Title:
CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, METHOD FOR FORMING PATTERN, LITHOGRAPHY METHOD, PATTERN AND LITHOGRAPHY MASK
Document Type and Number:
WIPO Patent Application WO/2016/152597
Kind Code:
A1
Abstract:
The present invention provides: a curable composition for imprinting, which can both improve mold release properties and suppress the occurrence of waviness during etching; a cured product obtained using this curable composition for imprinting; a method for forming a pattern; a lithography method; a pattern; and a lithography mask. The curable composition for imprinting contains a monofunctional polymerizable compound, a polyfunctional polymerizable compound which includes at least one of an alicyclic structure and an aromatic structure and which has a viscosity at 25ºC of 150 mPa·s or less, and a photopolymerization initiator, wherein the monofunctional polymerizable compound is contained at a quantity of 5-30 mass % relative to the total quantity of polymerizable compounds in the curable composition for imprinting, and a cured film of the curable composition for imprinting has an elastic modulus of 3.5 GPa or less and a glass transition temperature of 90ºC or higher.
Inventors:
GOTO YUICHIRO (JP)
MARUMO KAZUHIRO (JP)
KITAGAWA HIROTAKA (JP)
OOMATSU TADASHI (JP)
MARUMO KAZUHIRO (JP)
KITAGAWA HIROTAKA (JP)
OOMATSU TADASHI (JP)
Application Number:
PCT/JP2016/057904
Publication Date:
September 29, 2016
Filing Date:
March 14, 2016
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/027; B29C59/02; C08F2/48; C08F2/50
Foreign References:
| JP2010037541A | 2010-02-18 | |||
| JP2008019292A | 2008-01-31 | |||
| JP2007245684A | 2007-09-27 |
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
Patent business corporation patent firm Sykes (JP)
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