or different and are selected from the group consisting of CloC3s alkyl groups.
39. The method of claim 37, wherein Rl° and R12 are the same or different and are selected from the group consisting of Cl6, Cl8, and C22 alkyl groups.
40. The method of claim 36, wherein Rl° and R12 are the same or different and are selected from the group consisting of C3C30 polyether groups.
41. The method of claim 39, wherein Rl° and R12 are the same and are 2 butoxy1ethoxyethane.
42. The method of claim 35, wherein R and R6 are the same or different and are selected from the group consisting of C2C15 alkyl groups.
43. The method of claim 41, wherein R2 and R6 are the same and are 2,2 dimethylpropane.
44. The method of claim 36, wherein the sum of g and h is at least 1.
45. The method of claim 35, wherein said surface comprises human skin.
46. A method for forming a film over at least part of a surface, comprising spreading a polymer comprising monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof on said part of said surface: wherein Rl and Rs are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Ra and R6 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50, alkenyl, C2Cso alkyne, CsCs cycloalkyl, ClCso polyether, C1C50 substituted polyether, ClCso substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R4, R and R8 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3Cg cycloalkyl, ClCso polyether, ClCso substituted polyether, Cl 50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1.
47. The method of claim 45, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, R11, R13 and Rl4 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3Cg cycloalkyl, ClC50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne; R10 and R12 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
48. The method of claim 46, wherein Rl° and R12 are the same or different and are selected from the group consisting of CloC3s alkyl groups.
49. The method of claim 47, wherein Rl° and R12 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
50. The method of claim 46, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C3C30 polyether groups.
51. The method of claim 49, wherein Rl° and Rl2 are the same and are 2 butoxy1ethoxyethane.
52. The method of claim 45, wherein R2 and R6 are the same or different and are selected from the group consisting of C2C15 alkyl groups.
53. The method of claim 51, wherein R and R6 are the same and are 2,2 dimethylpropane.
54. The method of claim 46, wherein the sum of g and h is at least 1.
55. The method of claim 45, wherein said surface comprises human skin.
56. A method of photostabilizing a dibenzoylmethane derivative, said method comprising the step of, adding to said dibenzoylmethane derivative a photostabilizing amount of a polymer comprising monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof : wherein R'and W are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C5o alkyne, C3Cg cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClCso substituted alkyl, C3C8 substituted cycloalkyl, C2Cso substituted alkenyl, C2CSO substituted alkyne; W and R6 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClCso substituted alkyl, C3C8 substituted cycloalkyl, C2Cso substituted alkenyl, C2Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R4, R7 and R8 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2Cso alkyne, C3Cg cycloalkyl, C1C50 polyether, C1C50 substituted polyether, Cl Cso substituted alkyl, C3Cg substituted cycloalkyl, C2C5o substituted alkenyl, C2Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1.
57. The method of claim 55, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, R11, R13 and R14 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C5o alkyne, C3Cg cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rl° and R12 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClCso polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
58. The method of claim 56, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C10C35 alkyl groups.
59. The method of claim 57, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
60. The method of claim 56, wherein Rl° and R12 are the same or different and are selected from the group consisting of C3C30 polyether groups.
61. The method of claim 59, wherein Rl° and Ri2 are the same and are 2 butoxy1ethoxyethane.
62. The method of claim 55, wherein W and R6 are the same or different and are selected from the group consisting of C2C15 alkyl groups.
63. The method of claim 61, wherein W and R6 are the same and are 2,2 dimethylpropane.
64. The method of claim 56, wherein the sum of g and h is at least 1.
65. A polymer comprising monomers selected from the group consisting of a monomer for formula (VII), a monomer of formula (VIII), and combinations thereof : wherein Rl5 and Rl9 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, CiCso polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; R16 and Wo are the same or different and are selected from the group consisting of ClCso alkyl, C2C50 alkenyl, C2C50 alkyne, C3Cg cycloalkyl, ClC50 polyether, ClC50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; Rl7, Rl8, R21 and R22 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2Cso substituted alkenyl, C2Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and p are each in the range of 0 to 4; k and n are each in the range of 0 to 200, and the sum of k and n is at least 1.
66. The polymer of claim 64, further comprising a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, R11, R13 and R14 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C5 alkenyl, CzCso alkyne, C3C8 cycloalkyl, C1C50 polyether, ClCso substituted polyether, ClCso substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C5o substituted alkyne ; Rio and RIZ are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, ClCso substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
67. The polymer of claim 65, wherein Rl° and R12 are the same or different and are selected from the group consisting of CloC3s alkyl groups.
68. The polymer of claim 66, wherein Rl° and R12 are the same or different and are selected from the group consisting Of C16, Cis, and C22 alkyl groups.
69. The polymer of claim 65, wherein Rl° and R12 are the same or different and are selected from the group consisting of C3C30 polyether groups.
70. The polymer of claim 5, wherein Rl° and R12 are the same and are 2 butoxy1ethoxyethane.
71. The polymer of claim 64, wherein R16 and R20 are the same or different and are selected from the group consisting Of C2CI5 alkyl groups.
72. The polymer of claim 70, wherein R16 and R20 are the same and are 2,2dimethylpropane.
73. The polymer of claim 65, wherein the sum of g and h is at least 1.
74. The polymer of claim 65, wherein R9, R11, R13, R14, R15 and R19 are the same or different and are selected from the group consisting of C5C25 alkyl groups.
75. The polymer of claim 73, wherein R9, R11, R13, R14, R15 and Rl9 are the same and are C16 straight chain alkyl groups.
76. The polymer of claim 64, wherein the WeightAverage Molecular Weight of said polymer is in the range of about 30, 000 to about 110, 000.
77. A sunscreen composition, comprising a mixture of a photoactive compound, and a polymer comprising monomers selected from the group consisting of a monomer for formula (VII), a monomer of formula (VIII), and combinations thereof : wherein Rl5 and Rl9 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C5o alkyne, C3C8 cycloalkyl, ClCso polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne ; R16 and R2° are the same or different and are selected from the group consisting of CC50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClCso polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2C5o substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; Rl7, Rl8, R21 and R22 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClC50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and p are each in the range of 0 to 4; k and n are each in the range of 0 to 200, and the sum of k and n is at least 1.
78. The composition of claim 76, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, R11, R13 and R14 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rl° and R12 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClC50 polyether, ClC50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
79. The composition of claim 77, wherein Rl° and R12 are the same or different and are selected from the group consisting of C10C35 alkyl groups.
80. The composition of claim 78, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
81. The composition of claim 77, wherein Rl° and R12 are the same or different and are selected from the group consisting of C3C30 polyether groups.
82. The composition of claim 80, wherein Rl° and Rl2 are the same and are 2butoxy1ethoxyethane.
83. The composition of claim 76, wherein R16 and R20 are the same or different and are selected from the group consisting of C2C15 alkyl groups.
84. The composition of claim 82, wherein R16 and R20 are the same and are 2, 2dimethylpropane.
85. The composition of claim 76, wherein said polymer is present said composition in an amount in the range of about 0.01% to about 30% by weight of the total weight of the composition.
86. The composition of claim 84, wherein said polymer is present said composition in an amount in the range of about 0. 01 % to about 10% by weight of the total weight of the composition.
87. The composition of claim 76, further comprising a diester or polyester of naphthalene dicarboxylic acid selected from the group consisting of compounds of formulae (XXX) and (XXXI), and combinations thereof : wherein R93 and R94 are the same or different and selected from the group consisting of ClC22 alkyl groups, diols having the structure HOROH and polyglycols having the structure HOR90 (OR91) r OH ; wherein each R90 and R9l is the same or different and selected from the group consisting of ClC6 straight or branched chain alkyl groups; and wherein oc and y are each in a range of 1 to 100 and P is in a range of 0 to 100.
88. A method of protecting human skin from ultraviolet radiation comprising topically applying to said skin, in a cosmetically acceptable carrier, the composition of claim 76.
89. A method of protecting a surface from ultraviolet radiation, comprising topically applying to said surface, in a cosmetically acceptable carrier, a polymer comprising monomers selected from the group consisting of a monomer for formula (VII), a monomer of formula (VIII), and combinations thereof : wherein Rl5 and Rl9 are the same or different and are selected from the group consisting of ClC50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3Cs substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; R16 and R20 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3Cg cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; Rl7, R18, R21 and R22 are the same or different and are selected from the group consisting of ClC5o alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClC50 polyether, ClC50 substituted polyether, C1C50 substituted alkyl, CaCs substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and p are each in the range of 0 to 4; k and n are each in the range of 0 to 200, and the sum of k and n is at least 1.
90. The method of claim 88, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, Rll, R13 and R14 are the same or different and are selected from the group consisting of ClC50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rl° and R12 are the same or different and are selected from the group consisting of ClC5o alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, ClC50 substituted polyether, ClC50 substituted alkyl, C3Cg substituted cycloalkyl, C2Cso substituted alkenyl, C2C50 substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
91. The method of claim 89, wherein Rl° and R12 are the same or different and are selected from the group consisting of C10C35 alkyl groups.
92. The method of claim 90, wherein Rl° and Ri2 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
93. The method of claim 89, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C3C30 polyether groups.
94. The method of claim 92, wherein Rl° and Rl2 are the same and are 2 butoxy1ethoxyethane.
95. The method of claim 88, wherein R16 and R20 are the same or different and are selected from the group consisting of C2C15 alkyl groups.
96. The method of claim 94, wherein R16 and R20 are the same and are 2,2 dimethylpropane.
97. The method of claim 89, wherein the sum of g and h is at least 1.
98. The method of claim 88, wherein said surface comprises human skin.
99. A method of waterproofing a surface, comprising applying a polymer comprising monomers selected from the group consisting of a monomer for formula (VII), a monomer of formula (VIII), and combinations thereof to a selected area of said surface: wherein Rl5 and Rl9 are the same or different and are selected from the group consisting of ClCso alkyl, C2C50 alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; R16 and R20 are the same or different and are selected from the group consisting of Clcso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyi, CsCg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R Rl8, R21 and R22 are the same or different and are selected from the group consisting of ClC50 alkyl, C2Cso alkenyl, C2C50 alkyne, C3Cg cycloalkyl, ClCso polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and polare each in the range of 0 to 4; k and n are each in the range of 0 to 200, and the sum of k and n is at least 1.
100. The method of claim 98, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, Rll, R13 and R14 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, ClC50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rl° and R12 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, ClC50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne ; and g, h, i and j are each in the range of 0 to 200.
101. The method of claim 99, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C10C35 alkyl groups.
102. The method of claim 100, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
103. The method of claim 99, wherein Rl° and R12 are the same or different and are selected from the group consisting of C3C30 polyether groups.
104. The method of claim 102, wherein Rl° and Rl2 are the same and are 2 butoxy1ethoxyethane.
105. The method of claim 98, wherein R16 and R20 are the same or different and are selected from the group consisting of C2C15 alkyl groups.
106. The method of claim 104, wherein R16 and R20 are the same and are 2,2dimethylpropane.
107. The method of claim 99, wherein the sum of g and h is at least 1.
108. A method for forming a film over at least part of a surface, comprising spreading a polymer comprising monomers selected from the group consisting of a monomer for formula (VII), a monomer of formula (VIII), and combinations thereof on said part of said surface: wherein Rl5 and Rl9 are the same or different and are selected from the group consisting of ClC50 alkyl, C2C50 alkenyl, C2CSo alkyne, C3Cg cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rl6 and Wo are the same or different and are selected from the group consisting of ClCso alkyl, C2C50 alkenyl, C2C5o alkyne, C3C8 cycloalkyl, C1C50 polyether, ClC50 substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; Rl7, R18, Wl and W2 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2CSo alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and p are each in the range of 0 to 4; k and n are each in the range of 0 to 200, and the sum of k and n is at least 1.
109. The method of claim 107, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, R11, R13 and R14 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rl° and R12 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2Cso alkyne, C3Cg cycloalkyl, CC50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
110. The method of claim 108, wherein Rl° and R12 are the same or different and are selected from the group consisting of C10C35 alkyl groups.
111. The method of claim 109, wherein Rl° and R12 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
112. The method of claim 108, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C3C30 polyether groups.
113. The method of claim 111, wherein Rl° and RI2 are the same and are 2 butoxy1ethoxyethane.
114. The method of claim 107, wherein R16 and R2° are the same or different and are selected from the group consisting of C2Cl5 alkyl groups.
115. The method of claim 113, wherein Rl6 and R20 are the same and are 2,2dimethylpropane.
116. The method of claim 108, wherein the sum of g and h is at least 1.
117. A method of photostabilizing a dibenzoylmethane derivative, said method comprising the step of, adding to said dibenzoylmethane derivative a photostabilizing amount of a polymer comprising monomers selected from the group consisting of a monomer for formula (VII), a monomer of formula (VIII), and combinations thereof : wherein Rl5 and Rl9 are the same or different and are selected from the group consisting of ClCso alkyl, C2C50 alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, ClC50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne; R16 and R20 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClC50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R17, R18, R21 and R22 are the same or different and are selected from the group consisting of ClC5o alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and p are each in the range of 0 to 4; k and n are each in the range of 0 to 200, and the sum of k and n is at least 1.
118. The method of claim 116, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, Rll, Rl3 and R14 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, ClC50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne ; Rl° and Rl2 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2Cso substituted alkenyl, C2C50 substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
119. The method of claim 117, wherein Rl° and Ri2 are the same or different and are selected from the group consisting of CloC35 alkyl groups.
120. The method of claim 118, wherein Rl° and R12 are the same or different and are selected from the group consisting of C16, Clg, and C22 alkyl groups.
121. The method of claim 117, wherein Rl° and R12 are the same or different and are selected from the group consisting of C3C30 polyether groups.
122. The method of claim 120, wherein Rl° and R12 are the same and are 2 butoxy1ethoxyethane.
123. The method of claim 116, wherein R16 and R20 are the same or different and are selected from the group consisting of C2Cl5 alkyl groups.
124. The method of claim 122, wherein R16 and R20 are the same and are 2, 2dimethylpropane.
125. The method of claim 117, wherein the sum of g and h is at least 1.
126. A polymer comprising monomers selected from the group consisting of a monomer for formula (XIII), a monomer of formula (XIV), and combinations thereof : wherein R29 and R31 are the same or different and are selected from the group consisting of C1C5o alkyl, C2Cso alkenyl, C2C5o alkyne, C3C8 cycloalkyl, ClCso polyether, ClC50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; R30 and R32 are the same or different and are selected from the group consisting of ClC50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1; M and N are the same or different and are selected from the group consisting of oxygen, and amino; A and B are the same or different and are each a photoactive compound containing at least one moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the Wo group at said moiety and B* is bound to the R32 group at said moiety.
127. The polymer of claim 125, wherein A* and B* are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXVII): wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of said R30 or R32 groups ; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of said Wo or R32 groups, and one of J and K are bound to one of said R30 or R32 groups.
128. The polymer of claim 126, wherein A and B are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV): wherein M, N, P, Q, S, T and U are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein M, N, P, Q, S, T and U are bound to one of said R30 or R32 groups.
129. The polymer of claim 125, further comprising monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, Rll, R"and'R 14 are the same or different and are selected from the group consisting of ClC50 alkyl, C2C5o alkenyl, CzCso alkyne, CsCg cycloalkyl, ClC50 polyether, ClC50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2CsO substituted alkyne; Rl° and R12 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClC50 polyether, ClCso substituted polyether, ClC50 substituted alkyl, C3Cg substituted cycloalkyl, C2Cso substituted alkenyl, C2C50 substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
130. The polymer of claim 128, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C10C35 alkyl groups.
131. The polymer of claim 129, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
132. The polymer of claim 128, wherein Rl° and Rl2 are the same or different and are selected from the group consisting of C3C30 polyether groups.
133. The polymer of claim 5, wherein Rl° and R12 are the same and are 2 butoxy1ethoxyethane.
134. The polymer of claim 125, wherein R30 and R32 are the same or different and are selected from the group consisting of C2Cl5 alkyl groups.
135. The polymer of claim 128, wherein the sum of g and h is at least 1.
136. The polymer of claim 125, wherein the WeightAverage Molecular Weight of said polymer is in the range of about 30,000 to about 110,000.
137. A sunscreen composition, comprising a mixture of a photoactive compound, and a polymer comprising monomers selected from the group consisting of a monomer for formula (XIII), a monomer of formula (XIV), and combinations thereof : wherein R29 and R31 are the same or different and are selected from the group consisting of ClC50 alkyl, C2Cso alkenyl, C2C5o alkyne, C3Cg cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne ; R30 and R32 are the same or different and are selected from the group consisting of ClC5o alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloallcyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1 ; M and N are the same or different and are selected from the group consisting of oxygen, and amino; A* and B* are the same or different and are each a photoactive compound containing at least one moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the R ? o group at said moiety and B* is bound to the R32 group at said moiety.
138. The composition of claim 136, wherein A* and B* are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXVII): wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of said Ro or R32 groups; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of said Wo or R32 groups, and one of J and K are bound to one of said R30 or R32 groups.
139. The composition of claim 137, wherein A* and B* are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV): wherein D, E, F, G, I, J, and K are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein said groups D, E, F, G, I, J, and K are bound to one of said R30 or R32 groups.
140. The composition of claim 136, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R, Roll, R13 and R14 are the same or different and are selected from the group consisting of ClC50 alkyl, C2CSO alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClCso substituted alkyl, C3Cg substituted cycloalkyl, C2Cso substituted alkenyl, C2Cso substituted alkyne; Rio and Rl2 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2Cso alkyne, C3Cg cycloalkyl, ClCso polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2Cso substituted alkenyl, C2C50 substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
141. The composition of claim 139, wherein Rio and R12 are the same or different and are selected from the group consisting of CloC35 alkyl groups.
142. The composition of claim 140, wherein Rio and Rl2 are the same or different and are selected from the group consisting of Cl6, Cls, and C22 alkyl groups.
143. The composition of claim 139, wherein Rio and R12 are the same or different and are selected from the group consisting of C3C50 polyether groups.
144. The composition of claim 142, wherein Rio and R12 are the same and are 2butoxylethoxyethane.
145. The composition of claim 136, wherein R30 and R32 are the same or different and are selected from the group consisting of C2Cls alkyl groups.
146. The composition of claim 136, wherein said polymer is present said composition in an amount in the range of about 0.01% to about 30% by weight of the total weight of the composition.
147. The composition of claim 145, wherein said polymer is present said composition in an amount in the range of about 0. 01% to about 10% by weight of the total weight of the composition.
148. The composition of claim 139, wherein the sum of g and h is at least 1.
149. A method of protecting human skin from ultraviolet radiation comprising topically applying to said skin, in a cosmetically acceptable carrier, the composition of claim 136.
150. A method of protecting a surface from ultraviolet radiation, comprising topically applying to said surface, in a cosmetically acceptable carrier, a polymer comprising monomers selected from the group consisting of a monomer for formula (XIII), a monomer of formula (XIV), and combinations thereof : wherein R29 and R31 are the same or different and are selected from the group consisting of ClC5O alkyl, C2C5o alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Wo and R32 are the same or different and are selected from the group consisting of ClCSo alkyl, C2Cso alkenyl, C2C50 alkyne, C3Cg cycloalkyl, ClC50 polyether, ClC50 substituted polyether, ClC50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1; M and N are the same or different and are selected from the group consisting of oxygen, and amino; A and B* are the same or different and are each a photoactive compound containing at least one moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the R30 group at said moiety and B* is bound to the R32 group at said moiety.
151. The method of claim 149, wherein A* and B* are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXV) : wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of said R30 or R32 groups ; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of said R30 or R32 groups, and one of J and K are bound to one of said R30 or R32 groups.
152. The method of claim 150, wherein A* and B* are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV): wherein D, E, F, G, I, J, and K are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein D, E, F, G, I, J, and K are bound to one of said R30 or R32 groups.
153. The method of claim 149, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, R11, R13 and R14 are the same or different and are selected from the group consisting of ClC50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3Cg cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rio and Rl2 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, ClC50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; and g, li, i and j are each in the range of 0 to 200.
154. The method of claim 152, wherein Rl° and Ri2 are the same or different and are selected from the group consisting of C10C35 alkyl groups.
155. The method of claim 153, wherein Rl° and R12 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
156. The method of claim 152, wherein Rl° and R12 are the same or different and are selected from the group consisting of C3C30 polyether groups.
157. The method of claim 155, wherein Rl° and Rl2 are the same and are 2 butoxy1ethoxyethane.
158. The method of claim 149, wherein R30 and R32 are the same or different and are selected from the group consisting of C2C15 alkyl groups.
159. The method of claim 152, wherein the sum of g and h is at least 1.
160. The method of claim 149, wherein said surface comprises human skin.
161. A method of waterproofing a surface, comprising applying a polymer comprising monomers selected from the group consisting of a monomer for formula (XIII), a monomer of formula (XIV), and combinations thereof to a selected area of said surface: wherein R29 and R31 are the same or different and are selected from the group consisting of ClC5o alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClC50 polyether, ClC50 substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; R3 () and R32 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClC50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1; M and N are the same or different and are selected from the group consisting of oxygen, and amino ; A* and B* are the same or different and are each a photoactive compound containing at least one moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the R30 group at said moiety and B* is bound to the R32 group at said moiety.
162. The method of claim 160, wherein A* and B* are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXVII) : wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of said R30 or R32 groups; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of said R30 or R32 groups, and one of J and K are bound to one of said Wo or R32 groups.
163. The method of claim 161, wherein A* and B* are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV): wherein D, E, F, G, I, J, and K are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein D, E, F, G, I, J, and K are bound to one of said R30 or R32 groups.
164. The method of claim 160, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, R11, R13 and R14 are the same or different and are selected from the group consisting of ClC50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClC50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rl° and R12 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
165. The method of claim 163, wherein Rl° and R12 are the same or different and are selected from the group consisting of CloC35 alkyl groups.
166. The method of claim 164, wherein Rl° and R12 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
167. The method of claim 163, wherein Rl° and R12 are the same or different and are selected from the group consisting of C3C30 polyether groups.
168. The method of claim 166, wherein Rl° and R12 are the same and are 2 butoxy1ethoxyethane.
169. The method of claim 160, wherein R30 and and, are the same or different and are selected from the group consisting Of C2CI5 alkyl groups.
170. The method of claim 163, wherein the sum of g and h is at least 1.
171. A method for forming a film over at least part of a surface, comprising spreading a polymer comprising monomers selected from the group consisting of a monomer for formula (XIII), a monomer of formula (XIV), and combinations thereof on said part of said surface: wherein R29 and R31 are the same or different and are selected from the group consisting of ClC5o alkyl, C2Cso alkenyl, C2C5o alkyne, C3C8 cycloalkyl, C1C50 polyether, ClC50 substituted polyether, ClCso substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; R30 and R32 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClC50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2Cso substituted alkenyl, C2Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1 ; M and N are the same or different and are selected from the group consisting of oxygen, and amino; A* and B* are the same or different and are each a photoactive compound containing at least one moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the R30 group at said moiety and B* is bound to the R32 group at said moiety.
172. The method of claim 170, wherein A* and B* are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXVII) : wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of said R30 or R32 groups ; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of said Wo or R32 groups, and one of J and K are bound to one of said Wo or R32 groups.
173. The method of claim 171, wherein A* and B* are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV): wherein D, E, F, G, I, J, and K are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein D, E, F, G, I, J, and K are bound to one of said Wo or R32 groups.
174. The method of claim 170, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, Rll, R13 and R14 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, ClCso polyether, ClC50 substituted polyether, ClC50 substituted alkyl, C3Cs substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rl° and R12 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, ClC50 substituted polyether, C1C50 substituted alkyl, C3Cg substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
175. The method of claim 173, wherein Rl° and R12 are the same or different and are selected from the group consisting of C10C35 alkyl groups.
176. The method of claim 174, wherein Rl° and R12 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
177. The method of claim 173, wherein Rl° and R12 are the same or different and are selected from the group consisting of C3C30 polyether groups.
178. The method of claim 176, wherein Rl° and R32 are the same and are 2 butoxy1ethoxyethane.
179. The method of claim 170, wherein R30 and R32 are the same or different and are selected from the group consisting of C2CIs alkyl groups.
180. The method of claim 173, wherein the sum of g and h is at least 1.
181. A method of photostabilizing a dibenzoylmethane derivative, said method comprising the step of, adding to said dibenzoylmethane derivative a photostabilizing amount of a polymer comprising monomers selected from the group consisting of a monomer for formula (XIII), a monomer of formula (XIV), and combinations thereof : wherein R29 and R31 are the same or different and are selected from the group consisting of ClC50 alkyl, C2C50 alkenyl, C2C5o alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Ro and R32 are the same or different and are selected from the group consisting of ClCso alkyl, C2Cso alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, ClC50 substituted alkyl, C3Cg substituted cycloalkyl, C2Cso substituted alkenyl, C2C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1; M and N are the same or different and are selected from the group consisting of oxygen, and amino; A* and B* are the same or different and are each a photoactive compound containing at least one moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the R30 group at said moiety and B* is bound to the R32 group at said moiety.
182. The method of claim 180, wherein A and B are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXVII) : wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of said R30 or R32 groups; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of said R30 or R32 groups, and one of J and K are bound to one of said R30 or or, groups.
183. The method of claim 181, wherein A* and B* are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV): wherein D, E, F, G, I, J, and K are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein D, E, F, G, I, J, and K are bound to one of said R30 or R32 groups.
184. The method of claim 180, wherein said polymer further comprises monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), a monomer of formula (V), a monomer of formula (VI), and combinations thereof : wherein R9, Rll, R13 and R14 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2Cso alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2C50 substituted alkyne; Rl° and R12 are the same or different and are selected from the group consisting of C1C50 alkyl, C2C50 alkenyl, C2C50 alkyne, C3C8 cycloalkyl, C1C50 polyether, C1C50 substituted polyether, C1C50 substituted alkyl, C3C8 substituted cycloalkyl, C2C50 substituted alkenyl, C2Cso substituted alkyne; and g, h, i and j are each in the range of 0 to 200.
185. The method of claim 183, wherein Rl° and R12 are the same or different and are selected from the group consisting of CloC35 alkyl groups.
186. The method of claim 184, wherein Rl° and R12 are the same or different and are selected from the group consisting of C16, C18, and C22 alkyl groups.
187. The method of claim 183, wherein Rl° and R12 are the same or different and are selected from the group consisting of C3C30 polyether groups.
188. The method of claim 186, wherein Rl° and R12 are the same and are 2 butoxy1ethoxyethane.
189. The method of claim 180, wherein R30 and R32 are the same or different and are selected from the group consisting of C2C15 alkyl groups.
190. The method of claim 183, wherein the sum of g and h is at least 1.
Description:
COMPOUNDS DERIVED FROM POLYANHYDRIDE RESINS WITH FILM- FORMING, UV-ABSORBING, AND PHOTOSTABILIZING PROPERTIES, COMPOSITIONS CONTAINING SAME, AND METHODS OF USING THE SAME Cross-Reference To Related Application This application is a continuation-in-part of application serial no.

