Title:
CURABLE COMPOSITION FOR PHOTO-IMPRINTING, PATTERN FORMING METHOD, AND PATTERN
Document Type and Number:
WIPO Patent Application WO/2013/136858
Kind Code:
A1
Abstract:
Provided is a curable composition for photo-imprinting, said curable composition exhibiting a high filling ratio for a mold and a low release defect density and ensuring high dry etching resistance. A curable composition for photo-imprinting which comprises a monofunctional monomer, a polyfunctional monomer and a photopolymerization initiator and which exhibits a viscosity of 15mPa·s or less at 25°C, an Ohnishi parameter of 3.0 or less, and a crosslink density of 0.6mmol/cm3 or more as calculated by formula (1): crosslink density = {Σ(the content (mass ratio) of the polyfunctional monomer * the number of functional groups of the polyfunctional monomer/the molecular weight of the polyfunctional monomer)}/specific gravity.
Inventors:
KITAGAWA HIROTAKA (JP)
YOSHIDA MASAFUMI (JP)
YOSHIDA MASAFUMI (JP)
Application Number:
PCT/JP2013/051563
Publication Date:
September 19, 2013
Filing Date:
January 25, 2013
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
H01L21/027; C08F2/46; C08F220/18; C08F236/20
Foreign References:
| JP2011222732A | 2011-11-04 | |||
| JP2006509354A | 2006-03-16 | |||
| JP2007186570A | 2007-07-26 |
Attorney, Agent or Firm:
SIKs & Co. (JP)
Patent business corporation patent firm Sykes (JP)
Patent business corporation patent firm Sykes (JP)
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