Title:
CONTINUOUS THERMAL EVAPORATION SYSTEM
Document Type and Number:
WIPO Patent Application WO2002082506
Kind Code:
A3
Abstract:
A processing system and associated method for vacuum evaporation of material onto a substrate. The processing system includes a loading chamber, a transfer chamber, and a thermal processing chamber arranged together to form a cluster tool. The cluster tool arrangement provides the system a continuous processing capability. The system also includes an evacuation system arrangement for evacuating the processing system to adequate processing pressure levels. The evacuation system arrangement includes a series of pumps, which arecapable of maintaining the selected processing pressure levels for continuous thermal evaporation processing without the need for lowering the pressure to deep vacuum pressure levels.
Inventors:
YOO WOO SIK
Application Number:
PCT/US2002/010725
Publication Date:
February 27, 2003
Filing Date:
April 04, 2002
Export Citation:
Assignee:
WAFERMASTERS INC (US)
International Classes:
C23C14/56; (IPC1-7): H01L21/00; C23C14/24; C23C14/34; C23C14/56
Foreign References:
| US4917556A | 1990-04-17 | |||
| US4500407A | 1985-02-19 | |||
| US4663009A | 1987-05-05 | |||
| EP0485233A2 | 1992-05-13 | |||
| US6176932B1 | 2001-01-23 |
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