Title:
CONCENTRATION MEASUREMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/189677
Kind Code:
A1
Abstract:
This invention is capable of suppressing reduction in the accuracy with which the concentration of a gas under measurement is measured even when there is a gas in a gas mixture that has a rate of thermal conductivity change in relation to the temperature that is significantly different from that of the other gas. This concentration measurement device is characterized by comprising a sensor unit for measuring the concentration of a gas under measurement in a gas mixture including two or more components on the basis of the thermal conductivity of the gas under measurement and a heating unit for heating the gas mixture such that the concentration of the gas under measurement can be unambiguously determined in relation to the thermal conductivity.
Inventors:
KAMIYAMA SUSUMU (JP)
KANO HAJIME (JP)
NAKAGAWA SHINYA (JP)
NAKAO HIDEYUKI (JP)
HANDA KENICHI (JP)
KASAI TAKASHI (JP)
KANO HAJIME (JP)
NAKAGAWA SHINYA (JP)
NAKAO HIDEYUKI (JP)
HANDA KENICHI (JP)
KASAI TAKASHI (JP)
Application Number:
PCT/JP2020/011702
Publication Date:
September 24, 2020
Filing Date:
March 17, 2020
Export Citation:
Assignee:
OMRON TATEISI ELECTRONICS CO (JP)
International Classes:
G01N25/18; G01N27/18
Foreign References:
| US20160161951A1 | 2016-06-09 | |||
| JP2013076699A | 2013-04-25 | |||
| JP2004286492A | 2004-10-14 | |||
| JP2017502904A | 2017-01-26 | |||
| JP2019144085A | 2019-08-29 | |||
| JP2002136595A | 2002-05-14 | |||
| JPH07113777A | 1995-05-02 | |||
| EP0698786A1 | 1996-02-28 |
Attorney, Agent or Firm:
IP FIRM SHUWA (JP)
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