Title:
CURABLE COMPOSITION FOR NANOIMPRINT, SEMICONDUCTOR ELEMENT, AND NANOIMPRINT METHOD
Document Type and Number:
WIPO Patent Application WO/2011/125800
Kind Code:
A1
Abstract:
Disclosed is a curable composition for nanoimprint, which contains (A) a polymerizable compound, (B) a fluorine atom-containing polymer and (C) a radical generator. It is preferable that the content of the fluorine atom-containing polymer (B) is 0.1-10 parts by mass (inclusive) relative to 100 parts by mass of the polymerizable compound (A). It is preferable that the weight average molecular weight of the fluorine atom-containing polymer (B) in terms of polystyrene as determined by gel permeation chromatography is 1,000-30,000 (inclusive). It is preferable that the fluorine atom-containing polymer (B) contains a polymer that has at least one structural unit selected from the group consisting of structural units represented by formula (B-1) and structural units represented by formula (B-2).
More Like This:
| JP2010016170 | METHOD FOR ACQUIRING OFFSET DEFLECTION AMOUNT FOR SHAPED BEAM AND PLOTTING DEVICE |
| JP2001185473 | METHOD FOR FORMING RESIST PATTERN |
| JP63298245 | PRODUCTION OF PELLICLE |
Inventors:
OKAMOTO Masashi (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
岡本 匡史 (〒40 東京都港区東新橋一丁目９番２号 ＪＳＲ株式会社内 Tokyo, 〒1058640, JP)
岡本 匡史 (〒40 東京都港区東新橋一丁目９番２号 ＪＳＲ株式会社内 Tokyo, 〒1058640, JP)
Application Number:
JP2011/058139
Publication Date:
October 13, 2011
Filing Date:
March 30, 2011
Export Citation:
Assignee:
JSR CORPORATION (9-2 Higashi-Shinbashi 1-chome, Minato-ku Tokyo, 40, 〒1058640, JP)
ＪＳＲ株式会社 (〒40 東京都港区東新橋一丁目９番２号 Tokyo, 〒1058640, JP)
OKAMOTO Masashi (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
ＪＳＲ株式会社 (〒40 東京都港区東新橋一丁目９番２号 Tokyo, 〒1058640, JP)
OKAMOTO Masashi (9-2 Higashi-Shinbashi 1-chome, Minato-k, Tokyo 40, 〒1058640, JP)
International Classes:
H01L21/027; B29C59/02; C08F2/44; C08F12/20; C08L101/04
Attorney, Agent or Firm:
AMANO Kazunori (6th Floor Fujikogyo-Nishimotomachi Building, 1-18, Aioi-cho 1-chome, Chuo-ku, Kobe-sh, Hyogo 25, 〒6500025, JP)
Download PDF:
Claims:
Previous Patent: OPTICAL WAVEGUIDE STRUCTURE AND ELECTRONIC APPARATUS
Next Patent: PROCESS FOR PRODUCTION OF FINE CELLULOSE FIBER DISPERSION
Next Patent: PROCESS FOR PRODUCTION OF FINE CELLULOSE FIBER DISPERSION