10/786,793 filed February 25,2004.

Background Field of the Technology The invention relates to polymers, and methods to increase the UV- absorbance, water resistance, and photostability of a variety of compositions. More particularly, the invention relates to cyanodiphenylacrylate and/or cyanofluorenylidene acetate compounds and compositions containing the same, and methods of using them that include a method of protecting a material from ultra-violet radiation, a method of waterproofing, a method of forming a film, and a method of photostabilizing a photounstable compound.

Brief Description of Related Technology It is well known that ultraviolet radiation (light) having a wavelength from about 280 nm or 290 nm to about 320 nm (UV-B) is harmful to human skin, causing burns that are detrimental to the development of a good sun tan. UV-A radiation (about 320 nm to about 400 nm), while producing tanning of the skin, also can cause damage, particularly to very lightly-colored or sensitive skin, leading to reduction of skin elasticity and wrinkles. Therefore, a sunscreen composition for use on human skin preferably includes both a UV-A and a UV-B filter to prevent most of the sunlight within the full range of about 280 nm or 290 nm to about 400 nm from damaging human skin.

Ultraviolet radiation from the sun or artificial sources can also cause harm to coatings containing photoactive substances, such as photoactive pigments and dyes, by breaking down chemical bonds in the structure of a component such as a polymer, a pigment, or a dye. This photodegradation can lead to color fading, loss of

gloss, and loss of physical and protective properties of a coating. Photodegradation can take place in several steps which include one or more components of a coating absorbing UV radiation. The absorbed radiation can excite the absorbing molecules and raise them to a higher energy level, which can be very reactive. If the molecule cannot be relaxed, bond cleavage and the formation of free radicals will occur. These free radicals can attack one or more color molecules and/or a polymer backbone and form more free radicals.

LAV-A and UV-B filters can also be used to absorb UV radiation to protect a pigmented coating. The UV-B filters that are most widely used in the U. S. in commercial sunscreen compositions are paramethoxycinnamic acid esters, such as 2-ethylhexyl paramethoxycinnamate, commonly referred to as octyl methoxycinnamate or PARSOL MCX; octyl salicylate; and oxybenzone.

The organic UV-A filters most commonly used in commercial sunscreen compositions are the dibenzoylmethane derivatives, particularly 4- (1, 1- dimethylethyl) -4'-methoxydibenzoylmethane (also called avobenzone, sold under the brand name PARSOL 1789). Other dibenzoylmethane derivatives described as UV-A filters are disclosed in U. S. Patent Nos. 4, 489, 057,4, 387,089 and 4,562, 067, the disclosures of which are hereby incorporated herein by reference. It is also well known that the above described UV-A filters, particularly the dibenzoylmethane derivatives, can suffer from rapid photochemical degradation, when used alone or when combined with the above-described most commercially used UV-B filters.

Typically, the above-described UV-B filters are combined with the above described UV-A filters in a solution with other lipophilic or oily ingredients.

This solution of oily ingredients, known to formulators of cosmetic products including sunscreens as the"oil phase, "is typically, but not necessarily, dispersed with the help of emulsifiers and stabilizers into an aqueous solution composed primarily of water, to make an emulsion which becomes a final cream or lotion form of a sunscreen composition.

The performance of a photoactive compound or a combination of photoactive compounds in a sunscreen composition has been extremely difficult to

predict based on the levels of photoactive compounds in the formulation, particularly when the formulation includes one or more photoactive compounds that suffer from relatively rapid photodegradation, such as avobenzone. Because of this, each formulation has required expensive laboratory testing to determine the W absorbance, as a function of time (quantity) of exposure of the formulation to UV radiation. Moreover, a particularly difficult problem is presented when one photoactive compound in a sunscreen composition acts to increase the rate of photodegradation of another photoactive compound in the composition. This can be accomplished in a number or ways, including a bimolecular reaction between two photoactive compounds and a lowering of the threshold energy needed to raise a photoactive compound to its excited state. For example, when avobenzone is combined with octyl methoxycinnamate a bimolecular pathway leads to the rapid photodegradation of both the dibenzoylmethane derivative and the octyl methoxycinnamate.

Methods and compositions for stabilizing photoactive compounds, such as dibenzoylmethane derivatives, with the use of octocrylene and fluorene are described in the commonly-assigned U. S. Patent Nos. 5,993, 789, 6,113, 931, 6,126, 925, and 6,284, 916, the disclosures of which are hereby incorporated herein by reference. Other methods of stabilizing a dibenzoylmethane derivative include the addition of an oc-cyano-ß, ß-diphenylacrylate compound to a sunscreen composition including a dibenzoylmethane derivative. See, Deflandre et al, U. S. Patent No.

5,576, 354 and Gonzenbach et al. , U. S. Patent No. 6,033, 649.

Summary One aspect of the compounds, compositions, and methods described herein is to provide a polymeric compound having a crylene moiety ((2E)-2-cyano- 3,3-diphenylprop-2-enoic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a sunscreen composition that includes a UV-absorbing

polymeric compound having a crylene moiety ( (2E)-2-cyano-3, 3-diphenylprop-2- enoic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of reducing or eliminating an amount of ultra- violet light that contacts a substrate by disposing between the source of ultra-violet light and the substrate, or applying to the substrate a polymeric compound having a crylene moiety ( (2E)-2-cyano-3, 3-diphenylprop-2-enoic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of waterproofing a substrate surface by applying thereto a polymeric compound having a crylene moiety ( (2E)-2-cyano-3, 3- diphenylprop-2-enoic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of protecting a photodegradable material against photodegradation by applying thereto a polymeric compound having a crylene moiety ((2E)-2-cyano-3, 3-diphenylprop-2-enoic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of forming a W-absorbing film on a substrate surface by applying thereto film or coating containing a polymeric compound having a crylene moiety ( (2E)-2-cyano-3, 3-diphenylprop-2-enoic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a method for photostabilizing a sunscreen composition including a photoactive compound by the addition of a photostabilizing effective amount of a polymeric compound having a crylene moiety ( (2E)-2-cyano-3, 3- diphenylprop-2-enoic acid) attached to the polymer backbone.

Yet another aspect of the compounds, compositions, and methods described herein is to provide a polymeric compound having a fluorene moiety (2- cyano-2-fluoren-9-ylideneacetic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a sunscreen composition that includes a polymeric compound having a fluorene moiety (2-cyano-2-fluoren-9-ylideneacetic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of reducing or eliminating an amount of ultra- violet light that contacts a substrate by disposing between the source of ultra-violet light and the substrate, or applying to the substrate a polymeric compound having a fluorene moiety (2-cyano-2-fluoren-9-ylideneacetic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of waterproofing a substrate surface by applying thereto a polymeric compound having a fluorene moiety (2-cyano-2-fluoren- 9-ylideneacetic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of protecting a photodegradable material against photodegradation by applying thereto a polymeric compound having a fluorene moiety (2-cyano-2-fluoren-9-ylideneacetic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of forming a UV-absorbing film on a substrate surface by applying thereto film or coating containing a polymeric compound having a fluorene moiety (2-cyano-2-fluoren-9-ylideneacetic acid) attached to the polymer backbone.

Another aspect of the compounds, compositions, and methods described herein is to provide a method for photostabilizing a sunscreen composition

including a photoactive compound by the addition of a photostabilizing effective amount of a polymeric compound having a fluorene moiety (2-cyano-2-fluoren-9- ylideneacetic acid) attached to the polymer backbone.

Yet another aspect of the compounds, compositions, and methods described herein is to provide a polymeric compound having one or more of a photoactive compound attached to the polymer backbone, such as a derivatized triazine photoabsorbing compounds, derivatized para-aminobenzoic acid, derivatized octyl methoxycinnamate, derivatized avobenzone, derivatized oxybenzone, and/or derivatized octyl salicylate.

Another aspect of the compounds, compositions, and methods described herein is to provide a sunscreen composition that includes a polymeric compound having one or more of a photoactive compound attached to the polymer backbone, such as a derivatized triazine photoabsorbing compounds, derivatized para- aminobenzoic acid, derivatized octyl methoxycinnamate, derivatized avobenzone, derivatized oxybenzone, and/or derivatized octyl salicylate.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of reducing or eliminating an amount of ultra- violet light that contacts a substrate by disposing between the source of ultra-violet light and the substrate, or applying to the substrate a polymeric compound having one or more of a photoactive compound attached to the polymer backbone, such as a derivatized triazine photoabsorbing compounds, derivatized para-aminobenzoic acid, derivatized octyl methoxycinnamate, derivatized avobenzone, derivatized oxybenzone, and/or derivatized octyl salicylate.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of waterproofing a substrate surface by applying thereto a polymeric compound having one or more of a photoactive compound attached to the polymer backbone, such as a derivatized triazine photoabsorbing compounds, derivatized para-aminobenzoic acid, derivatized octyl methoxycinnamate, derivatized avobenzone, derivatized oxybenzone, and/or derivatized octyl salicylate.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of protecting a photodegradable material against photodegradation by applying thereto a polymeric compound having one or more of a photoactive compound attached to the polymer backbone, such as a derivatized triazine photoabsorbing compounds, derivatized para-aminobenzoic acid, derivatized octyl methoxycinnamate, derivatized avobenzone, derivatized oxybenzone, and/or derivatized octyl salicylate.

Another aspect of the compounds, compositions, and methods described herein is to provide a method of forming a UV-absorbing film on a substrate surface by applying thereto film or coating containing a polymeric compound having one or more of a photoactive compound attached to the polymer backbone, such as a derivatized triazine photoabsorbing compounds, derivatized para- aminobenzoic acid, derivatized octyl methoxycinnamate, derivatized avobenzone, derivatized oxybenzone, and/or derivatized octyl salicylate.

Another aspect of the compounds, compositions, and methods described herein is to provide a method for photostabilizing a sunscreen composition including a photoactive compound by the addition of a photostabilizing effective amount of a polymeric compound having one or more of a photoactive compound attached to the polymer backbone, such as a derivatized triazine photoabsorbing compounds, derivatized para-aminobenzoic acid, derivatized octyl methoxycinnamate, derivatized avobenzone, derivatized oxybenzone, and/or derivatized octyl salicylate.

Further aspects and advantages of the invention will be apparent to those skilled in the art from a review of the following detailed description, taken in conjunction with the appended claims. While the compounds, compositions, and methods are susceptible of embodiments in various forms, the description hereinafter includes specific embodiments of the invention with the understanding that the disclosure is illustrative, and is not intended to limit the inventions to the specific embodiments described herein.

Brief Description of the Drawings Figure 1 is a graph of the absorbance of a sunscreen composition that includes 2% Octadecene/Crylene maleate copolymer as the only W-absorbing compound, from a wavelength of 280 nm to 400 nm.

Figure 2 is a graph of the absorbance of a sunscreens composition that includes 2% Octadecene/Crylene maleate copolymer as the only UV-absorbing compound, a sunscreen composition (with UV-absorbing compounds) that does not include Octadecene/Crylene maleate copolymer, and a sunscreen composition including 2% of the OctadecenelCrylene maleate copolymer and other UV-absorbing compounds, from a wavelength of 280 nm to 400 nm.

