Title:
CONTINUOUS BAND PLATING DEVICE
Document Type and Number:
WIPO Patent Application WO/2000/049206
Kind Code:
A1
Abstract:
A continuous band plating device capable of providing a glossy and beautiful plated surface, wherein an anode is not provided in a continuous band (80) rising section at the final-stage cell (13) of a plating tank (10), nor is provided a feed roll in a row of rolls (22) above the section. Therefore, a continuous band such as a flexible substrate (80), still wet with a plating solution, passes a non-plating section (26) immediately before discharged finally from the plating tank (10).
Inventors:
MINAMIKAWA YOSHIHIRO (JP)
Application Number:
PCT/JP2000/000842
Publication Date:
August 24, 2000
Filing Date:
February 15, 2000
Export Citation:
Assignee:
IBIDEN CO LTD (JP)
MINAMIKAWA YOSHIHIRO (JP)
MINAMIKAWA YOSHIHIRO (JP)
International Classes:
C25D7/06; C25D17/06; C25D21/12; (IPC1-7): C25D7/06; C25D21/12
Foreign References:
| JPS63255392A | 1988-10-21 |
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