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Patent Searching and Data


Title:
CONDUCTIVE FILM AND METHOD FOR PRODUCING SAME, AND SPUTTERING TARGET USED FOR SAME
Document Type and Number:
WIPO Patent Application WO/2012/176407
Kind Code:
A1
Abstract:
Provided are: a conductive film having low resistance and high reflectivity characteristics, and low surface roughness, and which combines high sulfidation resistance and heat resistance; a method for producing the conductive film; and a sputtering target used for the conductive film. The conductive film consists of a silver alloy having a component composition containing In and/or Sn at 0.1 to 1.5 at%, and further containing Sb at 0.1 to 3.5 at%, with the remainder comprising Ag and unavoidable impurities. The conductive film is suitable as a reflective electrode film for organic EL elements in which a transparent conductive film of an organic EL element is laminated on the surface, and an electroluminescent layer containing an organic EL layer is laminated thereabove.

Inventors:
NONAKA SOHEI (JP)
KOMIYAMA SHOZO (JP)
Application Number:
PCT/JP2012/003895
Publication Date:
December 27, 2012
Filing Date:
June 14, 2012
Export Citation:
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Assignee:
MITSUBISHI MATERIALS CORP (JP)
NONAKA SOHEI (JP)
KOMIYAMA SHOZO (JP)
International Classes:
H05B33/26; C22C5/06; C23C14/34; G06F3/041; H01B1/02; H01L51/50; H05B33/10
Foreign References:
JPH01273690A1989-11-01
JP2006037169A2006-02-09
JPH02253593A1990-10-12
JP2005008983A2005-01-13
JP2004126497A2004-04-22
JP2006202487A2006-08-03
JP2003217375A2003-07-31
Attorney, Agent or Firm:
TAKAOKA, Ryoichi (JP)
Ryoichi Takaoka (JP)
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Claims: