Title:
COUNTERFEITING PREVENTION METHOD AND SYSTEM
Document Type and Number:
WIPO Patent Application WO2017010460
Kind Code:
A1
Abstract:
The present invention uses a counterfeit prevention material in which a plurality of particles are randomly dispersed which return reflected light solely in a specified direction when irradiated with light to prevent counterfeiting. The counterfeit prevention material is irradiated with illumination light and the reflected light therefrom is captured. A reference value is created from a reflection pattern of the captured reflected light. The counterfeit prevention material, of which authenticity is unknown, is irradiated with the illumination light, and the reflected light therefrom is captured. Authenticity is determined by comparing the reference value with the reflection pattern of the reflected light from the counterfeit prevention material of which authenticity is unknown.
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Inventors:
KIMURA AKITERU (JP)
Application Number:
PCT/JP2016/070449
Publication Date:
January 19, 2017
Filing Date:
July 11, 2016
Export Citation:
Assignee:
KIMURA AKITERU (JP)
International Classes:
G02B5/18; B42D25/328; G03H1/02
Domestic Patent References:
| WO2008143087A1 | 2008-11-27 |
Foreign References:
| JP2012141729A | 2012-07-26 | |||
| JP2003043902A | 2003-02-14 |
Attorney, Agent or Firm:
MORISHITA Sakaki (JP)
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