Title:
CURED FILM FORMING COMPOSITION, ALIGNMENT MATERIAL AND RETARDATION MATERIAL
Document Type and Number:
WIPO Patent Application WO/2018/131682
Kind Code:
A1
Abstract:
[Problem] To provide: an alignment material which has excellent vertical alignment properties and adhesiveness, and which is capable of vertically aligning polymerizable liquid crystals with high sensitivity even on a resin film; and a cured film forming composition for obtaining a retardation material that uses such an alignment material. [Solution] A cured film forming composition which contains (A) a polymer that has a vertical alignment group and a polymerizable group containing a C=C double bond and (B) a radical polymerization initiator, and which is characterized in that the vertical alignment group is represented by formula (1). (In formula [1], each of Y1 and Y2 represents a single bond or the like; Y3 represents a single bond or an alkylene group having 1-15 carbon atoms; Y4 represents a single bond, a divalent cyclic group or the like; Y5 represents a divalent cyclic group selected from among a benzene ring, cyclohexane rings and heterocyclic rings; n represents an integer of 0-4, and in cases where n is 2 or more, the Y5 moieties may be the same as or different from each other; and Y6 represents a hydrogen atom, an alkyl group having 1-18 carbon atoms, or the like.)
Inventors:
ITO JUN (JP)
KANNO YUTA (JP)
INAMI KAYO (JP)
HATANAKA TADASHI (JP)
KANNO YUTA (JP)
INAMI KAYO (JP)
HATANAKA TADASHI (JP)
Application Number:
PCT/JP2018/000657
Publication Date:
July 19, 2018
Filing Date:
January 12, 2018
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C09D133/06; C08F290/12; G02B5/30; G02F1/1337
Domestic Patent References:
WO2015019962A1 | 2015-02-12 |
Foreign References:
JP2008116809A | 2008-05-22 | |||
JP2011032365A | 2011-02-17 | |||
JP2011221463A | 2011-11-04 | |||
JP2012057012A | 2012-03-22 | |||
JP2001240615A | 2001-09-04 | |||
JP2009236942A | 2009-10-15 | |||
JP2011006558A | 2011-01-13 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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