Title:
CONTACT AND METHOD OF MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2019/189041
Kind Code:
A1
Abstract:
The purpose of the present invention to provide a contact such that an increase in DC resistance value can be suppressed for a long period, and a method of manufacturing the same. The contact (1) is provided with a base portion (3) and an elastic contact portion (5). The elastic contact portion (5) includes a planar portion (24) configured in a planar shape, and a projection portion (28) disposed on and protruding from one surface of the planar portion (24). The elastic contact portion (5) is configured to come into pressed contact with a second surface (53) at the projection portion (28). The projection portion (28) is configured such that a dimensional ratio H/L of height H and length L satisfies 0.25 ≤ H/L ≤ 0.44, wherein H is the dimension in a direction perpendicular to the one surface and L is the dimension in a direction parallel to the one surface.
Inventors:
NAKAMURA TATSUYA (JP)
ISHIGURO HIROYOSHI (JP)
ISHIGURO HIROYOSHI (JP)
Application Number:
PCT/JP2019/012628
Publication Date:
October 03, 2019
Filing Date:
March 25, 2019
Export Citation:
Assignee:
KITAGAWA IND CO LTD (JP)
International Classes:
H01R13/24; H01R43/16; H05K9/00
Foreign References:
| JP2014072317A | 2014-04-21 | |||
| JP2017157437A | 2017-09-07 | |||
| JP2017220426A | 2017-12-14 | |||
| JP2011060694A | 2011-03-24 | |||
| US20180026406A1 | 2018-01-25 | |||
| JP2014072317A | 2014-04-21 |
Other References:
See also references of EP 3754788A4
Attorney, Agent or Firm:
NAGOYA INTERNATIONAL PATENT FIRM (JP)
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