Title:
CROSS-LINE STRUCTURE AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/093486
Kind Code:
A1
Abstract:
A method for manufacturing a cross-line structure, comprising the following steps: step (S10), etching to obtain a first conductive layer (100); step (S11), sequentially depositing a second conductive material (200) and a photoresist material (300) on the first conductive layer (100); step (S12), removing the part of the photoresist material (300) on a position where a second conductive layer (210) is not required by means of a photomask; step (S13), etching the second conductive material (200); step (S14), obtaining the second conductive layer (210); and step (S15) performing compensation on a photomask graphic so that the width of an overlap portion (211) of the second conductive layer (210) with the first conductive layer (100) is greater than or equal to the width of the portion of the second conductive layer (210) that does not overlap the first conductive layer (100).
Inventors:
HUANG SHISHUAI (CN)
Application Number:
PCT/CN2018/118066
Publication Date:
May 14, 2020
Filing Date:
November 29, 2018
Export Citation:
Assignee:
HKC CORP LTD (CN)
International Classes:
H01L27/12; G02F1/1362
Foreign References:
| CN107230661A | 2017-10-03 | |||
| CN204679743U | 2015-09-30 | |||
| CN104977736A | 2015-10-14 | |||
| CN107425012A | 2017-12-01 | |||
| CN106155420A | 2016-11-23 | |||
| US20090295696A1 | 2009-12-03 |
Attorney, Agent or Firm:
ADVANCE CHINA IP LAW OFFICE (CN)
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