CONTINUOUS HEAT TREATMENT FURNACE AND MANUFACTURING METHOD FOR CERAMIC ELECTRONIC COMPONENT USING SAME

WIPO Patent Application WO/2016/208615

A1

In this continuous heat treatment furnace (HF1), a heat treatment region in which heat treatment is performed on a workpiece along a conveyance direction (b) is provided. The workpiece is subjected to heat treatment while being conveyed in the heat treatment region (H). A workpiece conveyance mechanism (100) for conveying the workpiece is provided with: a box-shaped base frame (1) having an opening section in the upper part thereof; a porous plate (2); a gas chamber (3) that is formed by the porous plate (2) covering the opening section of the base plate (1); and a gas supply means (4) that is connected to the gas chamber (3) and that supplies, to the gas chamber (3), gas (g) to penetrate through the porous plate (2) to flow out. The porous plate (2) is arranged such that the upper surface (2a) thereof is downwardly inclined in the conveyance direction for the workpiece, and grooves (2t1 to 2t10) along the conveyance direction for the workpiece (W) are formed in the upper surface (2a).

NORIOKA TETSUHITO (JP)
NAKATANI YUKIHIRO (JP)
TAKAHATA TAKESHI (JP)

PCT/JP2016/068495

December 29, 2016

June 22, 2016

Click for automatic bibliography generation  

MURATA MANUFACTURING CO (JP)

F27B9/20; F27B9/24; F27D3/12; H01G4/12; H01G4/30; H01G13/00

JPH08136144A	1996-05-31
JP2008273727A	2008-11-13
JP2015049020A	2015-03-16
US1699955A	1929-01-22

Fukami Patent Office, p. c. (JP)
Patent business corporation Fukami patent firm (JP)

View/Download PDF      PDF Help

Previous Patent: RADIO NETWORK SYSTEM

Next Patent: VIDEO REPRODUCTION DEVICE AND VIDEO REPRODUCTION METHOD