Figure 3 is a graph of the original absorbance of a sunscreen composition that does not include Octadecene/Crylene maleate copolymer from a wavelength of 280 nm to 400 nm and after the composition has been exposed to 35 MED.

Figure 4 is a graph of the original absorbance of a sunscreen composition that includes 2% of the Octadecene/Crylene maleate copolymer from a wavelength of 280 nm to 400 nm and after the composition has been exposed to 35 MED.

Figure 5 is a graph of the original absorbance of a sunscreen composition including 2% Octadecene/Crylene maleate copolymer, and a sunscreen composition not including Octadecene/Crylene maleate copolymer, wherein the absorbance is measured from a wavelength of 280 nm to 400 nm and after the compositions have been exposed to 35 MED.

Figure 6 is a graph of the absorbance of a sunscreen composition that does not include Octadecene/Crylene maleate copolymer, from a wavelength of 280 nm to 400 nm.

Figure 7 is a graph of the absorbance of a sunscreen composition that includes 2% Octadecene/Crylene maleate copolymer, from a wavelength of 280 nm to 400 nm.

Figure 8 is a graph of the original absorbance of a sunscreen composition that did not include the Octadecene/Crylene maleate copolymer, measuring the absorbance from a wavelength of 280 nm to 400 nm, and after the composition was immersed in water for 40 minutes.

Figure 9 is a graph of the original absorbance of a sunscreen composition that includes 2% of the Octadecene/Crylene maleate copolymer, measuring the absorbance from a wavelength of 280 nm to 400 nm, and after the composition was immersed in water for 40 minutes.

Figure 10 is a graph of the original absorbance of a sunscreen composition that includes 2% of the Octadecene/Crylene maleate copolymer, and a sunscreen composition that did not include the Octadecene/Crylene maleate copolymer, measuring the absorbance from a wavelength of 280 nm to 400 nm, and after the compositions were immersed in water for 40 minutes.

Figure 11 is a graph of the original absorbance of a sunscreen composition that includes 2% of the Crylene/Cetyl Polymer, and a sunscreen composition that did not include the Crylene/Cetyl Polymer, measuring the absorbance from a wavelength of 280 nm to 400 nm.

Figure 12 is a graph of the original absorbance of a sunscreen composition that includes 2% of the Crylene/Behenyl Polymer, and a sunscreen composition that did not include the Crylene/Behenyl Polymer, measuring the absorbance from a wavelength of 280 nm to 400 nm.

Figure 13 is a graph of the original absorbance of a sunscreen composition that includes 2% of the Crylene/Behenyl Polymer, and a sunscreen composition that did not include the Crylene/Behenyl Polymer, measuring the absorbance from a wavelength of 280 nm to 400 nm, and after the compositions were immersed in water for 40 minutes.

Detailed Description of the Preferred Embodiments Sunscreen compositions typically include one or more photoactive compounds that can absorb W radiation, and often sunscreen compositions include a variety of photoactive compounds to absorb UV-radiation over the entire UV range (UV-A and UB-B range). Polymers and compositions that include photoactive moieties, including crylene ( (2E)-2-cyano-3, 3-diphenylprop-2-enoic acid)) and/or fluorene (2-cyano-2-fluoren-9-ylideneacetic acid), and methods of use of such polymers are described herein.

The general structure of a crylene moiety ( (2E)-2-cyano-3, 3- diphenylprop-2-enoic acid) is shown below: Optionally, each of the aromatic rings on the core crylene moiety can be substituted with various functional groups. Alpha-cyano-beta, beta-diphenylacrylate compounds, such as Octocrylene (2-ethylhexyl (2Z) -2-cyano-3,3-diphenylprop-2-enoate), are known to quench (accept the excited state energy) of an excited photoactive compound (see, e. g., the commonly assigned U. S. Patent Application Nos.

10/241,388, 10/361,223, and 10/785,271.) Without intending to be limited to any particular mechanism by which an a-cyano-ß, ß-diphenylacrylate compound is able to quench the excited state of photoactive compound, it is theorized that the a-cyano- P, P-diphenylacrylate compound accepts the excited state energy and dissipates the energy kinetically in the form of rapid isomerizations. This process is shown below: 0 N 0 N v y /\ E energy A A

wherein the oc-cyano-ß, ß-diphenylacrylate compound (octocrylene shown above as structure A), accepts the triplet excited state energy from a photoactive compound and forms a diradical (shown above as structure A) at the a and P positions of the acrylate, which converts the double bond into a single bond and allows for the free rotation of the phenyl groups. This rotation occurs rapidly and efficiently to dissipate any excited state energy accepted by the a-cyano- p-diphenylacrylate compound from the photoactive compound. In solution (e. g., a sunscreen composition), a key limitation on the ability of a compound to photostabilize another compound is the ability of the two compounds to come into contact with one another.

The general structure of a fluorene moiety (2-cyano-2-fluoren-9- ylideneacetic acid) is shown below:

Optionally, each of the aromatic rings on the core fluorene moiety can be substituted with various functional groups. It has been found that the one or more of a fluorene moiety may be attached to a polymer to convert the polymer into a compound capable of absorbing and/or dissipating W radiation, as well as to photostabilize another W- absorbing compound in a composition. Without intending to be limited to any

particular mechanism by which such compounds are able to quench (accept the excited state energy) an excited photoactive compound, it is theorized that a polymer having a fluorene moiety attached thereto, for example a 9-methylene-9H-fluorene, accepts the excited state energy from another UV-absorbing compound in an excited state and dissipates the energy kinetically in the form of rapid isomerizations. An example of this process is shown below: 0 N 0 N O . i \. \ I. _ Energy B B * wherein octofluorene (2-ethylhexyl 2-cyano-2-fluoren-9-ylideneacetate, shown above as structure B) accepts the triplet excited state energy and forms a diradical (shown above as structure B) at the a and P positions of the acrylate, which converts the double bond into a single bond and allows for free. rotation about the single bond.

This rotation occurs rapidly and efficiently to dissipate excited state energy accepted by a derivative of fluorene (a compound that includes a fluorene moiety).

It has also been discovered that the novel UV-absorbing and photostabilizing compounds disclosed in the commonly assigned U. S. Patent Application Nos. 10/246,434, 10/458,286, and 10/385, 833 and U. S. Patent No.

6,800, 274, the disclosures of which are hereby incorporated by reference, may be attached to a polymer molecule to provide other novel UV-absorbing and photostabilizing polymers. It has also been found that the polymer resulting from the attachment to the polymer backbone of the photostabilizing compounds disclosed in the above-listed applications would create a polymer that can absorb UV-radiation and photostabilize one or more other photoactive compounds in a W-absorbing composition.

In accordance with another important"tether"embodiment of the compounds, compositions, and methods described herein, it has also been discovered

that by attaching a tether to the crylene and/or fluorene moieties and attaching the crylene and/or fluorene moieties to the polymer backbone via the tether, the crylene and fluorene moieties are thereby spaced from the polymer backbone by attaching a tether (a spacer) so that there is less steric interference, to provide a more effective and efficient energy absorption and dissipation of the excited state energy via the aromatic ring (s) spinning about the tether (spacer). Suitable tether molecules include diols, diamino compounds, or any compound with two or more functional groups, wherein at least one functional group can be covalently attached to the carboxylic acid on the crylene and/or fluorene moieties (e. g. , an alcohol, amine, carboxylic acid, a sulfide), and another functional group that can be covalently bonded to the polymer backbone. Nonlimiting examples of suitable tethers include alkyl diols (e. g., 2,2- dimethylpropane-1, 3-diol and 3, 3-dimethylpentane-1, 5-diol), alkyl diamines (e. g., 1,5-diaminopentane), and alkyl amino alcohols (5-amino-1-pentanol). Another advantage to using a tether is the potential to add additional hydrophobic or hydrophilic groups on the tether to influence the solubility properties of the resulting polymer.

Any polymers may be used in this"tether"embodiment so long as it is capable of attachment of a tether molecule to its polymer backbone. Exemplary polymers that are useful include those having on its backbone a free alcohol, carboxylic acid, amine, and/or amido wherein these functional groups can be covalently bonded to a crylene and/or fluorene moiety, or a suitable tether.

Copolymers of an a-olefin and maleic anhydride are particularly suitable for the attachment of a crylene and/or fluorene moiety. Without intending to be limited to a particular mechanism of attachment, it is theorized that a photoactive compound such as a crylene and/or a fluorene moiety is covalently bonded to a copolymer of an a- olefin and maleic anhydride as shown below. for poly (octadecene-l-co-maleic anhydride) :

wherein a and b are each in the range of 2 to 5000; c and d are each in the range of 0 to 5000; and sum of c plus d is at least 2. A wide variety of photoactive compounds may be added to a polymer backbone that contain at least one free acid. Nonlimiting examples of photoactive compounds that can be used in a polymer described herein include compounds selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV):

wherein R39, R40, R41, R42, R43, R44, and R45 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-Cs cycloalkyl, C1-Cso substituted alkyl, C3-C8 substituted cycloalkyl, Cl-coo substituted alkenyl, C2-Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; X is selected from the group consisting of amino, and oxygen; Y and Z are the same or different and are selected from the group consisting of amino, and hydroxyl. These photoactive compounds are derived from known photoactive compounds, and can be prepare from commercial available photoactive compounds. For example, the compounds of formula (XIX) is based on the TINOSORB UV-absorbing product (available from Ciba Specialty Chemicals), and can be prepared from 2- (3-Allyl-2-hydroxy-5-methylphenyl)-2H- benzotriazole (available from Sigma-Aldrich, St. Louis, Mo) by oxidation of the vinylic double bond and reductive amination with diamines or aminoalcohols, as outlined below: OH N HO HO NO N Oxidntion CH, Hs H, OH, \H, \Hj

The compounds of formulae (XX), (XXI), (XXII), (XXIII), (XXIV), and (XXV) can be prepared with only minor modifications to commercially available photoactive compounds using well known chemistry. It is contemplated that any photoactive compound with a free primary amino or hydroxyl group, or a secondary amino or hydroxyl group can be attached to a polymer containing acid monomers, which converts the acid monmers into their corresponding ester or amido group by conventional chemistry as, for example, is shown in the preparation of PRO above.

Copolymers that are suitable to be covalently bonded crylene and/or fluorene moiety (with or without a tether) include, but are not limited to, Poly (alpha olefin-co-maleic anhydride), which can be prepared according the procedures set forth in U. S. Patent Nos. 3,860, 700,6, 358,892, and Reissue No. 28,475, the disclosures of which are hereby incorporated by reference. Examples of these resins include Poly (octadecene-l-co-maleic anhydride) resin (PA-18 available from Chevron Chemicals Co. , San Francisco, Calif. ), Poly (styrene-co-maleic anhydride) resin (SMA resins, available from Atofina Chemicals Inc. Philadelphia, Pa), Poly (ethylene-co- maleic anhydride) resin (EMA, available from Monsanto, St. Louis, Mo), Poly (isobutene-co-maleic anhydride) resin (ISOBAM available form Kuraray Co.

Ltd. , Osaka, Japan), and Poly (methylvinylether-co-maleic anhydride) resin (GANTREZ An available from ISP, Wayne, New Jersey). Alternatively, a mixture of alpha olefins may be used to form the maleic anhydride copolymer, and thereby provide a versatile polymer with a number of different properties (e. g., waterproofing and/or lubricating). Alternately mixtures of alpha olefins can be used (e. g., KetjenlubeX resins available from Akzo Nobel Co. , Dobbs Ferry, New York). Maleic anhydride polymers made with a mixture of alpha olefins are described in U. S. Patent Nos. 3,461, 108,3, 560,455, 3,560, 456,3, 560,457, 3,580, 893,3, 706,704, 3,729, 450, and 3,729, 451, the disclosures of which are hereby incorporated by reference.

Preferably, the polymer used according to the invention is a Poly (alpha olefin-co- maleic anhydride) resin; more preferably, the polymer is a Poly (octadecene-l-co- maleic anhydride) resin.

In the preparation of a polymer described herein, the attachment of photoactive compounds to the polymer backbone may not proceed to add a photoactive compound to each and every monomer unit in the starting polymer. In the preferred polymer Poly (alpha olefin-co-maleic anhydride) resin, the maleic anhydride monomer units (labeled above as SM) may remain unconverted in the preparation of a polymer described herein and/or the maleic anhydride ring on some of the monomer units may open to its corresponding diacid monomer unit (labeled above as IM). The lack of reactivity at one or more of the maleic anhydride monomer units may be desirable in order to control the number of photoactive compounds present on the polymer, and to control the properties of the resulting polymer that may impact on the physical properties of the polymer (e. g. , hydrophobic/hydrophilic interactions, hydrogen bonding). Thus, preferably a polymer described herein includes monomers selected from the. group consisting of a monomer of formula (V),- a monomer of formula (VI), and combinations thereof :

wherein R13 and R14 are the same or different and are selected from the group consisting of C-Cso alkyl, C2-Cso alkenyl, C2-C5o alcyne, C3-C8 cycloalkyl, Ci-Cso polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne ; and i and j are each in the range of 0 to 200. Preferably, R13 and R14 are the same or different and are

selected from the group consisting of C5-C25 alkyl groups, more preferably they are the same and are C16 straight chain alkyl groups.

It has been found, quite surprisingly, that the addition of a hydrophobic group on one of the monomer units of the preferred polymer (Poly (alpha olefin-co- maleic anhydride) ) improves the film-forming properties (i. e. , spreadability) of the resulting polymer that include photoactive compounds. Thus, prior to the addition of photoactive compounds to the polymer, about 10% of the maleic anhydride monomer units are converted to the diacid under mildly acidic conditions, and one of the acid units are then esterified by commonly known practices. Thus, a polymer described herein preferably includes monomers selected from the group consisting of a monomer of formula (III), a monomer of formula (IV), and combinations thereof : wherein R9 and R11 are the same or different and are selected from the group consisting of C-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-Cso polyether, Cl-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-Cso substituted alkyne; R° and R12 are the same or different and are selected from the group consisting of C,-C50 alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; and g and h are each

in the range of 0 to 200. Preferably Rio and R12 are the same or different and are selected from the group consisting of CIO-C3s alkyl groups, more preferably Cig, Cl8, and C22 alkyl groups. Depending on the application, it may be advantageous to use Rio and RI2 groups that are either polar or non-polar to influence the solubility of the polymer. Thus, Rl° and Rl2 are preferably the same or different and are selected from the group consisting of C3-C30 polyether groups, more preferably 2-butoxy-1- ethoxyethane (CH3CH20CH2CH20CH2CH2CH2CH2). Preferably R9 and Rl l are the same or different and are selected from the group consisting of C5-C25 alkyl groups, more preferably they are the same and are C16 straight chain alkyl groups.

Preferably, the sum of g and h is at least 1.

Polymer backbone molecules of a particular polymer generally exists as a mixture of polymer molecules of different chain lengths, wherein the polymer is described as having a chain length that is an average of the chain lengths of the adjacent polymer molecules. Likewise, the molecular weight of a particular polymer can be determined in a number of ways, including a determination of the Weight Average Molecular Weight (Mw), which is the summation of the weights of each different sized polymer in a mixture multiplied by the mole fraction of that polymer size in the polymer mixture. Nonlimiting examples of methods of calculating a given polymer's Weight Average Molecular Weight include diffusion, sedimentation, flow birefringence, and light scattering. Preferably, a polymer described herein has a Weight Average Molecular Weight is the range of about 20,000 to about 130,000 grams/mole, more preferable in the range of about 30,000 to about 110,000 grams/mole.

Sunscreen compositions containing one or more photoactive compounds, such as a dibenzoylmethane derivative W-A filter compound, and a polymer containing one or more of a photoactive compound (e. g., crylene and/or fluorene moieties) covalently bonded to the polymer backbone are also described herein. One aspect of the sunscreen compositions described herein are methods of photostabilizing a sunscreen composition including a dibenzoylmethane derivative, such as 4- (l, l-dimethylethyl)-4'-methoxydibenzoylmethane (PARSOL@ 1789),

wherein one or more photoactive compounds present in a sunscreen composition (e. g., avobenzone) are made more photostable by the addition of a polymer that contains one or more photoactive compounds (e. g., crylene and/or fluorene moieties) covalently bonded to the polymer backbone. Further described herein are methods for filtering out ultra-violet light from human skin including the step of applying to the skin a cosmetically acceptable composition including a polymer that contains one or more photoactive compounds (e. g., crylene and/or fluorene moieties) covalently bonded to the polymer backbone. Also described herein is a method of waterproofing a material by forming a film on a surface of a material, wherein the film includes a polymer that contains one or more photoactive compounds (e. g., crylene and/or fluorene moieties) covalently bonded to the polymer backbone.

A photoactive compound can be considered stable when, for example, after 30 MED irradiation the photoactive compound has retained at least about 90% of its original absorbance at a wavelength, or over a range of wavelengths of interest (e. g., the wavelength at which a photoactive compound has a peak absorbance, such as 350-370 nm for avobenzone). Likewise, a sunscreen composition can include a plurality of photoactive compounds and a sunscreen composition, as a whole, can be considered stable when, for example, after 30 MED irradiation the sunscreen composition has retained at least about 90% of its original absorbance at one or more wavelengths of interest (e. g., at or near the peak absorbance wavelength of the primary photoactive compound).

In commonly assigned U. S. Patent Application Nos. 10/241,388, 10/361,223, and 10/785,271, the disclosures of which are hereby incorporated by reference, it was found that the addition of an oc-cyano-p,-diphenylacrylate compound and a diester or polyester of naphthalene dicarboxylic acid were able to stabilize a photounstable LTV-absorbing compound, e. g., a dibenzoylmethane derivative, such as PARSOL 1789, in a sunscreen composition. It has surprisingly been found that sunscreen compositions containing a combination of (1) a polymer that contains one or more photoactive compounds (e. g., crylene and/or fluorene moieties) covalently bonded to the polymer backbone, and (2) a diester or polyester of

naphthalene dicarboxylic acid can significantly increase the photostability of any photounstable component (s) present therein (e. g., a dibenzoylmethane derivative).

Without intending to be limited to any particular mechanism of achieving this increase in photostability, it is believed that a diester or polyester of naphthalene dicarboxylic acid stabilizes a dibenzoylmethane derivative by accepting the triplet energy of the dibenzoylmethane derivative once the dibenzoylmethane derivative has reached an excited state as a result of the absorption of ultra-violet light. Once a dibenzoylmethane derivative is excited, it is prone to degrade according to a number of pathways; however, the degradation of the dibenzoylmethane derivative can be substantially reduced or prevented by the use of a diester or polyester of naphthalene dicarboxylic acid to quench (accept) the triplet excited state energy present in an excited dibenzoylmethane molecule. Thus, in one pathway of degradation, a dibenzoylmethane derivative is excited to its triplet state and the excited state triplet energy is released in a bond breaking step, thereby preventing the dibenzoylmethane derivative from further accepting ultra-violet radiation. A diester or polyester of naphthalene dicarboxylic acid may stabilize a dibenzoylmethane derivative by accepting the triplet state (excited state) energy of the excited dibenzoylmethane derivative in such a way as to convert the excited dibenzoylmethane derivative back to a ground state that is capable of reaccepting (or accepting additional) ultra-violet radiation (energy transfer).

