Title:
CONSUMPTION DETERMINATION METHOD AND PLASMA PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/123621
Kind Code:
A1
Abstract:
Provided is a consumption determination method comprising: a step of processing a substrate using a plasma generated by a plurality of gases including fluorine gas; a step of acquiring, from the plasma using an optical emission spectroscopy (OES) measurement means, light emission intensities of the plurality of gases including the fluorine gas; and a step of calculating, by referring to a storage unit in which the light emission intensities of the plurality of gases including the fluorine gas are associated with a consumption rate of a specific consumable member and stored, the consumption rate of the specific consumable member from the acquired light emission intensities of the plurality of gases including the fluorine gas.
Inventors:
KUSANO SHU (JP)
HIRAYAMA YUSUKE (JP)
HIRAYAMA YUSUKE (JP)
Application Number:
PCT/JP2017/044933
Publication Date:
July 05, 2018
Filing Date:
December 14, 2017
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/3065
Domestic Patent References:
| WO2006098081A1 | 2006-09-21 |
Foreign References:
| JP2006324316A | 2006-11-30 | |||
| JP2011060977A | 2011-03-24 | |||
| JP2002025982A | 2002-01-25 | |||
| JP2004237321A | 2004-08-26 |
Attorney, Agent or Firm:
ITOH, Tadashige et al. (JP)
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