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Patent Searching and Data

Document Type and Number:
WIPO Patent Application WO/2019/156317
Kind Code:
The present invention relates to a discharge device for removing most contaminants by spraying nitrogen gas when a wafer having contaminants, such as residual gas, adsorbed on the surface thereof enters therein, and for protecting, when remaining partial contaminants are vented to the outside, the wafer by blocking backflow by means of an air spray from an air nozzle inserted into an exhaust pipe. The contaminant discharge device according to the present invention comprises, in an upper chamber having, therein, a wafer loading part on which a plurality of wafers can be loaded layer by layer and a lower chamber having, therein, an exhaust part for venting, to the outside, contaminants in the upper chamber: a plurality of spray nozzles spraying, at different spray angles of 90° and 25° in three directions of the upper direction and both side directions of an upper chamber entrance, nitrogen gas toward a wafer entering the inside of the upper chamber, so as to remove contaminants adsorbed in or remaining on the wafer and block a backflow phenomenon of the contaminants removed from the wafer and the inflow of the contaminants to the upper chamber; a supply pipe for supplying the nitrogen gas to the spray nozzles; and an exhaust port allowing the upper chamber to communicate with the lower chamber.

KIM, Won Ki (726-2002, 366 Maeyeong-ro, Yeongtong-gu,Suwon-si, Gyeonggi-do, 16701, KR)
Application Number:
Publication Date:
August 15, 2019
Filing Date:
November 16, 2018
Export Citation:
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BST CO., LTD (124 B, Sunmoon University Engineering Building 70, Sunmoon-ro 221beon-gil, Tangjeong-myeon,Asan-si, Chungcheongnam-do, 31460, KR)
International Classes:
H01L21/67; B08B5/02
Attorney, Agent or Firm:
KANG, Hyeong Seok (204-ho, 26 Buldang34-gil, Seobuk-gu,Cheonan-si, Chungcheongnam-do, 31156, KR)
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