For this process to work continuously, the diester or polyester of naphthalene dicarboxylic acid must transfer or convert the energy that was accepted from the excited dibenzoylmethane derivative. Without intending to be limited to a particular mechanism, it is believed that when a diester or polyester of naphthalene dicarboxylic acid is excited to its triplet state, it dissipates the triplet excited state energy through vibrations (e. g.,. as heat), which in this group of molecules is a relatively slow mode of dissipating energy. It has been found, quite surprisingly, that by the addition of a polymer that contains one or more photoactive compounds (e. g., crylene and/or fluorene moieties) covalently bonded to the polymer backbone, such a polymer compounds are able to accept triplet excited state energy from an excited diester or polyester of naphthalene dicarboxylic acid. Thus, according to one possible

mechanism, the efficiency of the dissipation of the excited state energy in an excited diester or polyester of naphthalene dicarboxylic acid is greatly improved by a transfer of energy from an excited diester or polyester of naphthalene dicarboxylic acid to the polymer containing one or more photoactive compounds.

Thus, preferably, a composition described herein includes a diester or polyester of naphthalene dicarboxylic acid selected from the group consisting of compounds of formulae (XXX) and (XXXI), and combinations thereof : wherein R93 and R94 are the same or different and selected from the group consisting of Cl-C22 alkyl groups, diols having the structure HO ROH and polyglycols having the structure HOR90 (-O-R91-) y--OH ; wherein each R90 and R9l is the same or different and selected from the group consisting of Cl-C6 straight or branched chain alkyl groups; and wherein a and y are each in a range of 1 to 100 and ß is in a range of 0 to 100.

The method of preparation of particularly useful diesters and polyesters of naphthalene dicarboxylic acid and the use of diesters and polyesters of naphthalene dicarboxylic acid in a sunscreen composition are described in U. S. Patent Nos. 5,993, 789 and 6, 284, 916, the disclosures of which are hereby incorporated herein by reference. Preferably, a UV-absorbing composition that includes a diester or polyester of naphthalene dicarboxylic acid includes a diester of formula (XIV) wherein R93 and R94 are 2-ethylhexane and p is 0. Preferably, the W-absorbing compositions described herein include a diester or polyester of naphthalene

dicarboxylic acid in a range of about 0.1 % to about 15% by weight of the total weight of the composition.

A sunscreen composition can be combined into a cosmetically acceptable carrier, optionally including emollients, stabilizers, emulsifiers, such as those known in the art, and combinations thereof. These additives can be used in preparing an emulsion from an aqueous composition and a mixture of a UV filter composition that includes one or more photoactive compounds and a solvent or a solvent combination that includes one or more organic solvents. When made, preferably the emulsion is an oil-in-water emulsion, wherein the oil phase is primarily formed from a mixture of the filter system and solvent system.

A typical sunscreen composition includes one or more photoactive compounds, wherein a photoactive compound acts to absorb UV radiation and thereby protect the substrate (e. g. , human skin) from the harmful effects of W radiation. The absorption process causes a photoactive compound to reach an excited state, wherein the excited state is characterized by the presence of excited energy (e. g., singlet energy or triplet energy), as compared to the ground, state of the photoactive compound. Once a photoactive compound reaches an excited state there exists a number of pathways by which the excited photoactive compound can dissipate its excess energy (e.g., triplet energy), however, many of those pathways adversely affect the ability of the photoactive compound to further absorb UV radiation.

It has surprisingly been found that the addition of polymers containing one or more photoactive compounds (e. g., crylene and/or fluorene moieties) covalently bonded to the polymer backbone increase the photostability of the sunscreen composition. Without intending to be limited to any particular mechanism by which a such compounds are able to quench (accept the excited state energy) an excited photoactive compound, it is believed that, for example the crylene and fluorene moieties accept the excited state energy and dissipates the energy kinetically in the form of rapid isomerizations. An example of this process is shown below wherein the PA-18 polymer (poly (octadecene-1-co-maleic anhydride) ) having both crylene and fluorene moieties attached to the polymer backbone : N N N4 ot 0 \ o p O OH p p O OH p p energy (CHziisCHg ! (CHisCHs j (CHCHg (CHCH ! NtX N> « \ O O O O N N //

The polymer accepts the triplet excited state energy from a photoactive compound and forms a diradical at the a and P positions of the acrylate, which converts the double bond into a single bond and allows for free rotation of the phenyl groups or fluorene group about the single bond. This rotation occurs rapidly and efficiently to dissipate excited state energy accepted by a derivative of fluorene.

Commonly-assigned U. S. Patent Nos. 6, 485, 713 and 6,537, 529, the disclosures of which are hereby incorporated herein by reference, describe compositions and methods for increasing the photostability of photoactive compounds in a sunscreen composition, e. g., by the addition of polar solvents to the oil phase of a composition. It has been found, quite surprisingly, that by increasing the polarity of the oil phase of a sunscreen composition including a polymer that contains one or more photoactive compounds (e. g., crylene and/or fluorene moieties) covalently bonded to the polymer backbone, the stability of the sunscreen composition is increased. Thus, in a sunscreen described herein, preferably, one or more of a highly polar solvent is present in the oil-phase of the composition. Preferably, a sufficient amount of a polar solvent is present in a sunscreen composition to raise the dielectric constant of the oil-phase of the composition to a dielectric constant of at least about 7, preferably at least about 8.

A photoactive compound is one that responds to light photoelectrically.

In the compositions described herein, a photoactive compound is one that responds to UV radiation photoelectrically. For example, photoactive compounds that respond to UV radiation photoelectrically by rapid photodegradation can benefit highly from the compositions and methods described herein, even though the benefits of the compositions and methods described herein are not limited to such compounds.

Photostability is a potential problem with all W filters because they are deliberately selected as UV-absorbing molecules. In other applications, a photoactive compound may be a pigment or a dye (e. g., a hydrophobic dye).

UV filters include compounds selected from the following categories (with specific examples) including: p-aminobenzoic acid, its salts and its derivatives (ethyl, isobutyl, glyceryl esters; p-dimethylaminobenzoic acid); anthranilates (o- aminobenzoates; methyl, menthyl, phenyl, benzyl, phenylethyl, linalyl, terpinyl, and cyclohexenyl esters); salicylates (octyl, amyl, phenyl, benzyl, menthyl (homosalate), glyceryl, and dipropyleneglycol esters); cinnamic acid derivatives (menthyl and benzyl esters, alpha-phenyl cinnamonitrile ; butyl cinnamoyl pyruvate); dihydroxycinnamic acid derivatives (umbelliferone, methylumbelliferone, methylaceto-umbelliferone); camphor derivatives (3-benzylidene, 4- methylbenzylidene, polyacrylamidomethyl benzylidene, benzalkonium methosulfate, benzylidene camphor sulfonic acid, and terephthalylidene dicamphor sulfonic acid); trihydroxycinnamic acid derivatives (esculetin, methylesculetin, daphnetin, and the glucosides, esculin and daphnin); hydrocarbons (diphenylbutadiene, stilbene); dibenzalacetone; benzalacetophenone; naphtholsulfonates (sodium salts of 2- naphthol-3, 6-disulfonic and of 2-naphthol-6, 8-disulfonic acids); dihydroxy-naphthoic acid and its salts; o-and p-hydroxydiphenyldisulfonates ; cumarin derivatives (7- hydroxy, 7-methyl, 3-phenyl); diazoles (2-acetyl-3-bromoindazole, phenyl benzoxazole, methyl naphthoxazole, various aryl benzothiazoles); quinine salts (bisulfate, sulfate, chloride, oleate, and tannate); quinoline derivatives (8- hydroxyquinoline salts, 2-phenylquinoline); hydroxy-or methoxy-substituted benzophenones; uric acid derivatives; vilouric acid derivatives; tannic acid and its derivatives; hydroquinone; and benzophenones (oxybenzone, sulisobenzone,

dioxybenzone, benzoresorcinol, 2,2', 4, 4'-tetrahydroxybenzopheno. ne, 2, 2'-dihydroxy- 4, 4'-dimethoxybenzophenone, octabenzone, 4-isopropyldibenzoylmethane, butylmethoxydibenzoylmethane, etocrylene, and 4-isopropyl-dibenzoylmethane).

Particularly useful are: 2-ethylhexyl p-methoxycinnamate, 4,4'-t-butyl methoxydibenzoylmethane, 2-hydroxy-4-methoxybenzophenone, octyldimethyl p- aminobenzoic acid, digalloyltrioleate, 2,2-dihydroxy-4-methoxybenzophenone, ethyl 4- [bis (hydroxypropyl)] aminobenzoate, 2-ethylhexyl-2-cyano-3,3-diphenylacrylate, 2- ethylhexylsalicylate, glycerol p-aminobenzoate, 3,3, 5-trimethylcyclohexylsalicylate, methylanthranilate, p-dimethylaminobenzoic acid or aminobenzoate, 2-ethylhexyl p- dimethylaminobenzoate, 2-phenylbenzimidazole-5-sulfonic acid, 2- (p- dimethylaminophenyl-5-sulfoniobenzoxazoic acid, and combinations thereof.

For a product marketed in the United States, preferred cosmetically- acceptable photoactive compounds and concentrations (reported as a percentage by weight of the total cosmetic sunscreen composition) include: aminobenzoic acid (also called para-aminobenzoic acid and PABA; 15% or less), avobenzone (also called butyl methoxy dibenzoylmethane; 3% or less), cinoxate (also called 2-ethoxyethylp- methoxycinnamate ; 3% or less), dioxybenzone (also called benzophenone-8; 3% or less), homosalate (15% or less), menthyl anthranilate (also called menthyl 2- aminobenzoate; 5% or less), octocrylene (also called 2-ethylhexyl-2-cyano-3,3 diphenylacrylate; 10% or less), octyl methoxycinnamate (7. 5% or less), octyl salicylate (also called 2-ethylhexyl salicylate; 5% or less), oxybenzone (also called benzophenone-3; 6% or less), padimate O (also called octyl dimethyl PABA; 8% or less), phenylbenzimidazole sulfonic acid (water soluble; 4% or less), sulisobenzone (also called benzophenone-4; 10% or less), titanium dioxide (25% or less), trolamine salicylate (also called triethanolamine salicylate; 12% or less), and zinc oxide (25% or less).

Other preferred cosmetically-acceptable photoactive compounds and preferred concentrations (percent by weight of the total cosmetic sunscreen composition) include diethanolamine methoxycinnamate (10% or less), ethyl- [bis (hydroxypropyl) ] aminobenzoate (5% or less), glyceryl aminobenzoate (3% or

less), 4-isopropyl dibenzoylmethane (5% or less), 4-methylbenzylidene camphor (6% or less), terephthalylidene dicamphor sulfonic acid (10% or less), and sulisobenzone (also called benzophenone-4, 10% or less).

For a product marketed in the European Union, preferred cosmetically- acceptable photoactive compounds and preferred concentrations (reported as a percentage by weight of the total cosmetic sunscreen composition) include: PABA (5% or less), camphor benzalkonium methosulfate (6% or less), homosalate (10% or less), benzophenone-3 (10% or less), phenylbenzimidazole sulfonic acid (8% or less, expressed as acid), terephthalidene dicamphor sulfonic acid (10% or less, expressed as acid), butyl methoxydibenzoylmethane (5% or less), benzylidene camphor sulfonic acid (6% or less, expressed as acid), octocrylene (10% or less, expressed as acid), polyacrylamidomethyl benzylidene camphor (6% or less), ethylhexyl methoxycinnamate (10% or less), PEG-25 PABA (10% or less), isoamyl p- methoxycinnamate (10% or less), ethylhexyl triazone (5% or less), drometrizole trielloxane (15% or less), diethylhexyl butamido triazone (10% or less), 4- methylbenzylidene camphor (4% or less), 3-benzylidene camphor (2% or less), ethylhexyl salicylate (5% or less), ethylhexyl dimethyl PABA (8% or less), benzophenone-4 (5%, expressed as acid), methylene bis-benztriazolyl tetramethylbutylphenol (10% or less), disodium phenyl dibenzimidazole tetrasulfonate (10% or less, expressed as acid), bis-ethylhexyloxyphenol methoxyphenol triazine (10% or less), methylene bisbenzotriazolyl tetramethylbutylphenol (10% or less, also called TINOSORBO M), and bisethylhexyloxyphenol methoxyphenyl triazine. (10% or less, also called TINOSORB S).

All of the above-described UV filters are commercially available. For example, suitable commercially-available organic UV filters are identified by trade name and supplier in Table I below: Table I CTFA Name Trade Name Su lier benzophenone-3 INULM-40 ASF Chemical Co. enzophenone-4 INUL MS-40 ASF Chemical Co. enzophenone-8 SPECTRA-SORB UV-24 American Cyanamid DEA-methoxycinnamate BERNEL HYDRO ernel Chemical ethyl dihydroxypropyl-PABA AMERSCREEN P Amerchol Corp. glyceryl PABANIPA G. M. P. A. Nipa Labs. omosalate KEMESTER HMS Humko Chemical menthyl anthranilate SUNAROME UVA Felton Worldwide octocryleneUVINUL N-539BASF Chemical Co. octyl dimethyl PABA AMERSCOL Amerchol Corp. octyl methoxycinnamate PARSOL MCX Bernel Chemical PABA ABA National Starch 2-phenylbenzimidazole-5-EUSOLEX 6300 EM Industries sulphonic acid TEA salicylate SUNAROME W Felton Worldwide 2- (4-methylbenzildene)- EUSOLEX 6300 EM Industries camphor enzophenone-1 UVINUL 400 BASF Chemical Co. enzophenone-2 UVINUL D-50 BASF Chemical Co. enzophenone-6 UVINUL D-49 BASF Chemical Co. Denzophenone-12 UVINUL 408 BASF Chemical Co. 4-isopropyl dibenzoyl methane EUSOLEX 8020 EM Industries butyl methoxy dibenzoyl ARSOL 1789 Givaudan Corp. methane tocrylené JVINIUL N-35 BASF Chemical Co. methylene bisbenzotriazolyl INOSORB M Ciba Specialty tetramethylbutylphenol Chemicals bisethylhexyloxyphenol 1NOSORB S Ciba Specialty methoxyphenyl triazine. Chemicals

The term"allcyl"as used herein refers to straight-and branched-chain hydrocarbon groups, preferably containing one to thirty carbon atoms. Examples of alkyl groups are Cl-C4 alkyl groups. As used herein the designation Cx-Cy, wherein x and y are integers, denotes a group having from x to y carbon atoms, e. g., a Cl-C4 alkyl group is an alkyl group having one to four carbon atoms. Nonlimiting examples of alkyl groups include, methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl (2- methylpropyl), t-butyl (1, 1-dimethylethyl), and 3,3-dimethylpentane.

The term"cycloalkyl"as used herein refers to an aliphatic cyclic hydrocarbon group, preferably containing three to eight carbon atoms. Nonlimiting examples of cycloalkyl groups include cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl.

The term"alkenyl"as used herein includes both straight chained, branched, and cyclic hydrocarbon radicals that include at least one carbon-carbon double bond, preferably, an alkenyl group contains between two and thirty carbon atoms. Nonlimiting examples alkenyl groups include methylene, ethylene, propylene, butylene, and isopropylene.

The term"alkyne"as used herein includes both straight and branched chained hydrocarbon radicals having at least one carbon-carbon triple bond, preferably, an alkyne group contains between two and thirty carbon atoms.

The term"polyether"as used herein refers to a group with at least two ethers present in a carbon chain. Nonlimiting examples of polyethers include 1- butoxy-2-methoxyethane, 1-butoxy-2- (2-methoxyethoxy) ethane, 2- (2- methoxyethoxy)-1-(2-methylpentyloxy) propane, and 1- (2-methylpentyloxy)-2- (2- pentyloxyethoxy) propane.

The terms"substituted alkyl,""substituted cycloalkyl,""substituted alkenyl, ""substituted alkyne, "and"substituted polyether"as used herein refer to an alkyl, cycloalkyl, alkenyl, alkyne, or polyether group having one or more substituents.

Substituents can include, but are not limited to, alkyl, cycloalkyl, alkenyl, alkyne, polyether, substituted polyether, heteroaryl, heterocycloalkyl, aryl, substituted aryl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur, and halo. Preferred substituted alkyl groups have one to twenty carbon atoms, not including carbon atoms of the substituent group. Preferably, a substituted alkyl group is mono-or di-substituted at one, two, or three carbon atoms.

The substituents can be bound to the same carbon or different carbon atoms.

The term"ester"as used herein refers to a group of the general formula:

wherein K is an alkyl group, alkenyl group, alkyne group, cycloalkyl group, polyether, aryl, substituted alkyl group, substituted alkenyl group, substituted alkyne group, substituted cycloalkyl group, substituted aryl group, substituted heteroaryl, substituted heterocycloalkyl, or substituted polyether group.

The term"aryl"as used herein refers to monocyclic, fused bicyclic, and fused tricyclic carbocyclic aromatic ring systems including, but not limited to, phenyl, naphthyl, tetrahydronaphthyl, phenanthrenyl, biphenylenyl, indanyl, uidenyl, anthracenyl, and fluorenyl.

The term"heteroaryl"as used herein refers to monocyclic, fused bicyclic, and fused tricyclic aromatic ring systems, wherein one to four-ring atoms are selected from the group consisting of oxygen, nitrogen, and sulfur, and the remaining ring atoms are carbon, said ring system being joined to the remainder of the molecule by any of the ring atoms. Nonlimiting examples of heteroaryl groups include, but are not limited to, pyridyl, pyrazinyl, pyrimidinyl, pyrrolyl, pyrazolyl, imidazolyl, thiazolyl, tetrazolyl, oxazolyl, isooxazolyl, thiadiazolyl, oxadiazolyl, thiophenyl, furanyl, quinolinyl, isoquinolinyl, benzoxazolyl, benzimidazolyl, and benzothiazolyl.

The term"heterocycloalkyl"as used herein refers to an aliphatic, partially unsaturated or fully saturated, 3-to 14-membered ring system, including single rings of 3 to 8 atoms and bi-and tricyclic ring systems. The heterocycloalkyl ring systems include one to four heteroatoms independently selected from oxygen, nitrogen, and sulfur, wherein a nitrogen and sulfur heteroatom optionally can be oxidized and a nitrogen heteroatom optionally can be substituted. Representative heterocycloalkyl groups include, but are not limited to, pyrrolidinyl, pyrazolinyl, pyrazolidinyl, imidazolinyl, imidazolidinyl, piperidinyl, piperazinyl, oxazolidinyl, isoxazolidinyl, morpholinyl, thiazolidinyl, isothiazolidinyl, and tetrahydrofuryl.

The terms"substituted aryl,""substituted heteroaryl, "and"substituted heterocycloalkyl"as used herein refer to an aryl, heteroaryl, or heterocycloalkyl group

substituted by a replacement of one, two, or three of the hydrogen atoms thereon with a substitute selected from the group consisting of alkyl, alkenyl, alkyne, substituted alkyl, substituted cycloalkyl, substituted alkenyl, substituted alkyne, ether, amino, aryl, heteroaryl, cycloalkyl, heterocycloalkyl, O (CH2) 1-3N (R) 2, O (CH2), 3CO2H, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur, and halo.

