Title:
CONTINUOUS FLOW SYSTEM AND METHOD FOR COATING SUBSTRATES
Document Type and Number:
WIPO Patent Application WO/2019/219292
Kind Code:
A3
Abstract:
The invention relates to a continuous flow system (100) for coating substrates (103) comprising a treatment module (130) and a vacuum sluice (110, 150) for introducing the substrates (103) or for discharging the substrates (103). The vacuum sluice (110, 150) has a chamber for receiving a substrate carrier (102) having a plurality of substrates (103) and a flow channel arrangement for evacuating and flooding the chamber. The flow channel arrangement comprises a first channel for evacuating and flooding the chamber and a second channel for evacuating and flooding the chamber, wherein the first channel and the second channel are arranged on opposite sides of the chamber.
Inventors:
CORD BERNHARD (DE)
REISING MICHAEL (DE)
SCHERGER DIETER (DE)
DIPPELL TORSTEN (DE)
MAY FRANK (DE)
WOHLFART PETER (DE)
HOHN OLIVER (DE)
REISING MICHAEL (DE)
SCHERGER DIETER (DE)
DIPPELL TORSTEN (DE)
MAY FRANK (DE)
WOHLFART PETER (DE)
HOHN OLIVER (DE)
Application Number:
PCT/EP2019/058505
Publication Date:
January 16, 2020
Filing Date:
April 04, 2019
Export Citation:
Assignee:
SINGULUS TECH AG (DE)
International Classes:
C23C14/56; C23C16/34; C23C16/54; H01L21/02; H01L21/67; H01L21/677
Domestic Patent References:
WO2019105985A1 | 2019-06-06 | |||
WO2016184487A1 | 2016-11-24 | |||
WO2013032406A1 | 2013-03-07 |
Foreign References:
US20100054905A1 | 2010-03-04 | |||
DE102012109830A1 | 2014-04-17 | |||
DE102015117753A1 | 2017-04-20 | |||
DE4303462A1 | 1993-10-14 | |||
DE102013103133A1 | 2014-10-02 | |||
DE102012103254A1 | 2013-10-17 | |||
DE10205167C1 | 2003-08-28 | |||
EP1976022A2 | 2008-10-01 |
Other References:
JAN BULTMAN ET AL: "Inline processing of crystalline silicon solar cells: the holy grail for large-scale manufacturing?", PHOTOVOLTAICS INTERNATIONAL, vol. PVI-5-14-2, 18 August 2009 (2009-08-18), pages 77 - 83, XP055644693
Attorney, Agent or Firm:
VOSSIUS & PARTNER (DE)
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