Title:
CVD DEVICE
Document Type and Number:
WIPO Patent Application WO/2010/092878
Kind Code:
A1
Abstract:
Provided is a CVD device by which the quality of a susceptor and productivity can be significantly improved without causing a rise in production cost and an increase in the size of the device.
Specifically provided is a CVD device in which a concave masking portion (10a) is formed in part of a carbonaceous base (10) and an SiC film is formed on the surface of the carbonaceous base (10) except a portion covered with a masking jig (7) by introducing gas thereinto while the masking jig (7) is fitted in the masking portion (10a), the CVD device being characterized by being configured in such a manner that the carbonaceous base (10) is supported by a film forming jig (2) by fixing the masking jig (7) to the film forming jig (2), and that the angle of the main surface of the carbonaceous base (10) with respect to the vertical axis (9) is 2°.
Inventors:
YOSHIMOTO YOSHIAKI (JP)
Application Number:
PCT/JP2010/051201
Publication Date:
August 19, 2010
Filing Date:
January 29, 2010
Export Citation:
Assignee:
TOYO TANSO CO (JP)
YOSHIMOTO YOSHIAKI (JP)
YOSHIMOTO YOSHIAKI (JP)
International Classes:
C23C16/458; H01L21/205
Foreign References:
| JP2008174841A | 2008-07-31 | |||
| JPS61127696A | 1986-06-14 | |||
| JP2002249376A | 2002-09-06 | |||
| JP2008530370A | 2008-08-07 | |||
| JPS63134663A | 1988-06-07 |
Other References:
See also references of EP 2397575A4
Attorney, Agent or Firm:
KITADAI, Tetsuo et al. (JP)
Tetsuo Kitadai (JP)
Tetsuo Kitadai (JP)
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