The term"amino"as used herein refers to an-NH2 or-NH-group, wherein each hydrogen in each formula can be replaced with an alkyl, cycloalkyl, aryl, polyether, heteroaryl, heterocycloalkyl, substituted alkyl, substituted cycloalkyl, substituted aryl, substituted polyether, substituted heteroaryl, or substituted heterocycloalkyl group, i. e. , N (R) 2. In the case of-NH2, the hydrogen atoms also can be replaced with substituents taken together to form a 5-or 6-membered aromatic or non-aromatic ring, wherein one or two carbons of the ring optionally are replaced with a heteroatom selected from the group consisting of sulfur, oxygen, and nitrogen.

The ring also optionally can be substituted with an alkyl group. Examples of rings formed by substituents taken together with the nitrogen atom include morpholinyl, phenylpiperazinyl, imidazolyl, pyrrolidinyl, (N-methyl) piperazinyl, and piperidinyl.

The term"primary amino"as used herein refers to a R-NH2 group, wherein R is selected from the group consisting of an alkyl, cycloalkyl, alkenyl, alkyne, polyether, heteroaryl, heterocycloalkyl, aryl, substituted aryl, substituted alkyl, substituted cycloalkyl, substituted alkenyl, substituted alkyne, substituted polyether, substituted heteroaryl, substituted heterocycloalkyl, and ester groups, and wherein the nitrogen is attached to a carbon atom on the R group. It is contemplated that when the term"primary amino"refers to a primary amino group present on a photoactive compound, the photoactive compound shall include a number of other functional groups that may or may not be listed above (e. g., a triazine). Thus, the above-listed functional groups are not intended to limit the functional groups that can be present on the photoactive compound containing a primary amino. The description above it is only intended to limit the term"primary amino"to only those amino groups that contain two hydrogens and are also attached to a carbon atom.

The term"secondary amino"as used herein refers to R, R'-NH, wherein R and R'are the same or different and are selected from the group consisting of an alkyl, cycloalkyl, alkenyl, alkyne, polyether, heteroaryl, heterocycloalkyl, aryl, substituted aryl, substituted alkyl, substituted cycloalkyl, substituted alkenyl, substituted alkyne, substituted polyether, substituted heteroaryl, substituted heterocycloalkyl, and ester groups, and wherein the nitrogen is attached to a carbon atom on each of the R and R'groups. It is contemplated that when the term "secondary amino"refers to a secondary amino group present on a photoactive compound, the photoactive compound shall include a number of other functional groups that may or may not be listed above (e. g., a triazine). Thus, the above-listed functional groups are not intended to limit the functional groups that can be present on the photoactive compound containing a secondary amino. The description above it is only intended to limit the term"secondary amino"to only those amino groups that contain one hydrogen and are also attached to two different carbon atoms.

The term"primary hydroxyl"as used herein refers to R-OH, wherein R is selected from the group consisting of an alkyl, cycloalkyl, alkenyl, alkyne, polyether, heteroaryl, heterocycloalkyl, aryl, substituted aryl, substituted alkyl, substituted cycloalkyl, substituted alkenyl, substituted alkyne, substituted polyether, substituted heteroaryl, substituted heterocycloalkyl, and ester groups, and wherein the oxygen is attached to a primary carbon atom on the R group. It is contemplated that when the term"primary hydroxyl"refers to a primary hydroxyl group present on a photoactive compound, the photoactive compound shall include a number of other functional groups that may or may not be listed above (e. g., a triazine). Thus, the above-listed functional groups are not intended to limit the functional groups that can be present on the photoactive compound containing a primary hydroxyl. The description above it is only intended to limit the term"primary hydroxyl"to only those hydroxyl groups that are attached to a primary carbon atom (-CH2-).

The term"secondary hydroxyl"as used herein refers to R-OH, wherein R is selected from the group consisting of an alkyl, cycloalkyl, alkenyl, alkyne, polyether, heteroaryl, heterocycloalkyl, aryl, substituted aryl, substituted

alkyl, substituted cycloalkyl, substituted alkenyl, substituted alkyne, substituted polyether, substituted heteroaryl, substituted heterocycloalkyl, and ester groups, and wherein the oxygen is attached to a primary carbon atom on the R group. It is contemplated that when the term"secondary hydroxyl"refers to a secondary hydroxyl group present on a photoactive compound, the photoactive compound shall include a number of other functional groups that may or may not be listed above (e. g., a triazine). Thus, the above-listed functional groups are not intended to limit the functional groups that can be present on the photoactive compound containing a secondary hydroxyl. The description above it is only intended to limit the term "secondary hydroxyl"to only those hydroxyl groups that are attached to a secondary carbon atom including, for example and without limitation, a hydroxyl group attached to a secondary carbon atom on an alkyl group (-CH (OH) R-), and a hydroxyl group attached to a carbon atom on an aromatic ring (Aryl-OH).

The term"amido"as used herein refers to a moiety of the general formula : wherein R1 and R2 are the same or different and selected from hydrogen, alkyl, alkenyl, alkyne, substituted alkyl, substituted alkenyl, substituted alkyne, aryl, alkenyl aryl, heteroaryl, and alkenyl heteroaryl.

The term"cyano"as used herein refers to a-C=N group, also designated-CN.

The term"halo"as used herein refers to fluorine, chlorine, bromine, and iodine.

The term"carboxy"as used herein refers to a moiety of the general formula:

The term"sulfur"as used herein refers to a neutral sulfur atom that is unsubstituted or substituted with one or more of a neutral species, including any oxidized or reduced form of sulfur (e. g.,-S02-). Nonlimiting examples of sulfur groups include sulfites, sulfides, sulfates, and alkyl sulfides.

The term"hydroxyl"as used herein refers to an-OH group.

The terms"waterproof'and"waterproofing"as used herein refers to any increase in a material/surface's ability to repel water from permeating the material/surface. These terms are not intended to mean that a material/surface is completely impervious to water, rather, the terms"waterproof'and"waterproofing" are intended to be understood as making a material/surface less water permeable relative to not having been"waterproofed"or having undergone"waterproofing." Ranges may be expressed herein as from"about"or"approximately" one particular value and/or to"about"or"approximately"another particular value.

When such a range is expressed, another embodiment includes from the one particular value and/or to the other particular value. Similarly, when values are expressed as approximations, by use of the antecedent"about, "it will be understood that the particular value forms another embodiment.

A sunscreen composition described herein can include a variety of photoactive compounds, including one or more UV-A photoactive compounds and one or more UV-B photoactive compounds. Preferably, a sunscreen composition includes a photoactive compound selected from the group consisting of p- aminobenzoic acid and salts and derivatives thereof ; anthranilate and derivatives thereof; dibenzoylmethane and derivatives thereof; salicylate and derivatives thereof; cinnamic acid and derivatives thereof; dihydroxycinnamic acid and derivatives thereof; camphor and salts and derivatives thereof; trihydroxycinnamic acid and derivatives thereof; dibenzalacetone naphtholsulfonate and salts and derivatives

thereof; benzalacetophenone naphtholsulfonate and salts and derivatives thereof ; dihydroxy-naphthoic acid and salts thereof; o-hydroxydiphenyldisulfonate and salts and derivatives thereof; p-hydroxydiphenyldisulfonate and salts and derivatives thereof; coumarin and derivatives thereof; diazole derivatives; quinine derivatives and salts thereof; quinoline derivatives; hydroxy-substituted benzophenone derivatives; methoxy-substituted benzophenone derivatives; uric acid derivatives; vilouric acid derivatives; tannic acid and derivatives thereof; hydroquinone; benzophenone derivatives; 1,3, 5-triazine derivatives, phenyldibenzimidazole tetrasulfonate and salts and derivatives thereof ; terephthalylidene dicamphor sulfonic acid and salts and derivatives thereof; methylene bis-benzotriazolyl tetramethylbutylphenol and salts and derivatives thereof; bis-ethylhexyloxyphenol methoxyphenyl triazine and salts and derivatives thereof; diethylamino hydroxybenzoyl hexyl benzoate and salts and derivatives thereof; and combinations of the foregoing.

UV-A radiation (about 320 nm to about 400 mn), is recognized as contributing to causing damage, to skin particularly to very lightly-colored or sensitive skin. A sunscreen composition described herein preferably includes a UV-A photoactive compound. Preferably, a sunscreen composition described herein includes a dibenzoylmethane derivative UV-A photoactive compound. Preferred dibenzoylmethane derivatives include, 2-methyldibenzoylmethane; 4- methyldibenzoylmethane ; 4-isopropyldibenzoylmethane; 4-tert- butyldibenzoylmethane; 2,4-dimethyldibenzoylmethane ; 2,5- dimethyldibenzoylmethane; 4,4'-diisopropyldibenzoylmethane ; 4,4'- dimethoxydibenzoylmethane; 4-tert-butyl-4'-methoxydibenzoylmethane; 2-methyl-5- isopropyl-4'-methoxydibenzoylmethane; 2-methyl-5-tert-butyl-4'- methoxydibenzoylmethane; 2, 4-dimethyl-4'-methoxydibenzoylmethane ; 2,6- dimethyl-4-tert-butyl-4'-methoxydibenzoylmethane, and combinations thereof.

A preferred combination of photoactive compounds in a sunscreen composition includes a W-A and a UV-B photoactive compound. However, when 2- ethylhexyl-p-methoxycinnamate is included in a mixture with a dibenzoylmethane derivative, the dibenzoylmethane derivative can become particularly unstable.

Without intending to be limited to any particular mechanism, it is believed that the cinnamate ester reacts with an excited-state dibenzoylmethane derivative in a bimolecular pathway that renders both the dibenzoylmethane derivative and the cinnamat ester incapable of absorbing UV radiation. It has been found, quite surprisingly, that the use of a polymer that contains one or more photoactive compounds (e. g., crylene and/or fluorene moieties) covalently bonded to the polymer backbone increases the stability of a sunscreen composition that includes 2- ethylhexyl-p-methoxycinnamate and a dibenzoylmethane derivative. Thus, one embodiment of a sunscreen composition includes 2-ethylhexyl-p-methoxycinnamate, a dibenzoylmethane derivative, and a polymer that contains one or more photoactive compounds (e. g., crylene and/or fluorene moieties) covalently bonded to the polymer backbone.

One embodiment of the compounds, compositions, and methods described herein is a polymer including monomers'selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof :

wherein R'and W are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, Ci-Cso substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; R2 and R6 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, C1-C50 polyether, Cl-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R4, R7 and R8 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-Cso polyether, C1-C50 substituted polyether, Cl- Cso substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1. Preferably, R2 and R6 are the same or different and are selected from the group consisting of C2-Cls alkyl groups, more preferably they are the same and are 2,2-dimethylpropane. Preferably,

Rl and Rs are the same or different and are selected from the group consisting of Cs- C25 alkyl groups, more preferably they are the same and are C16 straight chain alkyl groups.

Polymers including monomers of formula (I) and/or formula (II), quite surprisingly, are able to increase the stability of a photoactive compound in a sunscreen composition. Accordingly, another embodiment of compounds, compositions, and methods described herein is a sunscreen composition sunscreen composition, including a mixture of a photoactive compound, and a polymer including monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof :

wherein Ri and Rs are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, Cs-Cg cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, Cl-Cso substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; R2 and R6 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-Cso polyether, C1-C50 substituted polyether, Cl-Cso substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R4, R7 and R8 are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-Cg cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, C1- Cso substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1. Preferably, R2 and R6 are the same or different and are selected from the group consisting of C2-CI5 alkyl groups, more preferably they are the same and are 2,2-dimethylpropane. Preferably, a

polymer including monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof is present in a sunscreen composition in a range of about 0.01% to about 30% by weight of the total weight of the composition, more preferably in a range of about 0. 1% to about 10%.

Polymers including monomers of formula (I) and/or monomers of formula (II), quite surprisingly, are able to absorb UV-radiation and to increase the photostability of a photoactive compound in a sunscreen composition, the polymers are therefore able to be used to protect a surface (e. g., human skin) from the harmful effects of UV-radiation. Figure 1 shows the absorbance spectra from 280 nm to 400 nm for a sunscreen composition wherein Octadecene/Crylene maleate copolymer (a polymer with monomers selected from the monomers of formulae (I) and (II) wherein Rl and Rs is a C16 straight chain alkyl group, R2 and R6 is a 2, 2-dimethylpropyl group, and there is no substitution of the aromatic rings of the crylene moieties) is present as the only UV-absorbing compound. Figure 2 is a graph of the absorbance spectra from 280 nm to 400 nm for the sunscreen compositions shown in Table III, and the composition shown in Table II, wherein Octadecene/Crylene maleate copolymer is included as the only UV-absorbing compound. Figure 2 confirms that Octadecene/Crylene maleate copolymer absorbs UV-radiation independent of other UV-absorbing agents that may be present in a sunscreen composition. Figure 11 shows the absorbance spectra from 280 nm to 400 nm for a sunscreen composition that contains 2% Crylene/Cetyl Polymer (a polymer containing the monomers containing crylene moieties (as shown in formulae (I) and (II) wherein R2 and R6 are 2,2-dimethylpropane, and Rl and Rs are C16 straight chain alkyl groups) and monomers that contain C16 fatty esters (as shown in formulae (III) and (IV) wherein R9 and R"are C16 straight chain alkyl groups, and Rl° and Rl2 are Cl6 straight chain alkyl groups), and for a composition that contains 0% of the Crylene/Cetyl Polymer (see Table VI for the sunscreen formulations). As shown in Figure 11, the sunscreen composition that does includes 2% of the Crylene/Cetyl Polymer achieves the highest absorbance as compared to the sunscreen composition of Table VI that does not include the polymer. Figure 12 shows the absorbance spectra from 280 nm to 400 nm for a sunscreen composition that contains 2% Crylene/Behenyl Polymer (a polymer

containing the monomers containing crylene moieties (as shown in formulae (I) and (II) wherein R2 and R6 are 2,2-dimethylpropane, and R'and W are Cl6 straight chain alkyl groups) and monomers that contain C16 fatty esters (as shown in formulae (III) and (IV) wherein R9 and R"are C16 straight chain alkyl groups, and Rio and R12 are C22 straight chain alkyl groups), and for a composition that contains 0% of the Crylene/Behenyl Polymer (see Table VIII for the sunscreen formulations). As shown in Figure 12, the sunscreen composition that does includes 2% of the Crylene/Behenyl Polymer achieves the highest absorbance as compared to the sunscreen composition of Table VIII that does not include the polymer. Accordingly, another embodiment of the compounds, compositions and methods described herein is a method of protecting a surface from ultraviolet radiation, including topically applying to the surface, in a cosmetically acceptable carrier, a polymer including monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof :

wherein Rl and Rs are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-Cg cycloalkyl, Cl-Cso polyether, Cl-C50 substituted polyether, C I-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-CS0 substituted alkyne; R2 and R6 are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-Cg cycloalkyl, Cl-C50 polyether, Cl-Cso substituted polyether, Cl-C50 substituted alkyl, C3-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R4, R and W are the same or different and are selected from the group consisting of Cl-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-Cg cycloalkyl, Cl-C5o polyether, Cl-Cso substituted polyether, Cl- C50 substituted alkyl, C3-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloallcyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1. Polymers including a monomer of formula (I) and/or formula (II) may be used to protect human skin from the harmful effects of ultra-violet radiation, and thus, the preferred surface for use of

the polymers described herein is human skin. Preferably, W and R are the same or different and are selected from the group consisting of C2-Cls alkyl groups, more preferably W and R6 are the same and are 2,2-dimethylpropane.

It has been found that polymers that include a monomer of formula (I) and/or a monomer of formula (II) may be used to waterproof a surface, and thereby, make the surface less water permeable. This aspect of a polymer including monomers of formulae (1) and/or (II) may be used in a variety of applications, including a sunscreen composition. A polymer including monomers of formulae (I) and/or (II) may be added to a sunscreen composition to help prevent the loss of the composition that may accompany the immersion in water of the object (e. g. , human skin) that has been applied with the composition. Accordingly, another embodiment of the compounds, compositions and methods described herein is a method of waterproofing a surface, including applying a polymer including monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof to a selected area of the surface:

wherein R1 and R5 are the same or different and are selected from the group consisting of Cl-C50 alkyl, C2-C50 alkenyl, C2-C5o alkyne, C3-Cg cycloalkyl, C1-C50 polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl, Cs-Cg substituted cycloalkyl, C2-Cso substituted alkenyl, C2-C50 substituted alkyne; R2 and R6 are the same or different and are selected from the group consisting of Cl-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, Cs-Cg cycloalkyl, C1-C50 polyether, Cl-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-Cso substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R, R and R8 are the same or different and are selected from the group consisting of Cl-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-Cso polyether, Cl-C50 substituted polyether, Cl- Cso substituted alkyl, C3-Cg substituted cycloalkyl, Cl-coo substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1. Polymers including a monomer of formula (I) and/or formula (II) is preferably be used in a sunscreen composition as a waterproofing agent to avoid the loss of composition when the

composition is immersed in water. Thus, the preferred surface for use of a polymer is human skin. Preferably, R2 and R6 are the same or different and are selected from the group consisting of C2-Cls alkyl groups, more preferably R and R6 are the same and are 2,2-dimethylpropane.

It has also been found that a polymer including monomers of formulae (I) and/or (II) may be used to form a film on a surface, and when added to a composition, a polymer including monomers of formulae (I) and/or (II) may provide film-forming properties to the composition. Accordingly, another embodiment of the compounds, compositions and methods described herein is a method for forming a film over at least part of a surface, including spreading a polymer including monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof on a part of the surface:

wherein Rl and R5 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-Cso polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; R2 and R6 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, C1-C50 polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R4, R7 and R8 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-C5o polyether, C1-C50 substituted polyether, Cl- C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-Cso substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1. Polymers including a monomer of formula (I) and/or formula (II) may be used to form a film on human skin to spread photoactive compounds in a sunscreen composition onto the skin. Thus, the

preferred surface is human skin. Preferably, R and R6 are the same or different and are selected from the group consisting of C2-Cls alkyl groups, more preferably R2 and R6 are the same and are 2,2-dimethylpropane.

Likewise, a polymer including monomers of formulae (I) and/or (II), quite surprisingly, is able to increase the photostability of a dibenzoylmethane derivative. Without intending to be limited to a particular mechanism, it is believed that a polymer including monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof is able to photostabilize a dibenzoylmethane derivative by accepting the triplet excited energy from an excited dibenzoylmethane derivative. Thus, another embodiment of the compounds, compositions, and methods described herein is to provide a method of photostabilizing a dibenzoylmethane derivative, the method including the step of, adding to the dibenzoylmethane derivative a photostabilizing amount of a polymer including monomers selected from the group consisting of a monomer of formula (I), a monomer of formula (II), and combinations thereof :

wherein Rl and R5 are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50 alkenyl, C2-C5o alkyne, C3-C8 cycloalkyl, C1-C50 polyether, Cl-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; R2 and R6 are the same or different and are selected from the group consisting of Cl-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-C50 polyether, C1-C50 substituted polyether, Cl-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R3, R4, R7 and R8 are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-Cso polyether, C1-C50 substituted polyether, Cl- C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; b, c, e and f are each in the range of 0 to 4; a and d are each in the range of 0 to 200, and the sum of a and d is at least 1. Preferably, R and R6 are the same or different and are selected from the group consisting of C2-Cls alkyl groups, more preferably R and R are the same and are 2,2-dimethylpropane.

