Title:
CONTACT-TYPE PATTERNING DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/020425
Kind Code:
A1
Abstract:
The present invention relates to a contact-type patterning device. The contact-type patterning device of the present invention comprises: a substrate; a fluid supply unit for supplying a fluid towards the substrate; a voltage applying unit which is electrically connected to the fluid supply unit and applies a voltage to the surface of the fluid supplied from the fluid supply unit so as to allow the fluid to be connected between the substrate and the fluid supply unit; a control unit for controlling the level of the voltage applied to the fluid so as to allow the fluid to be patterned on the substrate in a continuous line shape. Therefore, the contact-type patterning device, according to the present invention, enables stable and continuous patterning having a fine line wide width regardless of the viscosity of the fluid used and the patterning speed.
Inventors:
NGUYEN VU DAT (KR)
BYUN DO-YOUNG (KR)
JANG YONG HEE (KR)
BYUN DO-YOUNG (KR)
JANG YONG HEE (KR)
Application Number:
PCT/KR2014/007268
Publication Date:
February 12, 2015
Filing Date:
August 06, 2014
Export Citation:
Assignee:
ENJET CO LTD (KR)
International Classes:
B41J2/07; B41J2/08
Foreign References:
KR100330945B1 | 2002-04-01 | |||
US20100222771A1 | 2010-09-02 | |||
KR20100060226A | 2010-06-07 |
Other References:
"A study on novel electrohydrodynamic(EHD) nano-inkjet heads and printing system", DOCTOR'S DEGREE THESIS, August 2011 (2011-08-01)
Attorney, Agent or Firm:
CHO, YOUNG HYUN (KR)
์กฐ์ํ (KR)
์กฐ์ํ (KR)
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