CURABLE COMPOSITION FOR OPTICAL IMPRINTING, PATTERN FORMING METHOD, FINE PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

WIPO Patent Application WO/2014/050855

A1

Provided are: a curable composition for optical imprinting, which has excellent inkjet aptitude and mold releasability; and a pattern forming method. A curable composition for optical imprinting, which contains (A) a polymerizable compound, (B) a photopolymerization initiator and (C) a mold release agent, and which is characterized in that the mold release agent (C) is represented by general formula (I). (In general formula (I), Rf represents a fluorine-containing alkyl group having 1-8 carbon atoms and two or more fluorine atoms; m represents 1 or 2; L represents a single bond or a divalent linking group; n represents 1 or 2; X represents a single bond, an oxygen atom, a sulfur atom or a nitrogen atom; R1 represents a substituent having 1-8 carbon atoms (excluding a polymerizable group); R2 represents a hydrogen atom, a substituent having 1-8 carbon atoms or a divalent linking group; p represents 1 or 2; q represents 0 or 1; r represents 1 or 2; and R1 and R2 may combine with each other to form a ring.)

KITAGAWA HIROTAKA (JP)
GOTO YUICHIRO (JP)
ENOMOTO YUICHIRO (JP)

PCT/JP2013/075832

April 03, 2014

September 25, 2013

Click for automatic bibliography generation  

FUJIFILM CORP (JP)

H01L21/027; B29C59/02; C08F2/44; B29K67/00; B29K71/00

WO2011002042A1

2011-01-06

JP2012079782A	2012-04-19
JP2010106062A	2010-05-13

SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)

View/Download PDF      PDF Help

Previous Patent: POWER CONSUMPTION REDUCTION DEVICE

Next Patent: MULTI-CHAMBER PACKAGING BAG, AND METHOD FOR USING AND METHOD FOR MANUFACTURING SAME