Another embodiment of the compounds, compositions, and methods described herein is a polymer including monomers selected from the group consisting of a monomer for formula (VII), a monomer of formula (VIII), and combinations thereof :

wherein Rl5 and Rl9 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C5o alkyne, C3-C8 cycloalkyl, Cl-Cso polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; R16 and R2° are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, C1-C50 polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; Rl7, R18, Ruz and R22 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, C1-C50 polyether, Cl-Cso substituted polyether, Cl-C50 substituted alkyl, C3-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and p are each in the range of 0 to 4; k and ii are each in the range of 0 to 200, and the sum of k and n is at least 1. Preferably, R16 and Ro are the same or different and are selected from the group consisting of C2-Cls alkyl groups, more preferably Ri6 and R20 are the same and are 2,2-dimethylpropane.

Preferably, Rl5 and Rl9 are the same or different and are selected from the group consisting of Cs-C25 alkyl groups, more preferably they are the same and are C16 straight chain alkyl groups.

Polymers including monomers of formula (VII) and/or monomers formula (VIII), quite surprisingly, are able to increase the stability of a photoactive compound in a sunscreen composition. Accordingly, another embodiment of compounds, compositions, and methods described herein is a sunscreen composition sunscreen composition, including a mixture of a photoactive compound, and a polymer including monomers selected from the group consisting of a monomer of formula (VII), a monomer of formula (VIII), and combinations thereof :

wherein Rl5 and Rl9 are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50 alkenyl, C2-Cso alkyne, C3-C8 cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-Cso substituted alkyne; R16 and Wo are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50

alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-C50 polyether, Cl-Cso substituted polyether, Cl-C50 substituted alkyl, C3-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R R18, R", and R22 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-Cg cycloalkyl, Cl-Cso polyether, Ci-Cso substituted polyether, Cl-Cso substituted alkyl, C3-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and p are each in the range of 0 to 4; k and n are each in the range of 0 to 200, and the sum of k and n is at least 1. Preferably, R16 and R20 are the same or different and are selected from the group consisting of C2-Cls alkyl groups, more preferably they are the same and are 2,2-dimethylpropane.

Preferably, a polymer including monomers selected from the group consisting of a monomer of formula (VII), a monomer of formula (VIII), and combinations thereof is present in a sunscreen composition in a range of about 0. 01% to about 30% by weight of the total weight of the composition, more preferably in a range of about 0. 1% to about 10%.

Polymers including monomers of formula (VII) and/or monomers of formula (VIII), quite surprisingly, are able to absorb UV-radiation and to increase the photostability of a photoactive compound in a sunscreen composition, the polymers are therefore able to be used to protect a surface (e. g., human skin) from the harmful effects of UV-radiation. Accordingly, another embodiment of the compounds, compositions and methods described herein is a method of protecting a surface from ultraviolet radiation, including topically applying to the surface, in a cosmetically acceptable carrier, a polymer including monomers selected from the group consisting of a monomer of formula (VII), a monomer of formula (VIII), and combinations thereof :

wherein Rls and Rl9 are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; R16 and Wo are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50

alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-C50 polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl, C3-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; Rl7, Rl8, R2l and R22 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-C5o alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-C50 polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl,. substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and p are each in the range of 0 to 4; k and n are each in the range of 0 to 200, and the sum of k and n is at least 1.

It has been found that polymers that include a monomer of formula (VII) and/or a monomer of formula (VIII) may be used to waterproof a surface, and thereby, make the surface less water permeable. This aspect of a polymer including monomers of formulae (VII) and/or (VIII) may be used in a variety of applications, including a sunscreen composition. A polymer including monomers of formulae (VII) and/or (VIII) may be added to a sunscreen composition to help prevent the loss of the composition that may accompany the immersion in water of the object (e. g., human skin) that has been applied with the composition. Accordingly, another embodiment of the compounds, compositions and methods described herein is a method of waterproofing a surface, including applying a polymer including monomers selected from the group consisting of a monomer of formula (VII), a monomer of formula (VIII), and combinations thereof to a selected area of the surface:

wherein Rl5 and R19 are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-C50 polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; R16 and R2° are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50

alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-C50 polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-Cs0 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; Rl7, Rl8, R2l and R22 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-C50 polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl ; C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and p are each in the range of 0 to 4; k and n are each in the range of 0 to 200, and the sum of k and n is at least 1. Polymers including a monomer of formula (VII) and/or formula (VIII) is preferably be used in a sunscreen composition as a waterproofing agent to avoid the loss of composition when the composition is immersed in water. Thus, the preferred surface for use of a polymer is human skin. Preferably, R16 and R20 are the same or different and are selected from the group consisting of C2-Cls alkyl groups, more preferably Rl6 and Wo are the same and are 2, 2-dimethylpropane.

It has also been found that a polymer including monomers of formulae (VII) and/or (VIII) may be used to form a film on a surface, and when added to a composition, a polymer including monomers of formulae (VII) and/or (VIII) may provide film-forming properties to the composition. Accordingly, another embodiment of the compounds, compositions and methods described herein is a method for forming a film over at least part of a surface, including spreading a polymer including monomers selected from the group consisting of a monomer of formula (VII), a monomer of formula (VIII), and combinations thereof on a part of the surface:

wherein Rl5 and Rl9 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-Cg cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-Cso substituted alkyne; R16 and R20 are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50

alkenyl, C2-C50 alkyne, C3-Cg cycloalkyl, C1-C50 polyether, Cl-Cso substituted polyether, C1-C50 substituted alkyl, C3-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R, Rl8, Wl and R22 are the same or different and are selected from the group consisting of Cl-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-Cg cycloalkyl, Cl-Cso polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl, C3-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and p are each in the range of 0 to 4; k and n are each in the range of 0 to 200, and the sum of k and n is at least 1. Polymers including a monomer of formula (VII) and/or formula (VIII) may be used to form a film on human skin to spread photoactive compounds in a sunscreen composition onto the skin. Thus, the preferred surface is human skin. Preferably, R16 and Ro are the same or different and are selected from the group consisting of C2-Cls alkyl groups, more preferably Rl6 and R2° are the same and are 2,2-dimethylpropane.

Likewise, a polymer including monomers of formulae (VII) and/or (VIII), quite surprisingly, is able to increase the photostability of a dibenzoylmethane derivative. Without intending to be limited to a particular mechanism, it is believed that a polymer including monomers selected from the group consisting of a monomer of formula (VII), a monomer of formula (VIII), and combinations thereof is able to photostabilize a dibenzoylmethane derivative by accepting the triplet excited energy from an excited dibenzoylmethane derivative. Thus, another embodiment of the compounds, compositions, and methods described herein is to provide a method of photostabilizing a dibenzoylmethane derivative, the method including the step of, adding to the dibenzoylmethane derivative a photostabilizing. amount of a polymer including monomers selected from the group consisting of a monomer of formula (VII), a monomer of formula (VIII), and combinations thereof :

wherein RIS and Rl9 are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, Cl-Cso substituted alkyl, C3-C8 substituted cycloalkyl, C2-Cso substituted alkenyl, Cs-Cso substituted alkyne; R16 and Wo are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso

alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl and substituted heterocycloalkyl ; R17, R18, R21 and R22 are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, Cl-Cso substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C5o substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, hydroxyl, ester, carboxy, cyano, amino, amido, sulfur and halo; m, 1, o and p are each in the range of 0 to 4; k and n are each in the range of 0 to 200, and the sum of k and n is at least 1. Preferably, R16 and Ro are the same or different and are selected from the group consisting of C2-Cl5 alkyl groups, more preferably R16 and Ro are the same and are 2, 2-dimethylpropane.

Another embodiment of the compounds, compositions, and methods described herein is a polymer including monomers selected from the group consisting of a monomer for formula (XIII), a monomer of formula (XIV), and combinations thereof :

wherein R29 and R3l are the same or different and are selected from the group consisting of Cl-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-Cso polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; Wo and R32 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-Cso alkyne, C3-C8'cycloalkyl, Cl-Cso polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-Cso substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1; M and N are the same or different and are selected from the group consisting of oxygen, and amino; A* and B* are the same or different and are each a photoactive compound containing at least one moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the R30 group at the moiety and B* is bound to the R32 group at the moiety. Preferably, R30, and R32 are the same or different and are selected from the group consisting of C2-Cls alkyl groups, more preferably they are the same and are 2,2-dimethylpropane. Preferably, R29 and R31 are the same or different and are selected from the group consisting of C5-C25 alkyl groups, more preferably they are the same and are C16 straight chain alkyl groups. Preferably, A and B* are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXVII):

wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of the Wo or R32 groups; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of the R30 or R32 groups, and one of J and K are bound to one of the Wo or R32 groups. More preferably, A* and B are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV):

wherein D, E, F, G, I, J, and K are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein D, E, F, G, I, J, and K are bound to one of the Wo or R32 groups.

Polymers including monomers of formula (XIII) and/or monomers formula (XIV), quite surprisingly, are able to increase the stability of a photoactive compound in a sunscreen composition. Accordingly, another embodiment of compounds, compositions, and methods described herein is a sunscreen composition sunscreen composition, including a mixture of a photoactive compound, and a polymer including monomers selected from the group consisting of a monomer of formula (XIII), a monomer of formula (XIV), and combinations thereof :

wherein R9 and R31 are the same or different and are selected from the group consisting of Cl-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-Cg cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; Wo and R32 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-C5o alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-C50 polyether, C1-C50 substituted polyether, Cl-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl. substituted heteroaryl, substituted heterocycloalkyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1; M and N are the same or different and are selected from the group consisting of oxygen, and amino ; A* and B* are the same or different and are each a photoactive compound containing at least one moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the R ? o group at the moiety and B* is bound to the Et32 group at the moiety. Preferably, Wo and R32 are the same or different and are selected from the group consisting of Ca-CIS alkyl groups, more preferably they are the same and are 2, 2-dimethylpropane. Preferably, R29 and R3'are the same or different and are selected from the group consisting of Cs-C25 alkyl groups, more preferably they are the same and are C16 straight chain alkyl groups. Preferably, A* and B* are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXVII):

wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of the R30 or R32 groups ; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of the R30 or R32 groups, and one of J and K are bound to one of the R30 or R32 groups. More preferably, A* and B* are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV):

wherein D, E, F, G, I, J, and K are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein D, E, F, G, I, J, and K are bound to one of the R30 or R32 groups. Preferably, a polymer including monomers selected from the group consisting of a monomer of formula (XIII), a monomer of formula (XIV), and combinations thereof is present in a sunscreen composition in a range of about 0. 01% to about 30% by weight of the total weight of the composition, more preferably in a range of about 0. 1% to about 10%.

Polymers including monomers of formula (XIII) and/or monomers of formula (XIV), quite surprisingly, are able to absorb UV-radiation and to increase the photostability of a photoactive compound in a sunscreen composition, the polymers are therefore able to be used to protect a surface (eg., human skin) from the harmful effects of UV-radiation. Accordingly, another embodiment of the compounds, compositions and methods described herein is a method of protecting a surface from ultraviolet radiation, including topically applying to the surface, in a cosmetically acceptable carrier, a polymer including monomers selected from the group consisting of a monomer of formula (XIII), a monomer of formula (XIV), and combinations thereof :

wherein R29 and Ruz are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-Cso polyether, Cl-C50 substituted polyether, C1-C50 substituted alkyl, Cs-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; R30 and R32 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-Cso alkenyl, C2-C5o alkyne, C3-Cg cycloalkyl, Cl-C50 polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1; M and N are the same or different and are selected from the group consisting of oxygen, and amino; A* and B* are the same or different and are each a photoactive compound containing at least one moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the Wo group at the moiety and B* is bound to the

R32 group at the moiety. Polymers including a monomer of formula (XIII) and/or formula (XIV) may be used to protect human skin from the harmful effects of ultra- violet radiation, and thus, the preferred surface for use of the polymers described herein is human skin. Preferably, R30 and R32 are the same or different and are selected from the group consisting of C2-Cl5 alkyl groups, more preferably they are the same and are 2,2-dimethylpropane. Preferably, R29 and Ruz are the same or different and are selected from the group consisting of C5-C25 alkyl groups, more preferably they are the same and are C16 straight chain alkyl groups. Preferably, A and B* are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXVII):

wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of the R30 or R32 groups; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of the R30 or R32 groups, and one of J and K are bound to one of the R30 or R32 groups. More preferably, A* and B* are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV):

wherein D, E, F, G, I, J, and K are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein D, E, F, G, I, J, and K are bound to one of the Wo or R32 groups.

It has been found that polymers that include a monomer of formula (XIII) and/or a monomer of formula (XIV) may be used to waterproof a surface, and thereby, make the surface less water permeable. This aspect of a polymer including monomers of formulae (XIII) and/or (XIV) may be used in a variety of applications, including a sunscreen composition. A polymer including monomers of formulae (XIII) and/or (XIV) may be added to a sunscreen composition to help prevent the loss of the composition that may accompany the immersion in water of the object (e. g., human skin) that has been applied with the composition. Accordingly, another embodiment of the compounds, compositions and methods described herein is a method of waterproofing a surface, including applying a polymer including monomers selected from the group consisting of a monomer of formula (XIII), a monomer of formula (XIV), and combinations thereof to a selected area of the surface:

wherein R29 and Ruz are the same or different and are selected from the group consisting of Ci-C50 alkyl, C2-CSO alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-C50 polyether, Cl-Cso substituted polyether, Cl-Cso substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; R3'and R 32 are the same or different and are selected from the group consisting of C1-C50 alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-Cg cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-Cg substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloallcyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1; M and N are the same or different and are selected from the group consisting of oxygen, and amino; A* and B*

are the same or different and are each a photoactive compound containing at least one moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the R3 () group at the moiety and B* is bound to the R32 group at the moiety. Polymers including a monomer of formula (XIII) and/or formula (XIV) is preferably be used in a sunscreen composition as a waterproofing agent to avoid the loss of composition when the composition is immersed in water.

Thus, the preferred surface for use of a polymer is human skin. Preferably, R ? o and R32 are the same or different and are selected from the group consisting of C2-CI5 alkyl groups, more preferably they are the same and are 2, 2-dimethylpropane.

Preferably, R29 and R31 are the same or different and are selected from the group consisting of C5-C25 alkyl groups, more preferably they are the same and are C16 straight chain alkyl groups. Preferably, A* and B* are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXVII):

wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of the R30 or R32 groups ; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of the R30 or R32 groups, and one of J and K are bound to one of the R30 or R32 groups. More preferably, A* and B* are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV):

wherein D, E, F, G, I, J, and K are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein D, E, F, G, I, J, and K are bound to one of the Wo or R32 groups.

It has also been found that a polymer including monomers of formulae (XIII) and/or (XIV) may be used to form a film on a surface, and when added to a composition, a polymer including monomers of formulae (XIII) and/or (XIV) may provide film-forming properties to the composition. Accordingly, another embodiment of the compounds, compositions and methods described herein is a method for forming a film over at least part of a surface, including spreading a polymer including monomers selected from the group consisting of a monomer of formula (XIII), a monomer of formula (XIV), and combinations thereof on a part of the surface:

wherein R29 and R3l are the same or different and are selected from the group consisting of Cl-C50 alkyl, C2-C50 alkenyl, C2-Cso alkyne, C3-C8 cycloalkyl, Cl-C50 polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; R30 and R32 are the same or different and are selected from the group consisting of Cl-C50 alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, Cl-C50 polyether, Cl-C50 substituted polyether, Cl-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1; M and N are the same or different and are selected from the group consisting of oxygen, and amino ; A* and B* are the same or different and are each a photoactive compound containing at least one moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the R30 group at the moiety and B* is bound to the

R32 group at the moiety. Polymers including a monomer of formula (XIII) and/or formula (XIV) may be used to form a film on human skin to spread photoactive compounds in a sunscreen composition onto the skin. Thus, the preferred surface is human skin. Preferably, R30 and R32 are the same or different and are selected from the group consisting of C2-Cl5 alkyl groups, more preferably they are the same and are 2,2-dimethylpropane. Preferably, R29 and R31 are the same or different and are selected from the group consisting of Cs-C2s alkyl groups, more preferably they are the same and are C16 straight chain alkyl groups. Preferably, A and B* are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXVII):

wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of the R30 or R32 groups; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of the R30 or R32 groups, and one of J and K are bound to one of the R30 or R32 groups. More preferably, A* and B* are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV):

wherein D, E, F, G, I, J, and K are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein D, E, F, G, I, J, and K are bound to one of the R30 or R32 groups.

Likewise, a polymer including monomers of formulae (XIII) and/or (XIV), quite surprisingly, is able to increase the photostability of a dibenzoylmethane derivative. Without intending to be limited to a particular mechanism, it is believed that a polymer including monomers selected from the group consisting of a monomer of formula (XIII), a monomer of formula (XIV), and combinations thereof is able to photostabilize a dibenzoylmethane derivative by accepting the triplet excited energy from an excited dibenzoylmethane derivative. Thus, another embodiment of the compounds, compositions, and methods described herein is to provide a method of photostabilizing a dibenzoylmethane derivative, the method including the step of, adding to the dibenzoylmethane derivative a photostabilizing amount of a polymer including monomers selected from the group consisting of a monomer of formula (XIII), a monomer of formula (XIV), and combinations thereof :

wherein R29 and R31 are the same or different and are selected from the group consisting of Cl-C50 alkyl, C2-Cso alkenyl, C2-C50 alkyne, C3-C8 cycloalkyl, C1-C50 polyether, C1-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne; R30 and R32 are the same or different and are selected from the group consisting of Cl-Cso alkyl, C2-C50 alkenyl, C2-C50 alkyne, C3-Cg cycloalkyl, Cl-C50 polyether, Cl-C50 substituted polyether, C1-C50 substituted alkyl, C3-C8 substituted cycloalkyl, C2-C50 substituted alkenyl, C2-C50 substituted alkyne, aryl, substituted aryl, heteroaryl, heterocycloalkyl, substituted heteroaryl, substituted heterocycloalkyl, and ether; u and v are each in the range of 0 to 200, and the sum of u and v is at least 1; M and N are the same or different and are selected from the group consisting of oxygen, and amino; A* and B* are the same or different and are each a photoactive compound containing at least one

moiety selected from the group consisting of a primary amino group, a primary hydroxyl group, a secondary amino group, a secondary hydroxyl group, and a carboxy group; and wherein A* is bound to the R30 group at the moiety and B* is bound to the R32 group at the moiety. Preferably, R30 and R32 are the same or different and are selected from the group consisting of C2-Cls alkyl groups, more preferably they are the same and are 2,2-dimethylpropane. Preferably, R29 and R31 are the same or different and are selected from the group consisting of Cs-C25 alkyl groups, more preferably they are the same and are C16 straight chain alkyl groups. Preferably, A* and B* are the same or different and are selected from the group consisting of a compound of formula (XXXII), a compound of formula (XXXIII), a compound of formula (XXXIV), a compound of formula (XXXV), a compound of formula (XXXVI), and a compound of formula (XXXVII):

wherein F, G, I, and L are the same or different and are selected from the group consisting of amino, and hydroxyl, and are bound to one of the R30 or R32 groups ; D, E, J, and K are the same or different and are selected from the group consisting of hydrogen, amino, and hydroxyl, and one of D and E are bound to one of the Wo or R32 groups, and one of J and K are bound to one of the R30 or R32 groups. More preferably, A* and B* are the same or different and are selected from the group consisting of a compound of formula (XIX), a compound of formula (XX), a compound of formula (XXI), a compound of formula (XXII), a compound of formula (XXIII), a compound of formula (XXIV), and a compound of formula (XXV):

wherein D, E, F, G, I, J, and K are the same or different and are selected from the group consisting of amino, and hydroxyl; and wherein D, E, F, G, I, J, and K are bound to one of the R30 or R32 groups.

