Title:
COMPREHENSIVE INSPECTION DEVICE FOR EUV EXPOSURE PROCESS
Document Type and Number:
WIPO Patent Application WO/2023/195818
Kind Code:
A1
Abstract:
A comprehensive inspection device for an EUV exposure process is provided. The comprehensive inspection device for an EUV exposure process may comprise: a light generation unit for generating EUV light; a splitter for receiving the EUV light from the light generation unit and splitting the EUV light into first EUV light and second EUV light; an optical characteristic evaluation unit for measuring the intensity of the first EUV light having transmitted through a pellicle, having been reflected from an object, and then having re-transmitted through the pellicle, and the intensity of the first EUV light having been directly reflected from the object without the pellicle, so as to detect reflectance and transmittance of the pellicle and reflectance of the object; and an imaging inspection unit for inspecting imaging performance of a mask by focusing the second EUV light having been reflected and diffracted from the mask through an objective lens and then collecting the focused second EUV light to obtain a spatial domain image.
Inventors:
AHN JIN HO (KR)
LEE DONG GI (KR)
KIM YOUNG WOONG (KR)
MOON SEUNG CHAN (KR)
CHOI JIN HYUK (KR)
LEE DONG GI (KR)
KIM YOUNG WOONG (KR)
MOON SEUNG CHAN (KR)
CHOI JIN HYUK (KR)
Application Number:
PCT/KR2023/004718
Publication Date:
October 12, 2023
Filing Date:
April 07, 2023
Export Citation:
Assignee:
IUCF HYU (KR)
International Classes:
G01N21/88; G01N21/17; G01N21/33; G03F1/62; G03F1/84; G03F7/20; G06T7/00
Foreign References:
| JP2008090879A | 2008-04-17 | |||
| KR20170110759A | 2017-10-12 | |||
| US20090168191A1 | 2009-07-02 | |||
| KR101738887B1 | 2017-06-08 | |||
| KR20200066540A | 2020-06-10 |
Attorney, Agent or Firm:
PARK, Sang Youl (KR)
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