Title:
CURED FILM-FORMING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2017/170828
Kind Code:
A1
Abstract:
Provided are: a cured film-forming composition whereby a underlayer film for image formation formed from the composition exhibits high liquid repellency (lyophobicity) and lyophilic/liquid-repellent properties of the underlayer film can be easily changed even when exposed to a low amount of ultraviolet radiation; and a cured film obtained using the composition. The cured film-forming resin composition is characterized by containing: a polymer comprising a structural unit derived from a first monomer having the structure of formula (1) as component (A); a polymer other than component (A), which is a polymer in which the content of fluorine relative to the overall weight of the polymer is lower than in component (A), as component (B); a photoacid generator as component (C); and a solvent. (In the formula, R1 denotes hydrogen or a methyl group, and R2 denotes a fluorine-containing group able to be detached together with the oxygen atom bonded to R2.)
Inventors:
YUKAWA SHOJIRO (JP)
HOSHINO YUKI (JP)
TAKEDA KAYO (JP)
HOSHINO YUKI (JP)
TAKEDA KAYO (JP)
Application Number:
PCT/JP2017/013167
Publication Date:
October 05, 2017
Filing Date:
March 30, 2017
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
C09D133/24; C08F22/38; C08L33/24; C09D7/12; C09D201/04
Foreign References:
JPS61148208A | 1986-07-05 | |||
JP2004531617A | 2004-10-14 | |||
JP2010275498A | 2010-12-09 | |||
JPS5290269A | 1977-07-29 |
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
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