Title:
CYCLIC COMPOUND, PROCESS FOR PRODUCTION OF THE CYCLIC COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2011/024957
Kind Code:
A1
Abstract:
Disclosed is a cyclic compound represented by formula (1). (In the formula, L, R1, R' and m are as defined in the description). The cyclic compound represented by formula (1) has high solubility in safe solvents, is highly sensitive, and enables the formation of a good resist pattern shape. Therefore, the cyclic compound is useful as a component for a radiation-sensitive composition.
Inventors:
ECHIGO MASATOSHI (JP)
HAYASHI HIROMI (JP)
HAYASHI HIROMI (JP)
Application Number:
PCT/JP2010/064616
Publication Date:
March 03, 2011
Filing Date:
August 27, 2010
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
ECHIGO MASATOSHI (JP)
HAYASHI HIROMI (JP)
ECHIGO MASATOSHI (JP)
HAYASHI HIROMI (JP)
International Classes:
C07C39/17; C07C37/18; G03F7/004; G03F7/038; H01L21/027; C07B61/00
Domestic Patent References:
| WO2009060869A1 | 2009-05-14 | |||
| WO2009075307A1 | 2009-06-18 | |||
| WO2009075308A1 | 2009-06-18 | |||
| WO2008053974A1 | 2008-05-08 |
Foreign References:
| JPH10161349A | 1998-06-19 | |||
| JP2005326838A | 2005-11-24 | |||
| JP2008145539A | 2008-06-26 | |||
| JP2009173623A | 2009-08-06 | |||
| JPH06282067A | 1994-10-07 | |||
| JPH0764285A | 1995-03-10 | |||
| EP0632003A1 | 1995-01-04 |
Other References:
EUROPEAN JOURNAL OF ORGANIC CHEMISTRY, 2006, pages 5117 - 5134, XP008152390
EUROPEAN JOURNAL OF ORGANIC CHEMISTRY, 2006, pages 5135 - 5151, XP008152386
EUROPEAN JOURNAL OF ORGANIC CHEMISTRY, 2003, pages 1404 - 1409, XP008152391
JOURNAL OF ORGANIC CHEMISTRY, vol. 71, no. 3, 2006, pages 976 - 982, XP008152392
See also references of EP 2474518A4
T.NAKAYAMA; M.NOMURA; K.HAGA; M.UEDA, BULL. CHEM. SOC. JPN., vol. 71, 1998, pages 2979
EUROPEAN JOURNAL OF ORGANIC CHEMISTRY, 2006, pages 5135 - 5151, XP008152386
EUROPEAN JOURNAL OF ORGANIC CHEMISTRY, 2003, pages 1404 - 1409, XP008152391
JOURNAL OF ORGANIC CHEMISTRY, vol. 71, no. 3, 2006, pages 976 - 982, XP008152392
See also references of EP 2474518A4
T.NAKAYAMA; M.NOMURA; K.HAGA; M.UEDA, BULL. CHEM. SOC. JPN., vol. 71, 1998, pages 2979
Attorney, Agent or Firm:
OHTANI, Tamotsu et al. (JP)
Tamotsu Otani (JP)
Tamotsu Otani (JP)
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