CVD APPARATUS - TOYO TANSO CO

Title:

CVD APPARATUS

Document Type and Number:

WIPO Patent Application WO/2010/087428

Kind Code:

A1

Abstract:

Provided is a CVD apparatus by which qualities of a susceptor and productivity can be significantly improved without causing a large increase of production cost and a size increase of the apparatus. The CVD apparatus forms a SiC film on the surface of a carbonaceous base material (5) by introducing a gas into the apparatus in a state where the carbonaceous base material (5) is supported by means of a supporting member. The supporting member has a lower supporting member (6), which has the carbonaceous base material (5) placed thereon and supports the lower portion of the carbonaceous base material, and an upper supporting member (13), which supports the upper portion of the carbonaceous base material (5). The upper supporting member (13) is arranged on the outer circumference of the carbonaceous base material (5), a V-shaped groove (13d) is formed on the upper supporting member (13), and in the carbonaceous base material arranging space (17) composed of the V-shaped groove (13d), the carbonaceous base material (5) is placed with a sufficient clearance.

Inventors:

YOSHIMOTO YOSHIAKI (JP)
KUBOTA TAKESHI (JP)

Application Number:

PCT/JP2010/051200

Publication Date:

August 05, 2010

Filing Date:

January 29, 2010

Export Citation:

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Assignee:

TOYO TANSO CO (JP)
YOSHIMOTO YOSHIAKI (JP)
KUBOTA TAKESHI (JP)

International Classes:

C23C16/458; H01L21/683

Foreign References:

JP2008530370A	2008-08-07
JP2003213429A	2003-07-30
JPH08195389A	1996-07-30
JP2002249376A	2002-09-06
JP2003213429A	2003-07-30
JPS63134663A	1988-06-07

Other References: