Title:
CURABLE COMPOSITION FOR IMPRINTING, METHOD FOR PRODUCING CURABLE COMPOSITION FOR IMPRINTING, CURED ARTICLE, METHOD FOR PRODUCING PATTERN AND METHOD FOR PRODUCING SEMICONDUCTOR
Document Type and Number:
WIPO Patent Application WO/2020/066978
Kind Code:
A1
Abstract:
Provided is a curable composition for imprinting which contains a polymerizable compound, a photopolymerization initiator, and a particulate metal which includes one or more types of iron, copper, titanium and lead and exhibits a particle diameter of at least 1nm when measured according to the single particle ICP-MASS method, wherein the particulate metal content is 100 mass ppt to 30 mass ppb of the solid content of the composition. Further provided are a method for producing the curable composition for imprinting, a cured article which uses the curable composition for imprinting, a method for producing a pattern and a method for producing a semiconductor.
Inventors:
GOTO YUICHIRO (JP)
SHIMOJU NAOYA (JP)
SHIMOJU NAOYA (JP)
Application Number:
PCT/JP2019/037190
Publication Date:
April 02, 2020
Filing Date:
September 24, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/027; B29C59/02; C08F2/48
Domestic Patent References:
WO2017170428A1 | 2017-10-05 | |||
WO2018051961A1 | 2018-03-22 | |||
WO2017175668A1 | 2017-10-12 |
Foreign References:
JP2018097249A | 2018-06-21 | |||
JP2015012100A | 2015-01-19 | |||
JP2010000612A | 2010-01-07 |
Attorney, Agent or Firm:
SIKs & Co. (JP)
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