Title:
CURABLE COMPOSITION FOR TRANSFER MATERIAL AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2010/050379
Kind Code:
A1
Abstract:
Disclosed is a curable composition for a transfer material that is well suited to nanoimprinting, whereby ultrafine patterns to be used for a resist, etc., can be formed, and which has high dry etching resistance to argon gas, and high selectivity of dry etching speeds with argon gas and oxygen gas. The curable composition for a transfer material is characterized by containing a (meth) acrylate compound that possesses triazine skeleton obtained by causing a reaction between an aminotriazine compound, a compound that possesses a hydrocarbon group and a (meth) acryloyl group in the molecule thereof, and an aldehyde.
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Inventors:
ARAI YOSHIKAZU (JP)
UCHIDA HIROSHI (JP)
UCHIDA HIROSHI (JP)
Application Number:
PCT/JP2009/068034
Publication Date:
May 06, 2010
Filing Date:
October 19, 2009
Export Citation:
Assignee:
SHOWA DENKO KK (JP)
ARAI YOSHIKAZU (JP)
UCHIDA HIROSHI (JP)
ARAI YOSHIKAZU (JP)
UCHIDA HIROSHI (JP)
International Classes:
C08F20/34; B05D1/28; B05D1/38; B05D3/00; B05D3/06; B05D7/24; H01L21/027; C08G12/40
Domestic Patent References:
| WO2006055207A2 | 2006-05-26 |
Foreign References:
| JP2003183339A | 2003-07-03 | |||
| JPH07173222A | 1995-07-11 | |||
| JPS6456687A | 1989-03-03 | |||
| JPH1165131A | 1999-03-05 | |||
| JP2003100609A | 2003-04-04 | |||
| JP2005277280A | 2005-10-06 | |||
| JP2007072374A | 2007-03-22 | |||
| JPH07173222A | 1995-07-11 | |||
| JP2007273067A | 2007-10-18 |
Other References:
See also references of EP 2345676A4
Attorney, Agent or Firm:
SSINPAT PATENT FIRM (JP)
Patent business corporation SSINPAT (JP)
Patent business corporation SSINPAT (JP)
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