Title:
COPOLYMER, COPOLYMER MIXTURE, AND POSITIVE RESIST COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2023/228692
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a copolymer capable of raising the pattern collapse resistance while maintaining the clarity of a resist pattern. The present invention is a copolymer having a monomer unit (I) represented by formula (I), a monomer unit (II) represented by formula (II) different from the monomer unit (I), and a monomer unit (III) represented by formula (III). Furthermore, in the formulas, L1, Ar1, X1, R1, X2, R2, R3, and R4 are predetermined groups, p and q are integers of 0-5 inclusive, and p + q = 5.
Inventors:
HOSHINO MANABU (JP)
Application Number:
PCT/JP2023/017091
Publication Date:
November 30, 2023
Filing Date:
May 01, 2023
Export Citation:
Assignee:
ZEON CORP (JP)
International Classes:
C08F212/08; C08F220/22; C08F222/10; C08F222/18; C08L25/04; C08L33/16; C08L101/12; G03F7/039; G03F7/20
Domestic Patent References:
| WO2018123667A1 | 2018-07-05 |
Foreign References:
| JP2018106066A | 2018-07-05 | |||
| JP2018154754A | 2018-10-04 |
Attorney, Agent or Firm:
SUGIMURA Kenji (JP)
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