CURABLE COMPOSITION AND CURED PRODUCT THEREOF, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR MANUFACTURING OPTICAL COMPONENT, METHOD FOR MANUFACTURING CIRCUIT BOARD, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT

WIPO Patent Application WO/2015/170465

A1

To provide a curable composition for nanoimprinting that can form a cured product that has a sufficiently cured surface and is less prone to a pattern collapse defect even when the curable composition is cured by a photo-nanoimprint method at a low exposure dose. To provide a nanoimprint method for forming such a cured product. To provide a cured product that is less prone to a pattern collapse defect even when cured at a low exposure dose, a method for producing such a cured product, a method for manufacturing an optical component, a method for manufacturing a circuit board, and a method for manufacturing an electronic component. A curable composition that satisfies the formula (1) in a cured state: Er1/Er2 ≧ 1.10 (1) wherein Er1 denotes the surface reduced modulus (GPa) of a cured product of the curable composition, and Er2 denotes the internal reduced modulus (GPa) of the cured product.

KATO JUN (JP)
KAWASAKI YOUJI (JP)
YONEZAWA SHIORI (JP)
ITO TOSHIKI (JP)

PCT/JP2015/002287

November 12, 2015

April 28, 2015

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CANON KK (JP)

H01L21/027; B29C59/02; C08F2/50; H01L21/3065

WO2005081071A1	2005-09-01
WO2014065136A1	2014-05-01
WO2012030570A1	2012-03-08

JP2006227419A	2006-08-31
JP2015128134A	2015-07-09
JP2015054402A	2015-03-23

ABE, Takuma et al. (30-2Shimomaruko 3-chome, Ohta-k, Tokyo 01, JP)

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