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Title:
CURABLE COMPOSITION FOR IMPRINTING, CURED OBJECT, PATTERN FORMATION METHOD, AND LITHOGRAPHY METHOD
Document Type and Number:
WIPO Patent Application WO/2018/025739
Kind Code:
A1
Abstract:
Provided are a curable composition for imprinting that exhibits superior resolution properties when used to produce an ultrafine pattern of 20 nm or less, superior filling properties in a mold for a curable composition for imprinting, and superior mold release properties, as well as a cured object, pattern formation method, and lithography method using said curable composition for imprinting. The curable composition for imprinting contains a monofunctional polymerizable compound, bifunctional polymerizable compounds, and a photoinitiator, wherein the content of the monofunctional polymerizable compound is 5-30 wt. % of the total polymerizable compound, and the content of the bifunctional polymerizable compounds is 70 wt. % or more of the total polymerizable compound, at least one of the bifunctional polymerizable compounds being a bifunctional polymerizable compound in which the number of atoms linking the two polymerizable groups is two or less, and which does not contain an alicyclic structure or an aromatic ring structure, and the content of bifunctional polymerizable compounds that have three or more atoms linking the two polymerizable groups being 30 wt. % or less of the total polymerizable compound.

Inventors:
GOTO Yuichiro (4000 Kawashiri Yoshida-cho, Haibara-gu, Shizuoka 96, 〒4210396, JP)
Application Number:
JP2017/027197
Publication Date:
February 08, 2018
Filing Date:
July 27, 2017
Export Citation:
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Assignee:
FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome Minato-k, Tokyo 20, 〒1068620, JP)
International Classes:
H01L21/027; B29C59/02; C08F2/50; C08F220/20; C07C49/83; C07C69/54; C07F9/53
Attorney, Agent or Firm:
SIKS & CO. (8th Floor, Kyobashi-Nisshoku Bldg. 8-7, Kyobashi 1-chome, Chuo-k, Tokyo 31, 〒1040031, JP)
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