Title:
CURED FILM-FORMING COMPOSITION, ALIGNMENT MATERIAL AND PHASE DIFFERENCE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2016/143865
Kind Code:
A1
Abstract:
[Problem] to provide a cured film-forming composition optimal in formation of a cured film having excellent liquid crystal alignment properties, to provide an alignment material, and to provide a phase difference material using said alignment material. [Solution] This cured film-forming composition contains: (A) one or multiple types of cinnamic acid esters having a group represented by formula (1) (in the formula, R1 and R2 independently represent a hydrogen atom or an alkyl group, R3 represents an alkyl group, etc., and X1 represents an optionally substituted phenylene group); (B) at least one type of polymer selected from the group consisting of (B-1) to (B-3) below (B-1): polymers having at least two of at least one group selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, an alkoxysilyl group and a group represented by formula (2) (in the formula, R62 represents an alkyl group, and alkoxy group, or a phenyl group.) (B-2): polymers which can self-crosslink and which can thermally react with at least one group selected from the group consisting of a hydroxy group, a carboxyl group, an amide group, an amino group, an alkoxysilyl group and a group represented by formula (2) (B-3): a melamine-formaldehyde resin; and (C) a cross-linking agent (may be the same as the (B-2) component when the (B) component is (B-2) above). Also provided is a cured film, an alignment material and a phase difference material.
Inventors:
KANNO YUTA (JP)
ITO JUN (JP)
HATANAKA TADASHI (JP)
ITO JUN (JP)
HATANAKA TADASHI (JP)
Application Number:
PCT/JP2016/057619
Publication Date:
September 15, 2016
Filing Date:
March 10, 2016
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C09D4/02; C07C69/736; C08K5/101; C08L61/28; C08L101/02; C09D7/12; C09D201/02; G02B5/30; G02F1/13363; G02F1/1337
Domestic Patent References:
| WO2014065324A1 | 2014-05-01 | |||
| WO2014136889A1 | 2014-09-12 |
Foreign References:
| JPH0421665A | 1992-01-24 | |||
| JP2013148805A | 2013-08-01 |
Other References:
S.VENKAT REDDY ET AL.: "Highly Efficient and Convenient Deprotection of Methoxymethyl Ethers and Esters Using Bismuth Triflate in an Aqueous Medium", CHEMISTRY LETTERS, vol. 32, no. 11, 2003, pages 1038 - 1039, XP055136619, DOI: doi:10.1246/cl.2003.1038
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
A patent business corporation is a なぶさ patent trademark office. (JP)
A patent business corporation is a なぶさ patent trademark office. (JP)
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