EXAMPLES The following examples are provided to illustrate the compounds, compositions, and methods described herein but are not intended to limit the scope of the compounds, compositions, and methods described herein.

Example 1 The following is a preparation for a polymer compound containing crylene moieties attached to the polymer backbone, wherein Poly (octadecene-l-co- maleic anhydride) resin (PA-18 available from Chevron Chemicals Co. , San Francisco, Calif.) served as a polymer starting material, and 2,2-dimethyl-3-

hydroxypropyl-2-cyano-3,3-diphenylpropenoate served as the crylene moiety with a tether of neopentyl glycol. The PA-18 Polyanhydride Resin (300 g) and 2,2- dimethyl-3-hydroxypropyl-2-cyano-3,3-diphenylpropenoate (258 g) were placed in 2L 3-neck round-bottom flask and 800 ml of toluene was added. The reaction mixture was then heated and refluxed for two hours until reaction was completed (as determined by GPC). The product in solution was placed in evaporation vessels to remove the solvent. The final product was then dried and ground to give off-white powder (510 g, 91% yield).

Example 2 The following is a preparation for a polymer compound containing crylene moieties and a fatty ester (a C16 straight chain carbon) attached to the polymer backbone, wherein Poly (octadecene-l-co-maleic anhydride) resin (PA-18 available from Chevron Chemicals Co. , San Francisco, Calif. ) served as a polymer starting material, 2,2-dimethyl-3-hydroxypropyl-2-cyano-3, 3-diphenylpropenoate served as the crylene moiety with a tether of neopentyl glycol, and cetyl alcohol (available from Sigma-Aldrich, St. Louis, Mo) attached to the backbone to create a fatty ester moiety.

The polymer produced by the foregoing procedure includes the following monomers dispersed throughout the polymer:

It is also expected that a small amount of the unreacted anhydride monomers and/or unreacted diacid monomers that correspond to the anhydride monomer starting material (PA-18 polymer) will be present in the final polymer composition.

The polymer was prepared by placing the 200 g of the PA-18 polymer (1 mole equivalence) and 114.82 g of 2, 2-dimethyl-3-hydroxypropyl 2-cyano-3,3- diphenylpropenoate (0.342 moles, 0.6 mole equivalence) in a 2-liter 3-neck round- bottom flask, assembled with Dean-Stark receiver, and 1000 ml of xylenes were added to the flask. A heterogeneous reaction mixture was created, and the mixture was brought to boiling and refluxed for two hours to remove any traces of water.

After the mixture was refluxed for two hours, a first portion of TYZOR DEA (0.5 g) (available from Dupont, Wilmington, DE) was added to the reaction mixture. The reaction mixture was allowed to reflux for an additional six hours, and then the reaction mixture was cooled to room temperature and allowed to stir at room temperature for ten hours.

To the room temperature reaction mixture 27.64 g of cetyl alcohol (0.114 mole, 0.2 mole-equivalence) was added and the mixture was refluxed for one hour. A second portion of TYZOR DEA (0.5 g) was then added, the reaction mixture was allowed to reflux for an additional seven hours, and following the reflux, the reaction mixture was cooled to room temperature. The reaction mixture was transferred to a drying vessel and the solvent was removed under reduced pressure.

A GPC analysis of the solid product showed nearly full incorporation of both the crylene moiety and the cetyl alcohol into the polymer with only 0. 1% of free crylene moiety (2,2-dimethyl-3-hydroxypropyl 2-cyano-3,3-dipthenylpropenoate) present in the product. The polymeric product (313.7 g; 92% of the theoretical yield) was powdered before further application.

Example 3 The following is a preparation for a polymer compound containing crylene moieties and a fatty ester (a C22 straight chain carbon) attached to the polymer backbone, wherein Poly (octadecene-l-co-maleic anhydride) resin (PA-18 available from Chevron Chemicals Co. , San Francisco, Calif.) served as a polymer starting material, 2,2-dimethyl-3-hydroxypropyl-2-cyano-3, 3-diphenylpropenoate served as the crylene moiety with a tether of neopentyl glycol, and 1-Docosanol (behenyl alcohol) (available from Sigma-Aldrich, St. Louis, Mo) attached to the backbone to create a fatty ester moiety. The polymer produced by the foregoing procedure includes the following monomers dispersed throughout the polymer:

It is also expected that a small amount of the unreacted anhydride monomers and/or unreacted diacid monomers that correspond to the anhydride monomer starting material (PA-18 polymer) will be present in the final polymer composition.

The polymer was prepared by placing the 200 g of the PA-18 polymer (1 mole equivalence) and 114.82 g of 2, 2-dimethyl-3-hydroxypropyl 2-cyano-3,3- diphenylpropenoate (0.342 moles, 0.6 mole equivalence) in a 2-liter 3-neck round- bottom flask, assembled with Dean-Stark receiver, and 1000 ml of xylenes were added to the flask. A heterogeneous reaction mixture was created, and the mixture was brought to boiling and refluxed for two hours to remove any traces of water.

After the mixture was refluxed for two hours, a first portion of TYZOR DEA (0. 63 g) (available from Dupont, Wilmington, DE) was added to the reaction mixture, and the reaction mixture was allowed to reflux for an additional six hours. A second portion of TYZOR DEA (0.63 g) was then added to the reaction mixture and the reaction mixture a refluxed for an additional 10 hours.

To the refluxing reaction mixture, 17. 58 g of 1-Docosanol (behenyl alcohol) (0.054 mole, 0.1 mole-equivalence) was added and the mixture was refluxed for one hour. A second portion of TYZOR DEA (0.63 g) was then added, the reaction mixture was allowed to reflux for an additional seven hours, and following the reflux, the reaction mixture was cooled to room temperature. The reaction mixture was transferred to a drying vessel and the solvent was removed under reduced pressure.

A GPC analysis of the solid product showed nearly full incorporation of both the crylene moiety and the cetyl alcohol into the polymer with only 0. 1% of free crylene moiety (2,2-dimethyl-3-hydroxypropyl 2-cyano-3,3-dipthenylpropenoate) present in the product. The polymeric product (293 g; 93% of the theoretical yield) was powdered before further application.

Example 4 A composition which included only the Octadecene/Crylene maleate copolymer as the only LTV-Absorbing compound was prepared by mixing the ingredients shown in Table II below: Table II Weight Phase Ingredient Percent A Caprylic/capric triglycerides 8.00% Polyisobutene 3.00% Phenylethyl benzoate 1.00% Diethylhexyl malate 2.00% B Octadecene/Crylene maleate copolymer 2.00% C Stearyl alcohol 1.00% Steareth-21 0. 22% Steareth-2 0.28% Polyglyceryl-3 methyl glucose distearate 3. 00% D Dimethicone (100 cSt) 0.40% E Water 72.56% Disodium EDTA 0.05% Carbomer 0.20% F Sorbitol (70%) 4.29% <BR> <BR> <BR> <BR> Phenoxyethanol, Methylparaben, Ethylparaben, 1. 00%<BR> <BR> <BR> <BR> Propylparaben, and Isobutylparaben Triethanolamine 1.00%

An oil-in-water emulsion was created, wherein the aqueous phase included a mixture of the ingredients in Phase E, and the oil phase included a mixture of the ingredients of Phases A, B, C, and D. The emulsion was prepared by combining the ingredients of Phase A, and adding this mixture of ingredients to a vessel, and heating the vessel to about 90° C. The ingredients from Phases B, C, and D were then added to the heated vessel with stirring until the mixture became clear and homogeneous. In another vessel, the ingredients of Phase E were added in the order shown in Table II, with continuous stirring. The vessel containing the ingredients of Phase E was then heated to about 80° C. With homogenization, the contents of the vessel containing the oil phase (a mixture of the ingredients of Phases A, B, C, and D) were added to the vessel containing the water phase (a mixture of the ingredients of Phase E). The resulting mixture was homogenized for three minutes, and then the vessel was remove from heat source and allowed to cool. When the temperature of the mixture fell below 40° C, the ingredients of Phase F were added.

The mixture was stirred until a smooth cream was formed. The resulting cream was then packaged to avoid the inadvertent photodegradation of the UV-absorbing compounds in the composition.

Figure 1 is a graph of the percent absorbance of the sunscreen composition listed in Table II. As shown in Figure 1, the Octadecene/Crylene maleate copolymer absorbs over the entire W-spectrum, but achieves its maximum absorbance in the range of about 290-330 nm.

Example 5 Two sunscreen compositions were prepared by mixing the ingredients shown in Table III below:

Table III Sunscreen w/0% Sunscreen wl 2% Phase Ingredient Polymer (wt. %) Polymer (wt. %) A Octyl salicylate 5.00% 5. 00% Homosalate 7.50% 7.50% Diethylhexyl 2, 6-naphthalate 2.50% 2.50% Octocrylene 2.50% 2.50% Dimethyl capramide 1.00% 1.00% Diethylhexyl malate 2. 01% 2. 01% B Avobenzone 3.00% 3.00% Benzophenone-3 0.49% 0.49% C Octyldodecanol 2.00% Octadecene/Crylene maleate 2. 00% copolymer D Stearyl alcohol 1.00% 1.00% Steareth 21 0.29% 0.29% Steareth 2 0. 21% 0. 21% Polyglyceryl-3 methyl glucose 3 00% 3 00% distearate E Water 64.16% 63.16% Disodium EDTA 0.05% 0.05% Carbomer 0.20% 0.20% Sorbitol (70%) 4.29% 4.29% Phenoxyethanol, Methylparaben, Ethylparaben, Propylparaben, and 0. 60% 0.60% Isobutylparaben F Triethanolamine 0.2% 1. 2% Oil-in-water emulsions were created, wherein the aqueous phase included a mixture of the ingredients in Phase E, and the oil phase included a mixture of the ingredients of Phases A, B, C, and D. The emulsions were prepared by combining the ingredients of Phase A, and adding this mixture of ingredients to a vessel, and heating the vessel to about 90° C. The ingredients from Phases B, C, and D were then added to the heated vessel with stirring until the mixture became clear and homogeneous. In another vessel, the ingredients of Phase E were added in the order shown in Table III, with continuous stirring. The vessel containing the ingredients of Phase E was then heated to about 80° C. With homogenization, the contents of the vessel containing the oil phase (a mixture of the ingredients of Phases A, B, C, and D) to the vessel containing the water phase (a mixture of the ingredients

of Phase E). The resulting mixture was homogenized for three minutes, and then the vessel was remove from heat source and allowed to cool. When temperature of the mixture fell below 40° C, the ingredient of Phase F (triethanolamine) was added. The mixture was stirred until a smooth cream was formed. The resulting creams were packaged to avoid the inadvertent photodegradation of the UV-absorbing compounds, and the creams were then used to test the photostability of the compositions.

The resulting sunscreens were tested for photostability by measuring absorbance on a Labsphere UV-1000S Ultraviolet Transmittance Analyzer (software version 1.27) before and after irradiation with a Solar Light Company model 16S solar simulator (equipped with a UG11 filter to block radiation greater than 400 nm, WG320 filter that transmits UV-radiation greater than 290 nm), and a removable WG335 filter that transmits W-radiation greater than 320 nm). Output was monitored by a PMA 2105 UV-B DCS Detector (biologically weighted) or a PMA 2114 UV-A Detector and controlled by a PMA 2100 Automatic Dose Controller (available from Solar Light Co.).

To test stability, a synthetic skin substrate was used for testing the sunscreen compositions (VITRO-SKIN substrate (Lot No. 3059) by IMS, Inc. of Milord, CT). To prepare the substrate, a 300g solution of 18 wt. % glycerin and 82 wt. % deionized water was added to a hydrating chamber (IMS), and a sheet of VITRO-SKIN was placed in the hydrating chamber and left overnight (approx. 16 hours). Several 6.5 cm squares were cut from the hydrated VITRO-SKIN and used for absorbance measurements.

To prepare slides for testing, a minimum 100 zip of sunscreen composition is drawn or placed into a pipet tip (Justor 11 OODG, set to dispense 100 lit). Using steady, even pressure on the pipette plunger, the test substance was applied to VITRO-SKIN square in a pattern of at least 50 small dots arranged to cover a 6 cm center of a square. The VITRO-SKIN square was then placed on a foam block, and the test material was spread by finger (covered with a latex glove or finger cot), first in a circular motion, then by a side-to-side motion during which the VITRO-SKIN is deformed by the pressure. The square was then mounted in a slide holder (60 mm x

60 mm glassless slide mounts with metal masks by Gepe Management AG, Zug, Switzerland) and allowed to dry for 30-60 minutes.

It has been found that to avoid certain errors of an as yet unknown cause, it is advantageous to pre-expose the tested spot on the slide to 2 MED, and then zero the detector to treat the pre-exposed spot as a 0 MED reading. Thus, using the PMA 2105 UV-B detector, a pre-exposure of 2 MED was made. Immediately following the pre-exposure, the slide is taken to the W Transmittance Analyzer and the irradiated spot is scanned. The original scan is deleted, and the new scan is saved as the baseline ("O MED") scan.

To test stability of a slide in the W-B range, the PMA 2105 was used, and the slide was positioned on the UV transmittance analyzer using registration marks, and a scan of a 1 cm spot on the slide was performed. The slide was then transferred to a holder placed adjacent to the solar simulator and, using a calipers, was positioned such that the beam of UV radiation exiting the solar simulator illuminated the same 1 cm spot on the slide. To test stability of a slide in the UV-A range, the PMA 2114 was substituted for the PMA 2105, and a WG335 filter was installed in the beam path. The following software settings were used: UV-B = 290-320 nm; UV-A -320-400 nm. Following an exposure of 5 MED, the slide was again placed in position on the UV transmittance analyzer, and a scan of the exposed spot was performed. The procedure was repeated on the same 1 cm spot on the slide until the desired total radiation dosage was achieved (approximately 35 MED for the UV-B studies, and 120 J/cm2 for the LAV-A studies).

Figure 2 is a graph of the absorbance of the composition listed in Table II and the sunscreen compositions listed in Table III. As shown in Figure 2, the sunscreen composition that does includes 2% of the Octadecene/Crylene maleate copolymer achieves the highest absorbance as compared to the sunscreen composition of Table III that does not include the polymer and the composition of Table II that includes 2% of the polymer as the only UV-absorber.

Figure 3 is a graph of the absorbance of the sunscreen composition listed in Table III, which has no Octadecene/Crylene maleate copolymer in the

composition. The absorbance spectra of the composition was recorded before and after exposure to 35 MED of radiation. As shown in Figure 3, the sunscreen composition that does not include the Octadecene/Crylene maleate copolymer is susceptible to photodegradation at 35 MED exposure.

Figure 4 is a graph of the absorbance of the sunscreen composition listed in Table III that includes 2% of the Octadecene/Crylene maleate copolymer in the composition. The absorbance spectra of the composition was recorded before and after exposure to 35 MED of radiation. As shown in Figure 4, the absorbance spectra of the sunscreen composition of Table III that includes 2% of the Octadecene/Crylene maleate copolymer shows that the composition is relatively stable to photodegradation upon exposure to up to 35 MED.

Figure 5 is a graph of the absorbance of the both sunscreen compositions listed in Table III, including one that includes 2% of the Octadecene/Crylene maleate copolymer, and one that does not include the Octadecene/Crylene maleate copolymer. The absorbance spectra of compositions were recorded before and after exposure to 35 MED of radiation. As shown in Figure 4, the Octadecene/Crylene maleate copolymer increases the photostability of the composition.

Figures 6 and 7 are the absorbance spectra for the compositions listed in Table III.

Example 6 A determination of the Sun Protection Factor (SPF) of the sunscreen compositions listed in Table II and Table III was performed. To test the SPF of the compositions, each slide was placed on the UV transmittance analyzer and scans were taken from five locations on the slide. An SPF report was generated for each slide using the Labsphere software UV1000S, Version 1.27.

The results of the SPF testing for the composition listed in Table II and the compositions listed in Table III are shown below in Table IV:

Table IV Composition SPF Results Composition with 2% Scan No. 1 4.65 Polymer as the only UV-Scan No. 2 4.68 Absorbing Compound Scan No. 3 5.04 (Table i) Scan No. 4 5.17 Scan No. 5 4.89 Average SPF 4.9 Sunscreen Composition Scan No. 1 23.32 with 0% Polymer Scan No. 2 21.98 (Table III) Scan No. 3 18.96 Scan No. 4 23.35 Scan No. 5 21.88 Average SPF 21.9 Sunscreen Composition Scan No. 1 25.78 with 2% Polymer Scan No. 2 27.90 (Table III) Scan No. 3 26.96 Scan No. 4 27.64 Scan No. 5 25.83 Average SPF 26. 8.

The results shown in Table IV indicate that the addition of 2% Octadecene/Crylene maleate copolymer to a topical composition the contains no other UV absorbers provides an SPF of about 5, and provides an increase in SPF of about 5 to sunscreen compositions.

Example 7 The water resistance of sunscreen compositions listed in Table III was tested by immersing slides of VITRO-SKIN, which contain the compositions, in moving water for a period of time and testing the slides for a loss in absorbance as measured by SPF. The slides were tested before and after being immersed in water and the results were compared.

The slides were prepared according to the procedure set forth in Example 5, and each slide was placed in a beaker and the top, bottom, and sides of the slides were secured in the beaker with binder clips. The slides were then completely immersed in water by the addition of two liters of tap water to the beaker. The beaker was placed on a stir table and a stir bar is placed on the bottom of the beaker. The stir bar is set in motion to circulate the water with a mild vortex. After 40 minutes, the slides were removed from the beaker, shaken to remove excess water, and allowed to air-dry for 30 minutes. Scans are taken from five locations on the slides. The absorbance spectra and an SPF report was generated for each composition.

