Title:
CVD DEVICE
Document Type and Number:
WIPO Patent Application WO/2013/133110
Kind Code:
A1
Abstract:
Provided is a CVD device wherein it is possible to reduce the particle contamination of a substrate. This CVD device for forming a film on a substrate by means of the CVD method is equipped with a chamber (101), a substrate holder (104) disposed within the chamber and for holding the substrate, and a gas introduction mechanism for introducing a raw material gas into the chamber, wherein a film formed from a material selected from among a metal, a ceramic, a plastic or a cermet is formed on at least one of the following: the inner surface of the chamber; the substrate holder; an attachment prevention plate disposed within the chamber; a tool disposed within the chamber; or a gas shower member for introducing the raw material gas into the chamber in a showering manner.
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Inventors:
ABE KOJI (JP)
HONDA YUUJI (JP)
TERASHIMA KEIICHI (JP)
HONDA YUUJI (JP)
TERASHIMA KEIICHI (JP)
Application Number:
PCT/JP2013/055263
Publication Date:
September 12, 2013
Filing Date:
February 21, 2013
Export Citation:
Assignee:
YOUTEC CO LTD (JP)
International Classes:
C23C16/44; C22C19/05; C22C27/04; C22C30/00; C22C30/02; C23C4/06; C23C4/10; C23C16/26
Foreign References:
| JP2002033286A | 2002-01-31 | |||
| JP2001247957A | 2001-09-14 | |||
| JPH06136544A | 1994-05-17 |
Attorney, Agent or Firm:
YANASE, Mutsuyasu et al. (JP)
Mutsuyasu Yanase (JP)
Mutsuyasu Yanase (JP)
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Claims: