Title:
CURABLE COMPOSITION FOR OPTICAL IMPRINTING AND PATTERN FORMING METHOD
Document Type and Number:
WIPO Patent Application WO/2015/046134
Kind Code:
A1
Abstract:
Provided are: a curable composition for optical imprinting, which has excellent inkjet adequacy and mold releasability; a pattern forming method; a fine pattern; and a method for manufacturing a semiconductor device.
A curable composition for optical imprinting, which contains (A) a polymerizable compound, (B) a photopolymerization initiator and (C) a compound represented by general formula (I). In general formula (I), A represents a polyhydric alcohol residue having a functionality of 2-6; p represents a number of 0-2; q represents a number of 1-6; p + q represents an integer of 2-6; each of m and n independently represents a number of 0-20; r represented by formula (1) is a number of 6-20; and each R independently represents an alkyl group having 1-10 carbon atoms, an aryl group or an acyl group.
r = (sum of m) + (sum of n) (1)
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Inventors:
KITAGAWA HIROTAKA (JP)
GOTO YUICHIRO (JP)
GOTO YUICHIRO (JP)
Application Number:
PCT/JP2014/075046
Publication Date:
April 02, 2015
Filing Date:
September 22, 2014
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/027; B29C59/02; B41J2/01; C08F2/44; C09K3/00
Domestic Patent References:
| WO2012161315A1 | 2012-11-29 |
Foreign References:
| JP2013036027A | 2013-02-21 | |||
| JP2012079782A | 2012-04-19 | |||
| JP2011192868A | 2011-09-29 | |||
| JPH09136920A | 1997-05-27 |
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
Patent business corporation patent firm Sykes (JP)
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