The results of the SPF reports are summarized in Table V below: Table V Pre-immersion Post-Immersion Composition SPF Results SPF Results Sunscreen Composition Scan No. 1 23.58 12.10 with 0% Polymer Scan No. 2 22.39 10.73 (Table III) Scan No. 3 19.81 9.69 Scan No. 4 24.11 12.57 Scan No. 5 21.17 11.07 Average SPE 22.2 11.2 Sunscreen Composition Scan No. 1 27.09 29.08 with 2% Polymer Scan No. 2 27.77 29.45 (Table III) Scan No. 3 27.23 29.10 Scan No. 4 27.29 29.42 Scan No. 5 27.74 28.30 Average SPF 27.4 29.1 As shown in Table V, the immersion of the sunscreen composition containing 0% of the Octadecene/Crylene maleate copolymer in water causes a significant loss of SPF. In contrast, when the sunscreen composition listed in Table III that included 2% Octadecene/Crylene maleate copolymer was immersed in water, there was actually a slight increase in the SPF results as compared to the pre- immersion SPF results. We consider this increase to be anomalous and without

significance. However, this test and the others referenced in the accompanying demonstrate the polymer's ability to: (a) provide water resistance (i. e. , water proofing) to the composition, and thereby avoiding loss of the composition upon immersion; (2) absorb UV-radiation ; and (3) stabilize the other photoactive compounds in the composition by, for example, absorbing the excited state energy of other photoactive compounds and rapidly dissipating that energy.

Figure 8 is a graph of the absorbance of the sunscreen composition listed in Table III where there is no Octadecene/Crylene maleate copolymer in the composition. As shown in Figure 8, there is a significant loss in absorbance after the composition has been immersed in moving water for 40 minutes.

Figure 9 is a graph of the absorbance of the sunscreen composition listed in Table III that included 2% Octadecene/Crylene maleate copolymer in the composition. As shown in Figure 9, the absorbance spectra indicates that the immersion of the composition in moving water for 40 minutes does not cause a loss in the absorbance over the entire UV-spectra (290-400 nm).

Figure 10 is a graph of the percent absorbance of both of the sunscreen compositions listed in Table III. As shown in Figure 10, as compared to the composition that does not include the Octadecene/Crylene maleate copolymer, the addition of the Octadecene/Crylene maleate copolymer to the composition prevents a loss in absorbance upon immersion in moving water for 40 minutes.

Example 8 Sunscreen compositions where prepared that included 2% of the polymer prepared in Example 2 (as shown in formulae (I) and (II) wherein R2 and R are 2,2-dimethylpropane, and Rl and R5 are C16 straight chain alkyl groups) and monomers that contain C16 fatty esters (as shown in formulae (III) and (IV) wherein R9 and R'1 are C16 straight chain alkyl groups, and Rl° and Rl2 are C16 straight chain alkyl groups), which shall be referred to throughout the examples as"Crylene/Cetyl Polymer, "and that substituted the Crylene/Cetyl Polymer with the non-UV absorbing Octyldodecanol using the ingredients listed in Table VI below:

Table VI Sunscreen w/0% Sunscreen w/2% Phase Ingredient Polymer (wt. %) Polymer (wt. %) A Octyl salicylate 5.00% 5.00% Homosalate 7.50% 7. 50% Dimethyl capramide 1.00% 1. 00% Diethylhexyl malate 2.00% 2.00% B Avobenzone 3.00% 3.00% C Octyldodecanol 2.00% Crylene/Cetyl copolymer 2.00% D Stearyl alcohol 1. 00% 1.00% Steareth 21 0. 29% 0.29% Steareth 2 0. 21% 0. 21% <BR> <BR> <BR> Polyglyceryl-3 methyl glucose 3 00% 3 00%<BR> <BR> distearate E Water 69.66% 68.66% Disodium EDTA 0.05% 0.05% Carbomer 0.20% 0.20% Sorbitol (70%) 4.29% 4.29% Phenoxyethanol, Methylparaben, Ethylparaben, Propylparaben, and 0.60% 0. 60% Isobutylparaben F Triethanolamine 0.2% 1.2% Oil-in-water emulsions were created, wherein the aqueous phase included a mixture of the ingredients in Phase E, and the oil phase included a mixture of the ingredients of Phases A, B, C, and D. The emulsions were prepared by combining the ingredients of Phase A, and adding this mixture of ingredients to a vessel, and heating the vessel to about 90° C. The ingredients from Phases B, C, and D were then added to the heated vessel with stirring until the mixture became clear and homogeneous. In another vessel, the ingredients of Phase E were added in the order shown in Table. VI, with continuous stirring. The vessel containing the ingredients of Phase E was then heated to about 80° C. With homogenization, the contents of the vessel containing the oil phase (a mixture of the ingredients of Phases A, B, C, and D) to the vessel containing the water phase (a mixture of the ingredients of Phase E). The resulting mixture was homogenized for three minutes, and then the vessel was remove from heat source and allowed to cool. When temperature of the mixture fell below 40° C, the ingredient of Phase F (triethanolamine) was added. The

mixture was stirred until a smooth cream was formed. The resulting creams were packaged to avoid the inadvertent photodegradation of the UV-absorbing compounds, and the creams were then used to test the photostability of the compositions.

The resulting sunscreens were tested for photostability by measuring absorbance on a Labsphere UV-1000S Ultraviolet Transmittance Analyzer (software version 1.27) before and after irradiation with a Solar Light Company model 16S solar simulator (equipped with a UG11 filter to block radiation greater than 400 nm, WG320 filter that transmits UV-radiation greater than 290 nm), and a removable WG335 filter that transmits UV-radiation greater than 320 nm). Output was monitored by a PMA 2105 UV-B DCS Detector (biologically weighted) or a PMA 2114 UV-A Detector and controlled by a PMA 2100 Automatic Dose Controller (available from Solar Light Co.).

To test stability, a synthetic skin substrate was used for testing the sunscreen compositions (VITRO-SKIN substrate (Lot No. 3059) by IMS, Inc. of Milord, CT). To prepare the substrate, a 300g solution of 18 wt. % glycerin and 82 wt. % deionized water was added to a hydrating chamber (IMS), and a sheet of VITRO-SKIN was placed in the hydrating chamber and left overnight (approx. 16 hours). Several 6.5 cm squares were cut from the hydrated VITRO-SKIN and used for absorbance measurements.

To prepare slides for testing, a minimum 100 Ill of sunscreen composition is drawn or placed into a pipet tip (Justor 1100DG, set to dispense 100 , ul). Using steady, even pressure on the pipette plunger, the test substance was applied to VITRO-SKIN square in a pattern of at least 50 small dots arranged to cover a 6 cm center of a square. The VITRO-SKIN square was then placed on a foam block, and the test material was spread by finger (covered with a latex glove or finger cot), first in a circular motion, then by a side-to-side motion during which the VITRO-SI (IN is deformed by the pressure. The square was then mounted in a slide holder (60 mm x 60 mm glassless slide mounts with metal masks by Gepe Management AG, Zug, Switzerland) and allowed to dry for 30-60 minutes.

It has been found that to avoid certain errors of an as yet unknown cause, it is advantageous to pre-expose the tested spot on the slide to 2 MED, and then zero the detector to treat the pre-exposed spot as a 0 MED reading. Thus, using the PMA 2105 UV-B detector, a pre-exposure of 2 MED was made. Immediately following the pre-exposure, the slide is taken to the UV Transmittance Analyzer and the irradiated spot is scanned. The original scan is deleted, and the new scan is saved as the baseline ("0 MED") scan.

To test stability of a slide in the UV-B range, the PMA 2105 was used, and the slide was positioned on the UV transmittance analyzer using registration marks, and a scan of a 1 cm spot on the slide was performed. The slide was then transferred to a holder placed adjacent to the solar simulator and, using a calipers, was positioned such that the beam of UV radiation exiting the solar simulator illuminated the same 1 cm spot on the slide. To test stability of a slide in the W-A range, the PMA 2114 was substituted for the PMA 2105, and a WG335 filter was installed in the beam path. The following software settings were used: W-B = 290-320 nm ; UV-A = 320-400 nm. Following an exposure of 5 MED, the slide was again placed in position on the UV transmittance analyzer, and a scan of the exposed spot was performed. The procedure was repeated on the same 1 cm spot on the slide until the desired total radiation dosage was achieved (approximately 35 MED for the UV-B studies, and 120 J/cm2 for the UV-A studies).

Figure 11 is a graph of the absorbance of the sunscreen compositions listed in Table VI. As shown in Figure 11, the sunscreen composition that does includes 2% of the Crylene/Behenyl Polymer achieves the highest absorbance as compared to the sunscreen composition of Table VI that does not include the polymer.

Example 9 A determination of the Sun Protection Factor (SPF) of the sunscreen compositions that were prepared in Example 8 was performed. To test the SPF of the compositions, each slide was placed on the UV transmittance analyzer and scans were taken from five locations on the slide. An SPF report was generated for each slide using the Labsphere software UV1000S, Version 1.27.

The results of the SPF testing for the composition listed in Table VII are shown below in Table VII: Table VII Composition SPF Results Sunscreen Composition Scan No. 1 17.06 with 0% Polymer Scan No. 2 6.60 (Table VI) Average SPF 11.83 Sunscreen Composition Scan No. 1 17.52 with 2% Polymer Scan No. 2 13. 65 (Table VI) Average SPF 15.59 The results shown in Table VII indicate that the addition of 2% Crylene/Cetyl Polymer to a topical composition the contains three other UV absorbers (7.5% Homosalate, 5% Octisalate, and 3% Avobenzone) provides an SPF of about 15.6, and provides an increase in SPF of about 4 to sunscreen compositions.

Example tO Sunscreen compositions where prepared that included 2% of the polymer prepared in Example 3 (a polymer containing the monomers containing crylene moieties (as shown in formulae (I) and (II) wherein W and R6 are 2,2- dimethylpropane, and Rl and Rs are Cl6 straight chain alkyl groups) and monomers that contain C16 fatty esters (as shown in formulae (III) and (IV) wherein R9 and R" are Cl6 straight chain alkyl groups, and Rl° and R12 are C22 straight chain alkyl groups), which shall be referred to throughout the examples as"Crylene/Behenyl Polymer,"and that substituted the Crylene/Behenyl Polymer with the non-UV absorbing Octyldodecanol using the ingredients listed in Table VIII below:

Table VIII Phas Sunscreen w/0% Sunscreen w/2% e Ingredient Polymer (wt. %) Polymer (wt. %) A Octyl salicylate 5.00% 5.00% Homosalate 7.50% 7.50% Diethylhexyl 2, 6-naphthalate 2.50% 2. 50% Dimethyl capramide 1.00% 1.00% Diethylhexyl malate 4. 51% 4. 51% Dimethicone 0.4% 0.4% B Avobenzone 3.00% 3.00% Benzophenone-3 0.49% 0.49% C PVP/Eicosene Copolymer 2. 00% Crylene/Behenyl Polymer 2.00% D Steric Acid 3.2% 3.2% Sorbitan isostearate 3.8% 3.8% Polyglyceryl-3 methyl giucose 3 00% 3 00% distearate Methylpropanediol 2.0% 2. 0% E Water 55.87% 55.87% Disodium EDTA 0.05% 0.05% Carbomer 0.05% 0.05% Glycerin 3% 3% Phenoxyethanol, Methylparaben, Ethylparaben, Propylparaben, and 0.60% 0.60% Isobutylparaben Triethanolamine 1.78% 1.78% F Silica 0.25% 0.25% Oil-in-water emulsions were created, wherein the aqueous phase included a mixture of the ingredients in Phase E, and the oil phase included a mixture of the ingredients of Phases A, B, C, and D. The emulsions were prepared by combining the ingredients of Phase A, and adding this mixture of ingredients to a vessel, and heating the vessel to about 90° C. The ingredients from Phases B, C, and D were then added to the heated vessel with stirring until the mixture became clear and homogeneous. In another vessel, the water, Disodium EDTA, and Carbomer were added to the vessel, and the vessel was stirred and heated to 80° C. Just before combining the aqueous and oil phases, the remaining ingredients from Phase E were added to vessel containing the aqueous mixture and the silica was added to the stirring

mixture of the oil phase. With homogenization, the oil phase (contents from Phases A-D, and F in Table VIII) at 86° C was added to the vessel containing the aqueous phase, which was at 84° C. The resulting mixture was homogenized for three minutes, and then the vessel was remove from heat source and allowed to cool. The mixture was stirred until a smooth cream was formed. The resulting creams were packaged to avoid the inadvertent photodegradation of the UV-absorbing compounds, and the creams were then used to test the photostability of the compositions.

The resulting sunscreens were tested for photostability by measuring absorbance on a Labsphere UV-1000S Ultraviolet Transmittance Analyzer (software version 1.27) before and after irradiation with a Solar Light Company model 16S solar simulator (equipped with a UGl l filter to block radiation greater than 400 nm, WG320 filter that transmits UV-radiation greater than 290 nm), and a removable WG335 filter that transmits UV-radiation greater than 320 nm). Output was monitored by a PMA 2105 UV-B DCS Detector (biologically weighted) or a PMA 2114 W-A Detector and controlled by a PMA 2100 Automatic Dose Controller (available from Solar Light Co.).

To test stability, a synthetic skin substrate was used for testing the sunscreen compositions (VITRO-SKIN substrate (Lot No. 3059) by IMS, Inc. of Milord, CT). To prepare the substrate, a 300g solution of 18 wt. % glycerin and 82 wt. % deionized water was added to a hydrating chamber (IMS), and a sheet of VITRO-SKIN was placed in the hydrating chamber and left overnight (approx. 16 hours). Several 6.5 cm squares were cut from the hydrated VITRO-SKIN and used for absorbance measurements.

To prepare slides for testing, a minimum 100 p1 of sunscreen composition is drawn or placed into a pipet tip (Justor 1100DG, set to dispense 100 gel). Using steady, even pressure on the pipette plunger, the test substance was applied to VITRO-SKIN square in a pattern of at least 50 small dots arranged to cover a 6 cm center of a square. The VITRO-SKIN square was then placed on a foam block, and the test material was spread by finger (covered with a latex glove or finger cot), first in a circular motion, then by a side-to-side motion during which the VITRO-SKIN is

deformed by the pressure. The square was then mounted in a slide holder (60 mm x 60 mm glassless slide mounts with metal masks by Gepe Management AG, Zug, Switzerland) and allowed to dry for 30-60 minutes.

It has been found that to avoid certain errors of an as yet unknown cause, it is advantageous to pre-expose the tested spot on the slide to 2 MED, and then zero the detector to treat the pre-exposed spot as a 0 MED reading. Thus, using the PMA 2105 W-B detector, a pre-exposure of 2 MED was made. Immediately following the pre-exposure, the slide is taken to the UV Transmittance Analyzer and the irradiated spot is scanned. The original scan is deleted, and the new scan is saved as the baseline ("O MED") scan.

To test stability of a slide in the UV-B range, the PMA 2105 was used, and the slide was positioned on the UV transmittance analyzer using registration marks, and a scan of a 1 cm spot on the slide was performed. The slide was then transferred to a holder placed adjacent to the solar simulator and, using a calipers, was positioned such that the beam of UV radiation exiting the solar simulator illuminated the same 1 cm spot on the slide. To test stability of a slide in the UV-A range, the PMA 2114 was substituted for the PMA 2105, and a WG335 filter was installed in the beam path. The following software settings were used: W-B = 290-320 nm ; W-A = 320-400 nm. Following an exposure of 5 MED, the slide was again placed in position on the UV transmittance analyzer, and a scan of the exposed spot was performed. The procedure was repeated on the same 1 cm spot on the slide until the desired total radiation dosage was achieved (approximately 35 MED for the UV-B studies, and 120 J/cm2 for the UV-A studies).

Figure 12 is a graph of the absorbance of the sunscreen compositions listed in Table VIII. As shown in Figure 12, the sunscreen composition that does includes 2% of the Crylene/Behenyl Polymer achieves the highest absorbance as compared to the sunscreen composition of Table VIII that does not include the polymer.

Example 11 A determination of the Sun Protection Factor (SPF) of the sunscreen compositions that were prepared in Example 8 was performed. To test the SPF of the compositions, each slide was placed on the UV transmittance analyzer and scans were taken from five locations on the slide. An SPF report was generated for each slide using the Labsphere software UV1000S, Version 1.27.

The results of the SPF testing for the composition listed in Table VIII are shown below in Table IX: Table IX Composition SPF Results Sunscreen Composition Scan No. 1 18.14 with 0% Polymer Scan No. 2 20.21 (Table VIII) Scan No. 3 20.10 Scan No. 4 21.65 Scan No. 5 23.80 Average SPF 20.8 23. 40 Sunscreen Composition Scan No. 1 with 2% Polymer Scan No. 2 24.33 (Table VIII) Scan No. 3 25.13 Scan No. 4 22.72 Scan No. 5 23.22 Average SPF 23.8 The results shown in Table IX indicate that the addition of 2% Crylene/Behenyl Polymer to a topical composition provides an increase in SPF of about 3 to sunscreen compositions.

Example 12 The water resistance of sunscreen compositions listed in Table VIII was tested by immersing slides of VITRO-SKIN, which contain the compositions, in moving water for a period of time and testing the slides for a loss in absorbance as

measured by SPF. The slides were tested before and after being immersed in water and the results were compared.

The slides were prepared according to the procedure set forth in Example 10, and each slide was placed in a beaker and the top, bottom, and sides of the slides were secured in the beaker with binder clips. The slides were then completely immersed in water by the addition of two liters of tap water to the beaker.

The beaker was placed on a stir table and a stir bar is placed on the bottom of the beaker. The stir bar is set in motion to circulate the water with a mild vortex. After 40 minutes, the slides were removed from the beaker, shaken to remove excess water, and allowed to air-dry for 30 minutes. Scans are taken from five locations on the slides. The absorbance spectra and an SPF report was generated for each composition.

The results of the SPF reports are summarized in Table X below : Table X Pre-Immersion Post-Immersion Results SPF Results Sunscreen Composition 23. 58 12. 10 with 0% Polymer Sunscreen Composition 23. 19 20. 69 with 2% Polymer (Table VI I) As shown in Table X, the immersion of the sunscreen composition containing 0% of the Crylene/Behenyl Polymer in water causes a significant loss of SPF. In contrast, when the sunscreen composition listed in Table VIII that included 2% Crylene/Behenyl Polymer was immersed in water, there was only a slight decrease in the SPF results as compared to the pre-immersion SPF results. However, this test and the others referenced in the accompanying demonstrate the polymer's ability to : (a) provide water resistance (i. e., water proofing) to the composition, and

thereby avoiding loss of the composition upon immersion ; (2) absorb UV-radiation ; and (3) stabilize the other photoactive compounds in the composition by, for example, absorbing the excited state energy of other photoactive compounds and rapidly dissipating that energy.

Figure 13 is a graph of the absorbance of the sunscreen composition listed in Table VI that included 2% Crylene/Behenyl Polymer in the composition. As shown in Figure 13, the absorbance spectra indicates that the immersion of the composition with 2% Crylene/Behenyl Polymer in moving water for 40 minutes causes less of a loss in the absorbance over the entire UV-spectra (290-400 nm) than the composition that does not include the Crylene/Behenyl Polymer.

The foregoing description is given for clearness of understanding only, and no unnecessary limitations should be understood therefrom, as modifications within the scope of the compounds, compositions, and methods described herein may be apparent to those having ordinary skill in the art.