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Patent Searching and Data


Title:
COPPER BASED COMPOUND-CONTAINING MICROPOROUS FILM FOR FILTER
Document Type and Number:
WIPO Patent Application WO/2016/068646
Kind Code:
A1
Abstract:
Disclosed is a copper based compound-containing microporous filter, the filter containing a copper-based compound, which is relatively cheap, easy to process, has no toxicity, and retains excellent antibiotic and deodorizing properties. The filter comprises: a porous substrate having fine pores therein, through which a fluid passes; and a copper-based compound, which is coated on a surface of the porous substrate or dispersed in the porous substrate, wherein the chemical structure of the compound is CuxMy (M is one selected from groups 15 to 17 on the element periodic table, x/y=0.8-1.5), and the porous substrate is formed in any one of a film form or a fiber form.

Inventors:
BAEK SEUNG WOO (KR)
Application Number:
PCT/KR2015/011579
Publication Date:
May 06, 2016
Filing Date:
October 30, 2015
Export Citation:
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Assignee:
BS SUPPORT CO LTD (KR)
International Classes:
B01D71/02; B01D39/20
Foreign References:
KR101406779B12014-06-17
JP2012020274A2012-02-02
KR101198415B12012-11-09
KR101426279B12014-08-13
KR20090102742A2009-09-30
Attorney, Agent or Firm:
AHN, SEUNG TAE (KR)
μ•ˆμŠΉνƒœ (KR)
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