Title:
COSMETIC BASE
Document Type and Number:
WIPO Patent Application WO/2024/053560
Kind Code:
A1
Abstract:
Provided is a new cosmetic base that achieves both feel on use and a moisturizing effect. The cosmetic base contains or comprises a polymer having a structure represented by formula (1). In formula (1), R1, R2, and R3 each independently are a hydrogen atom or a C1-4 alkyl group, A is a C2-4 alkylene group, and m and n are each independently 1.0-50. The number average molecular weight of the polymer is 10,000 or less, and the IOB value of the polymer is 0.4-1.8.
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Inventors:
ITO YUJI (JP)
ISHIKAWA RIKO (JP)
IETANI SAORI (JP)
HARA YUSUKE (JP)
MURAI MASAKI (JP)
SEKIGUCHI KOJI (JP)
KIMURA HIDETSUGU (JP)
ISHIKAWA RIKO (JP)
IETANI SAORI (JP)
HARA YUSUKE (JP)
MURAI MASAKI (JP)
SEKIGUCHI KOJI (JP)
KIMURA HIDETSUGU (JP)
Application Number:
PCT/JP2023/031876
Publication Date:
March 14, 2024
Filing Date:
August 31, 2023
Export Citation:
Assignee:
SHISEIDO CO LTD (JP)
NOF CORP (JP)
NOF CORP (JP)
International Classes:
A61K8/86; A61K8/39; A61Q1/00; A61Q19/00
Foreign References:
| JP2017088517A | 2017-05-25 | |||
| JPS591403A | 1984-01-06 | |||
| JP2005350680A | 2005-12-22 | |||
| JP2002533495A | 2002-10-08 | |||
| JPS59159830A | 1984-09-10 |
Attorney, Agent or Firm:
AOKI, Atsushi et al. (JP)
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