Title:
CONTACT PLATE, ALIGNMENT SYSTEM, AND VAPOR DEPOSITION DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/209612
Kind Code:
A1
Abstract:
Disclosed in the present invention are a contact plate, an alignment system, and a vapor deposition device. The alignment system comprises a contact plate and a vapor deposition magnetic plate, for use in the alignment between a mask and a substrate. The contact plate comprises multiple spacer assemblies and sensing components disposed on a mounting plate and arranged in an array. The spacer assemblies are used for dispersing the strength generated when the vapor deposition magnetic plate presses downwards, so as to prevent deformation. The sensing components are used for detecting the force applied to each spacer assembly, and the force condition is used for analyzing the force applied to the substrate to control the vapor deposition magnetic plate to change the distribution of the magnetic field, so that the force applied to the substrate is uniform. The combination of the spacer assemblies and the sensing components enables the substrate and the mask to be accurately aligned, thereby effectively preventing the phenomenon of color mixing.
Inventors:
LI XIN (CN)
Application Number:
PCT/CN2017/084766
Publication Date:
November 22, 2018
Filing Date:
May 17, 2017
Export Citation:
Assignee:
SHENZHEN ROYOLE TECHNOLOGIES CO LTD (CN)
International Classes:
C23C14/04
Foreign References:
| CN106637073A | 2017-05-10 | |||
| CN203664629U | 2014-06-25 | |||
| CN205368488U | 2016-07-06 | |||
| US6475287B1 | 2002-11-05 |
Attorney, Agent or Firm:
TSINGYIHUA INTELLECTUAL PROPERTY LLC (CN)
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