Title:
CREAM AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2019/069811
Kind Code:
A1
Abstract:
Provided are: a cream that contains a high percentage of hydrogen gas and has few harmful effects on the skin; and a manufacturing method therefor. The cream according to the present invention is one in which bubble-state hydrogen gas is incorporated into a composition that comprises a fatty acid salt having 10 or more carbon atoms, a fatty acid having 10 or more carbon atoms, and a liquid medium, wherein the content percentage of the bubble-state hydrogen gas with respect to the cream is 0.1-100 vol% [v/w]. The cream manufacturing method according to the present invention comprises: preparing a composition that comprises a fatty acid salt having 10 or more carbon atoms, a fatty acid having 10 or more carbon atoms, and a liquid medium; incorporating bubble-state hydrogen gas into the composition; and increasing the viscosity of the composition containing the bubble-state hydrogen gas.
Inventors:
SHIBAHARA YUU (JP)
TOYONAGA KEN (JP)
NISHIO DAISUKE (JP)
TOYOSHIMA HIROKAZU (JP)
TAKEDA TOORU (JP)
TOYONAGA KEN (JP)
NISHIO DAISUKE (JP)
TOYOSHIMA HIROKAZU (JP)
TAKEDA TOORU (JP)
Application Number:
PCT/JP2018/036288
Publication Date:
April 11, 2019
Filing Date:
September 28, 2018
Export Citation:
Assignee:
SHINRYO CORP (JP)
International Classes:
A61K8/19; A61K8/04; A61K8/36; A61Q19/08
Domestic Patent References:
| WO2012111834A1 | 2012-08-23 |
Foreign References:
| JP2007308467A | 2007-11-29 | |||
| JP2015113331A | 2015-06-22 | |||
| JP2015203024A | 2015-11-16 |
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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