Title:
CONDUCTIVE RESIN CAPABLE OF PHOTOPATTERNING
Document Type and Number:
WIPO Patent Application WO/2005/049688
Kind Code:
A1
Abstract:
A conductive resin capable of nanometer-order pattering wherein direct patterning without the use of any resist can be performed. There is provided a material comprised of a poly(arylenevinylene) (the arylene is an arylene group or a heterocyclic compound group) of 1500 to 30000 number average molecular weight wherein the ratio of cis-poly(arylenevinylene) to trans-poly(arylenevinylene) is 65/35 or higher. The film produced from this material can be patterned by irradiating a given region with 200 to 600 nm light and leaching non-photoirradiated portions with an aromatic, halogenated or ether type organic solvent.
Inventors:
OZAWA FUMIYUKI (JP)
KATAYAMA HIROYUKI (JP)
AKAMATSU KENSUKE (JP)
KATAYAMA HIROYUKI (JP)
AKAMATSU KENSUKE (JP)
Application Number:
PCT/JP2004/017090
Publication Date:
June 02, 2005
Filing Date:
November 17, 2004
Export Citation:
Assignee:
KANSAI TECH LICENSING ORG CO (JP)
OZAWA FUMIYUKI (JP)
KATAYAMA HIROYUKI (JP)
AKAMATSU KENSUKE (JP)
OZAWA FUMIYUKI (JP)
KATAYAMA HIROYUKI (JP)
AKAMATSU KENSUKE (JP)
International Classes:
C08G61/02; C08G61/10; H01B1/12; (IPC1-7): C08G61/00; C09K11/06; H05B33/10; H05B33/14; H05B33/26
Foreign References:
| JPH0870138A | 1996-03-12 | |||
| JPS57207618A | 1982-12-20 | |||
| JPS57207619A | 1982-12-20 |
Other References:
KATAYAMA H. ET AL.: "Stereocontrolled synthesis of (E)- and (Z)-poly(p-phenylene-vinylene)s via ruthenium-catalysed hydrosilylation of p-diehynylbenzene", JOURNAL OF ORGANOMETALLIC CHEMISTRY, vol. 676, 2003, pages 49 - 54
Attorney, Agent or Firm:
Kobayasi, Ryohei (7th Floor Hougen-Sizyokarasuma Building, 37,
Motoakuozi-tyo, Higasinotouin, Sizyo-sagaru, Simogyo-k, Kyoto-si Kyoto 91, JP)
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