CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN

WIPO Patent Application WO/2011/043029

A1

Disclosed are: a cyclic compound which has high solubility in a safe solvent and high sensitivity and is capable of providing a resist pattern having a good shape; a method for producing the cyclic compound; a radiation sensitive composition which contains the cyclic compound; and a method for forming a resist pattern using the radiation sensitive composition. Specifically disclosed are: a cyclic compound which has a specific structure; a radiation sensitive composition which contains the compound; and a method for forming a resist pattern using the composition.

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HAYASHI, Hiromi (Inc. Hiratsuka Research Laboratory, 6-2, Higashiyawata 5-chome, Hiratsuka-sh, Kanagawa 16, 〒2540016, JP)
林　宏美 (〒16 神奈川県平塚市東八幡５丁目６番２号　三菱瓦斯化学株式会社　平塚研究所内 Kanagawa, 〒2540016, JP)
ECHIGO, Masatoshi (Inc. Hiratsuka Research Laboratory, 6-2, Higashiyawata 5-chome, Hiratsuka-sh, Kanagawa 16, 〒2540016, JP)

JP2010/005796

April 14, 2011

September 27, 2010

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MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2 Marunouchi 2-chome, Chiyoda-ku Tokyo, 24, 〒1008324, JP)
三菱瓦斯化学株式会社 (〒24 東京都千代田区丸の内２－５－２ Tokyo, 〒1008324, JP)
HAYASHI, Hiromi (Inc. Hiratsuka Research Laboratory, 6-2, Higashiyawata 5-chome, Hiratsuka-sh, Kanagawa 16, 〒2540016, JP)
林　宏美 (〒16 神奈川県平塚市東八幡５丁目６番２号　三菱瓦斯化学株式会社　平塚研究所内 Kanagawa, 〒2540016, JP)

C07C39/17; C07C37/20; C08G8/04; G03F7/004; G03F7/038

SUGIMURA, Kenji (36F Kasumigaseki Common Gate West, 3-2-1 Kasumigaseki, Chiyoda-k, Tokyo 13, 〒1000013, JP)

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